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1. (WO2019042656) HEATING SYSTEM FOR AN OPTICAL COMPONENT OF A LITHOGRAPHIC APPARATUS
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Pub. No.: WO/2019/042656 International Application No.: PCT/EP2018/069558
Publication Date: 07.03.2019 International Filing Date: 18.07.2018
IPC:
G03F 7/20 (2006.01) ,G02B 7/00 (2006.01)
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
20
Exposure; Apparatus therefor
G PHYSICS
02
OPTICS
B
OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
7
Mountings, adjusting means, or light-tight connections, for optical elements
Applicants:
ASML NETHERLANDS B.V. [NL/NL]; P.O. Box 324 5500 AH Veldhoven, NL
Inventors:
JANSSEN, Franciscus, Johannes, Joseph; NL
VAN DE KERKHOF, Marcus, Adrianus; NL
Agent:
VERDONK, Peter; NL
Priority Data:
17189243.304.09.2017EP
Title (EN) HEATING SYSTEM FOR AN OPTICAL COMPONENT OF A LITHOGRAPHIC APPARATUS
(FR) SYSTÈME DE CHAUFFAGE POUR UN COMPOSANT OPTIQUE D'UN APPAREIL LITHOGRAPHIQUE
Abstract:
(EN) A system for heating an optical component of a lithographic apparatus, the system comprising a heating radiation source, the heating radiation source being configured to emit heating radiation for heating of the optical component, wherein the system is configured to direct the heating radiation emitted by the heating radiation source onto the optical component, a portion of the heating radiation being absorbed by the optical component and another portion of the heating radiation being reflected by optical component, and wherein the system is configured to vary or change a property of the heating radiation emitted by the heating radiation source such that the other portion of the heating radiation that is reflected by the optical component is constant during operation of the lithographic apparatus.
(FR) La présente invention concerne un système pour chauffer un composant optique d'un appareil lithographique, le système comprenant une source de rayonnement de chauffage, la source de rayonnement de chauffage étant configurée pour émettre un rayonnement de chauffage pour chauffer le composant optique, le système étant configuré pour diriger le rayonnement de chauffage émis par la source de rayonnement de chauffage sur le composant optique, une partie du rayonnement de chauffage étant absorbée par le composant optique et une autre partie du rayonnement de chauffage étant réfléchie par le composant optique, et le système étant configuré pour faire varier ou pour modifier une propriété du rayonnement de chauffage émis par la source de rayonnement de chauffage de façon à ce que la partie du rayonnement de chauffage qui est réfléchie par le composant optique soit constante pendant le fonctionnement de l'appareil lithographique.
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: English (EN)
Filing Language: English (EN)