Some content of this application is unavailable at the moment.
If this situation persist, please contact us atFeedback&Contact
1. (WO2019042726) SUBSTRATE, METROLOGY APPARATUS AND ASSOCIATED METHODS FOR A LITHOGRAPHIC PROCESS
Latest bibliographic data on file with the International Bureau    Submit observation

Pub. No.: WO/2019/042726 International Application No.: PCT/EP2018/071418
Publication Date: 07.03.2019 International Filing Date: 07.08.2018
IPC:
G03F 7/20 (2006.01)
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
20
Exposure; Apparatus therefor
Applicants:
ASML NETHERLANDS B.V. [NL/NL]; P.O. Box 324 5500 AH Veldhoven, NL
Inventors:
VERMA, Alok; NL
CRAMER, Hugo, Augustinus, Joseph; NL
THEEUWES, Thomas; NL
TSIATMAS, Anagnostis; NL
VERSTRAETEN, Bert; NL
Agent:
BROEKEN, Petrus; NL
Priority Data:
17188175.828.08.2017EP
Title (EN) SUBSTRATE, METROLOGY APPARATUS AND ASSOCIATED METHODS FOR A LITHOGRAPHIC PROCESS
(FR) SUBSTRAT, APPAREIL DE MÉTROLOGIE ET PROCÉDÉS ASSOCIÉS POUR UN PROCESSUS LITHOGRAPHIQUE
Abstract:
(EN) A substrate comprising a plurality of features for use in measuring a parameter of a device manufacturing process and associated methods and apparatus. The measurement is by illumination of the features with measurement radiation from an optical apparatus and detecting a signal arising from interaction between the measurement radiation and the features, wherein the plurality of features comprise first features distributed in a periodic fashion at a first pitch, and second features distributed in a periodic fashion at a second pitch, and wherein the first pitch and second pitch are such that a combined pitch of the first and second features is constant irrespective of the presence of pitch walk in the plurality of features.
(FR) L'invention concerne un substrat comprenant une pluralité de caractéristiques destinées à être utilisées pour la mesure d'un paramètre d'un processus de fabrication de dispositif, ainsi que des procédés et un appareil associés. La mesure est prise au moyen de l'éclairement des caractéristiques avec un rayonnement de mesure provenant d'un appareil optique et de la détection d'un signal résultant de l'interaction entre le rayonnement de mesure et les caractéristiques. La pluralité de caractéristiques comprend des premières caractéristiques réparties de manière périodique à un premier pas et des secondes caractéristiques réparties de manière périodique à un second pas, le premier et le second pas étant tels qu'un pas combiné des premières et secondes caractéristiques est constant indépendamment de la présence d'une marche de pas dans la pluralité de caractéristiques.
front page image
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: English (EN)
Filing Language: English (EN)