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1. (WO2019043946) CHARGED PARTICLE BEAM DEVICE
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Pub. No.: WO/2019/043946 International Application No.: PCT/JP2017/031789
Publication Date: 07.03.2019 International Filing Date: 04.09.2017
IPC:
H01J 37/141 (2006.01) ,H01J 37/28 (2006.01) ,H01J 37/317 (2006.01)
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
J
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37
Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
02
Details
04
Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
10
Lenses
14
magnetic
141
Electromagnetic lenses
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
J
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37
Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
26
Electron or ion microscopes; Electron- or ion-diffraction tubes
28
with scanning beams
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
J
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37
Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
30
Electron-beam or ion-beam tubes for localised treatment of objects
317
for changing properties of the objects or for applying thin layers thereon, e.g. ion implantation
Applicants:
株式会社日立ハイテクノロジーズ HITACHI HIGH-TECHNOLOGIES CORPORATION [JP/JP]; 東京都港区西新橋一丁目24番14号 24-14, Nishi Shimbashi 1-chome, Minato-ku, Tokyo 1058717, JP
Inventors:
平野 遼 HIRANO Ryo; JP
野間口 恒典 NOMAGUCHI Tsunenori; JP
神谷 知里 KAMIYA Chisato; JP
片根 純一 KATANE Junichi; JP
Agent:
特許業務法人平木国際特許事務所 HIRAKI & ASSOCIATES; 東京都港区愛宕二丁目5-1 愛宕グリーンヒルズMORIタワー32階 Atago Green Hills MORI Tower 32F, 5-1, Atago 2-chome, Minato-ku, Tokyo 1056232, JP
Priority Data:
Title (EN) CHARGED PARTICLE BEAM DEVICE
(FR) DISPOSITIF À FAISCEAU DE PARTICULES CHARGÉES
(JA) 荷電粒子線装置
Abstract:
(EN) The present invention provides a charged particle beam device that can efficiently reduce the effects of a residual magnetic field when SEM observation is carried out. This charged particle beam device executes at least one of the following: a first mode in which after a first coil is turned OFF, DC current is flowed to a second coil; and a second mode in which after the first coil is turned OFF, AC current is flowed to a second coil.
(FR) La présente invention concerne un dispositif à faisceau de particules chargées qui peut réduire efficacement les effets d'un champ magnétique résiduel lorsqu'une observation SEM est effectuée. Le dispositif à faisceau de particules chargées selon l'invention exécute un ou plusieurs des éléments suivants : un premier mode dans lequel après l'arrêt d'une première bobine, un courant continu est amené à s'écouler vers une deuxième bobine ; et un second mode dans lequel, après l'arrêt de la première bobine, un courant alternatif est amené à s'écouler vers une deuxième bobine.
(JA) 本発明は、SEM観察を実施したときの残留磁場の作用を効率的に減少させることができる荷電粒子線装置を提供するものである。本発明に係る荷電粒子線装置は、第1コイルをオフにした後に第2コイルに直流電流を流す第1モードと、前記第1コイルをオフにした後に前記第2コイルに交流電流を流す第2モードとの少なくともいずれかを実施する(図5参照)。
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)