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1. (WO2019043773) EXTREME ULTRAVIOLET LIGHT GENERATOR
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Pub. No.: WO/2019/043773 International Application No.: PCT/JP2017/030851
Publication Date: 07.03.2019 International Filing Date: 29.08.2017
IPC:
G03F 7/20 (2006.01) ,H05G 2/00 (2006.01)
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
20
Exposure; Apparatus therefor
H ELECTRICITY
05
ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
G
X-RAY TECHNIQUE
2
Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
Applicants:
ギガフォトン株式会社 GIGAPHOTON INC. [JP/JP]; 栃木県小山市大字横倉新田400番地 400, Oaza Yokokurashinden, Oyama-shi, Tochigi 3238558, JP
Inventors:
杉澤 克彦 SUGISAWA, Katsuhiko; JP
Agent:
松浦 憲三 MATSUURA, Kenzo; JP
Priority Data:
Title (EN) EXTREME ULTRAVIOLET LIGHT GENERATOR
(FR) GÉNÉRATEUR DE LUMIÈRE ULTRAVIOLETTE EXTRÊME
(JA) 極端紫外光生成装置
Abstract:
(EN) [Problem] To enable easy measurement of the film thickness of debris adhered to the surface of a component without the need for the extensive disassembly of the in-chamber component in an extreme ultraviolet light generator. [Solution] An extreme ultraviolet light generator (10) comprises: a chamber (5) for generating extreme ultraviolet light by irradiating a droplet comprising a target material with laser light; an EUV light collector mirror (11) that is an optical element arranged in the chamber (5); and measuring equipment (24, 25) that can move along the surface (11S) of the EUV light collector mirror and measures the film thickness of a target material adhered to the surface (11S).
(FR) L'invention aborde le problème de permettre une mesure aisée de l'épaisseur de film de débris collés à la surface d'un composant sans nécessiter un démontage extensif du composant en chambre dans un générateur de lumière ultraviolette extrême. La solution selon l'invention porte sur un générateur de lumière ultraviolette extrême (10) qui comprend : une chambre (5) pour générer une lumière ultraviolette extrême par irradiation d'une gouttelette comprenant un matériau cible avec une lumière laser ; un miroir collecteur de lumière EUV (11) qui est un élément optique disposé dans la chambre (5) ; et un équipement de mesure (24, 25) qui peut se déplacer le long de la surface (11S) du miroir collecteur de lumière EUV et mesure l'épaisseur de film d'un matériau cible collé à la surface (11S).
(JA) 【課題】極端紫外光生成装置において、大掛かりなチャンバ内部品の取り外しを必要とせずに、部品表面に付着したデブリの膜厚を簡便に測定可能とする。 【解決手段】極端紫外光生成装置(10)は、ターゲット材料からなるドロップレットにレーザ光を照射して極端紫外光を生成するチャンバ(5)と、チャンバ(5)内に配置された光学素子であるEUV光コレクタミラー(11)と、EUV光コレクタミラーの表面(11S)に沿って移動可能であって、この表面(11S)に付着しているターゲット材料の膜厚を測定する測定装置(24、25)とを備える。
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)