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1. (WO2019043004) DEVICE AND METHOD FOR GALVANIC PROCESSING OF LIQUIDS
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Pub. No.: WO/2019/043004 International Application No.: PCT/EP2018/073133
Publication Date: 07.03.2019 International Filing Date: 28.08.2018
IPC:
C02F 1/32 (2006.01) ,C02F 1/461 (2006.01) ,C02F 1/00 (2006.01) ,C02F 1/02 (2006.01) ,C02F 5/00 (2006.01)
C CHEMISTRY; METALLURGY
02
TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
F
TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
1
Treatment of water, waste water, or sewage
30
by irradiation
32
with ultra-violet light
C CHEMISTRY; METALLURGY
02
TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
F
TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
1
Treatment of water, waste water, or sewage
46
by electrochemical methods
461
by electrolysis
C CHEMISTRY; METALLURGY
02
TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
F
TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
1
Treatment of water, waste water, or sewage
C CHEMISTRY; METALLURGY
02
TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
F
TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
1
Treatment of water, waste water, or sewage
02
by heating
C CHEMISTRY; METALLURGY
02
TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
F
TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
5
Softening water; Preventing scale; Adding scale preventatives or scale removers to water, e.g. adding sequestering agents
Applicants:
SWISS AQUA TECHNOLOGIES AG [CH/CH]; Obereggerstrasse 50 CH-9442 Berneck, CH
Inventors:
PANCURAK, Frantisek; SK
Agent:
ALLWARDT, Anke; KAMINSKI HARMANN PATENTANWÄLTE AG Landstrasse 124 FL-9490 Vaduz, LI
Priority Data:
PCT/EP2017/07190031.08.2017EP
Title (EN) DEVICE AND METHOD FOR GALVANIC PROCESSING OF LIQUIDS
(FR) DISPOSITIF ET PROCÉDÉ DE TRAITEMENT GALVANIQUE DE LIQUIDES
Abstract:
(EN) A galvanic processing device (10) comprising at least two disk shaped electrodes, each of which defining a disk plane (14). The disk shaped electrodes (12) each comprises circumferential segments (24) surrounding a central hub (16) in at least two disk rings (18,18',18'',18''') and protruding from the disk plane (14). The circumferential segments (24) in the at least two disk rings (18,18',18'',18''') are separated from each other by annular bridges (20, 21) and radial bridges (22). The radial bridges (22) interconnect the annular bridges (20, 21) and the central hub (16), which all lay within the disk plane (14). Treatment of a liquid with such a galvanic processing device (10) comprises a flow of the liquid through the circumferential segments of the at least two electrodes (12) of the device (10), whereby the liquid is swirled simultaneously in different directions by the circumferential segments (24) and the liquid is further randomly swirled by the annular and radial bridges (20, 21, 22).
(FR) Un dispositif de traitement galvanique (10) comprend au moins deux électrodes en forme de disque, chacune définissant un plan de disque (14). Les électrodes en forme de disque (12) comprennent chacune des segments circonférentiels (24) entourant un moyeu central (16) dans au moins deux anneaux de disque (18, 18', 18'', 18''') et faisant saillie à partir du plan de disque (14). Les segments circonférentiels (24) dans les deux anneaux de disque (18, 18', 18'', 18''') sont séparés l'un de l'autre par des ponts annulaires (20, 21) et des ponts radiaux (22). Les ponts radiaux (22) relient les ponts annulaires (20, 21) et le moyeu central (16), qui sont tous disposés à l'intérieur du plan de disque (14). Le traitement d'un liquide avec un tel dispositif de traitement galvanique (10) comprend un écoulement du liquide à travers les segments circonférentiels de deux électrodes minimum (12) du dispositif (10), dans lesquelles le liquide est agité simultanément dans différentes directions par les segments circonférentiels (24), et le liquide est de plus agité de manière aléatoire par les ponts annulaires et radiaux (20, 21, 22).
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: English (EN)
Filing Language: English (EN)