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1. (WO2019042809) OPTICAL SYSTEMS, METROLOGY APPARATUS AND ASSOCIATED METHODS
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Pub. No.: WO/2019/042809 International Application No.: PCT/EP2018/072432
Publication Date: 07.03.2019 International Filing Date: 20.08.2018
IPC:
G21K 1/06 (2006.01) ,G03F 7/00 (2006.01) ,G03F 7/20 (2006.01) ,G02B 17/04 (2006.01)
G PHYSICS
21
NUCLEAR PHYSICS; NUCLEAR ENGINEERING
K
TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
1
Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
06
using diffraction, refraction, or reflection, e.g. monochromators
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
20
Exposure; Apparatus therefor
G PHYSICS
02
OPTICS
B
OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
17
Systems with reflecting surfaces, with or without refracting elements
02
Catoptric systems, e.g. image erecting and reversing system
04
using prisms only
Applicants:
ASML NETHERLANDS B.V. [NL/NL]; P.O. Box 324 5500 AH Veldhoven, NL
Inventors:
VAN DER POST, Sietse, Thijmen; NL
BÄUMER, Stefan, Michael, Bruno; NL
VAN VOORST, Peter, Danny; NL
TUKKER, Teunis, Willem; NL
ZIJP, Ferry; NL
NIENHUYS, Han-Kwang; NL
VAN DEN EERENBEEMD, Jacobus, Maria, Antonius; NL
Agent:
WILLEKENS, Jeroen, Pieter, Frank; NL
Priority Data:
17188979.301.09.2017EP
18172804.917.05.2018EP
Title (EN) OPTICAL SYSTEMS, METROLOGY APPARATUS AND ASSOCIATED METHODS
(FR) SYSTÈMES OPTIQUES, APPAREIL DE MÉTROLOGIE ET PROCÉDÉS ASSOCIÉS
Abstract:
(EN) An optical system (OS) for focusing a beam of radiation (B) on a region of interest in a metrology apparatus is described. The beam of radiation (B) comprises radiation in a soft X-ray or Extreme Ultraviolet spectral range. The optical system (OS) comprises a first stage (S1) for focusing the beam of radiation at an intermediate focus region. The optical system (OS) comprises a second stage (S2) for focusing the beam of radiation from the intermediate focus region onto the region of interest. The first and second stages each comprise a Kirkpatrick-Baez reflector combination. At least one reflector comprises an aberration- correcting reflector.
(FR) La présente invention concerne un système optique (OS) pour focaliser un faisceau de rayonnement (B) sur une région d'intérêt dans un appareil de métrologie. Le faisceau de rayonnement (B) comprend un rayonnement dans une plage spectrale de rayons X mous ou ultraviolets extrêmes. Le système optique (OS) comprend un premier étage (S1) pour focaliser le faisceau de rayonnement au niveau d'une région de focalisation intermédiaire. Le système optique (OS) comprend un second étage (S2) pour focaliser le faisceau de rayonnement de la région de focalisation intermédiaire sur la région d'intérêt. Les premier et second étages comprennent chacun une combinaison de réflecteurs de Kirkpatrick-Baez. Au moins un réflecteur comprend un réflecteur de correction d'aberration.
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: English (EN)
Filing Language: English (EN)