Some content of this application is unavailable at the moment.
If this situation persist, please contact us atFeedback&Contact
1. (WO2019043167) WEAR RESISTANT PVD TOOL COATING CONTAINING TIALN NANOLAYER FILMS
Latest bibliographic data on file with the International Bureau    Submit observation

Pub. No.: WO/2019/043167 International Application No.: PCT/EP2018/073490
Publication Date: 07.03.2019 International Filing Date: 31.08.2018
IPC:
C23C 28/04 (2006.01) ,C23C 14/02 (2006.01) ,C23C 14/06 (2006.01) ,C23C 14/32 (2006.01) ,C23C 30/00 (2006.01)
C CHEMISTRY; METALLURGY
23
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
C
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
28
Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of main groups C23C2/-C23C26/173
04
only coatings of inorganic non-metallic material
C CHEMISTRY; METALLURGY
23
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
C
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
14
Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
02
Pretreatment of the material to be coated
C CHEMISTRY; METALLURGY
23
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
C
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
14
Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
06
characterised by the coating material
C CHEMISTRY; METALLURGY
23
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
C
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
14
Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
22
characterised by the process of coating
24
Vacuum evaporation
32
by explosion; by evaporation and subsequent ionisation of the vapours
C CHEMISTRY; METALLURGY
23
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
C
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
30
Coating with metallic material characterised only by the composition of the metallic material, i.e. not characterised by the coating process
Applicants:
WALTER AG [DE/DE]; Derendinger Str. 53 72072 Tübingen, DE
Inventors:
SCHIER, Veit; DE
ENGELHART, Wolfgang; DE
Agent:
SANDVIK ASSOCIATION; Sandvik Intellectual Property AB 811 81 SANDVIKEN, SE
Priority Data:
17188809.231.08.2017EP
Title (EN) WEAR RESISTANT PVD TOOL COATING CONTAINING TIALN NANOLAYER FILMS
(FR) REVÊTEMENT D’OUTIL PVD RÉSISTANT À L’USURE CONTENANT DES FILMS DE NANOCOUCHE DE TIALN
Abstract:
(EN) The invention relates to a coated cutting tool and a process for the production thereof, the coated cutting tool consisting of a substrate and a hard material coating, the substrate being selected from cemented carbide, cermet, ceramics, cubic boron nitride (cBN), polycrystalline diamond (PCD) or high-speed steel (HSS), wherein the hard material coating comprises a (Ti,Al)N layer stack (L) of alternately stacked (Ti,Al)N sub-layers, the layer stack (L) having the following characteristics: - the overall atomic ratio of Ti:Al within the (Ti,Al)N layer stack (L) is within the range from 0.33:0.67 to 0.67:0.33; - the total thickness of the (Ti,Al)N layer stack (L) is within the range from 1 µm to 20 µm; - each of the individual (Ti,Al)N sub-layers within the (Ti,Al)N layer stack (L) of alternately stacked (Ti,Al)N sub-layers has a thickness within the range from 0.5 nm to 50 nm; - each of the individual (Ti,Al)N sub-layers within the (Ti,Al)N layer stack (L) of alternately stacked (Ti,Al)N sub-layers being different in respect of the atomic ratio Ti:Al than an immediately adjacent (Ti,Al)N sub-layer; - over the thickness of the (Ti,Al)N layer stack (L) perpendicular to the substrate surface the content of Al increases and the content of Ti decreases from the interface of the (Ti,Al)N layer stack (L) arranged in the direction towards the substrate to the interface of the (Ti,Al)N layer (L) stack arranged in the direction towards the outer surface of the coating; - over the thickness of the (Ti,Al)N layer stack (L) perpendicular to the substrate surface the residual stress σ decreases from the interface of the (Ti,Al)N layer stack (L) arranged in the direction towards the substrate to the interface of the (Ti,Al)N layer stack (L) arranged in the direction towards the outer surface of the coating by an amount of at least 150 MPa to at most 900 MPa, whereby the residual stress σ is measured by X-ray diffraction applying the sin2Ψ method based on the (2 0 0) reflection; - the residual stress σ within a portion of a thickness of at least 100 nm to at most 1 µm within the (Ti,Al)N layer stack (L) from the interface of the (Ti,Al)N layer stack (L) arranged in the direction towards the substrate is within the range of from 0 MPa to +450 MPa.
(FR) La présente invention concerne un outil de coupe revêtu et un procédé de fabrication de celui-ci, l’outil de coupe revêtu étant constitué d’un substrat et d’un revêtement de matériau dur, le substrat étant choisi parmi un carbure cémenté, un cermet, une céramique, un nitrure de bore cubique (cBN), un diamant polycristallin (PCD) ou un acier rapide (HSS), le revêtement de matériau dur comprenant un empilement de couches de (Ti,Al)N (L) de sous-couches de (Ti,Al)N empilées de façon alternée, l’empilement de couches (L) présentant les caractéristiques suivantes: - le rapport atomique global Ti:Al dans l’empilement de couches (Ti,Al)N (L) est dans la plage de 0,33:0,67 à 0,67:0,33 ; - l’épaisseur totale de l’empilement de couches de (Ti,Al)N (L) est dans la plage de 1 µm à 20 µm ; - chacune des sous-couches de (Ti,Al)N individuelles dans l’empilement de couches de (Ti,Al)N (L) de sous-couches de (Ti,Al)N empilées de façon alternée a une épaisseur dans la plage de 0,5 nm à 50 nm ; - chacune des sous-couches de (Ti,Al)N individuelles dans l’empilement de couches de (Ti,Al)N (L) de sous-couches de (Ti,Al)N empilées de façon alternée étant différente en termes de rapport atomique Ti:Al d’une sous-couche de (Ti,Al)N immédiatement adjacente ; - sur l’épaisseur de l’empilement de couches de (Ti,Al)N (L) perpendiculaire à la surface du substrat, la teneur en Al augmente et la teneur en Ti diminue de l’interface de l’empilement de couches de (Ti,Al)N (L) agencé dans la direction du substrat à l’interface de l’empilement de couches de (Ti,Al)N (L) agencé dans la direction de la surface externe du revêtement; - sur l’épaisseur de l’empilement de couches de (Ti,Al)N (L) perpendiculaire à la surface du substrat, la contrainte résiduelle σ diminue à de l’interface de l’empilement de couches (Ti,Al)N (L) agencé dans la direction du substrat à l’interface de l’empilement de couches de (Ti,Al)N (L) agencé dans la direction de la surface externe du revêtement d’une quantité d’au moins 150 MPa à au plus 900 MPa, la contrainte résiduelle σ étant mesurée par diffraction des rayons X en appliquant le procédé sin2Ψ sur la base de la réflexion (2 0 0) ; - la contrainte résiduelle σ dans une partie d’épaisseur d’au moins 100 nm à au plus 1 µm dans l’empilement de couches de (Ti,Al)N (L) de l’interface de l’empilement de couches de (Ti,Al)N (L) agencé dans la direction du substrat est dans la plage de 0 MPa à +450 MPa.
front page image
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: English (EN)
Filing Language: English (EN)