Some content of this application is unavailable at the moment.
If this situation persist, please contact us atFeedback&Contact
1. (WO2019042580) MICROMECHANICAL STRUCTURE AND METHOD FOR PRODUCING THE MICROMECHANICAL STRUCTURE
Latest bibliographic data on file with the International BureauSubmit observation

Pub. No.: WO/2019/042580 International Application No.: PCT/EP2018/000415
Publication Date: 07.03.2019 International Filing Date: 24.08.2018
IPC:
C23C 14/08 (2006.01) ,C23C 14/34 (2006.01) ,H01L 21/02 (2006.01) ,H01L 37/02 (2006.01) ,H01L 41/316 (2013.01) ,C23C 28/04 (2006.01)
C CHEMISTRY; METALLURGY
23
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
C
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
14
Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
06
characterised by the coating material
08
Oxides
C CHEMISTRY; METALLURGY
23
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
C
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
14
Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
22
characterised by the process of coating
34
Sputtering
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21
Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
02
Manufacture or treatment of semiconductor devices or of parts thereof
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
37
Thermoelectric devices without a junction of dissimilar materials; Thermomagnetic devices, e.g. using Nernst-Ettinghausen effect; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof
02
using thermal change of dielectric constant, e.g. working above and below the Curie point
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
41
Piezo-electric devices in general; Electrostrictive devices in general; Magnetostrictive devices in general; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
22
Processes or apparatus specially adapted for the assembly, manufacture or treatment of piezo-electric or electrostrictive devices or of parts thereof
31
Applying piezo-electric or electrostrictive parts or bodies onto an electrical element or another base
314
by depositing piezo-electric or electrostrictive layers, e.g. aerosol or screen printing
316
by vapour phase deposition
C CHEMISTRY; METALLURGY
23
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
C
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
28
Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of main groups C23C2/-C23C26/173
04
only coatings of inorganic non-metallic material
Applicants:
SPECTROLYTIC LTD. [GB/GB]; 1.6 Techcube, Summerhall Edinburgh EH91PL, GB
Inventors:
WIESENT, Benjamin; GB
Agent:
PATERIS Patentanwälte; Postfach 33 07 11 80067 München, DE
Priority Data:
10 2017 008 146.828.08.2017DE
10 2018 004 257.026.05.2018DE
Title (DE) MIKROMECHANIKSTRUKTUR UND VERFAHREN ZUM HERSTELLEN DER MIKROMECHANIKSTRUKTUR
(EN) MICROMECHANICAL STRUCTURE AND METHOD FOR PRODUCING THE MICROMECHANICAL STRUCTURE
(FR) STRUCTURE MICROMÉCANIQUE ET PROCÉDÉ DE FABRICATION DE LA STRUCTURE MICROMÉCANIQUE
Abstract:
(DE) Die Erfindung betrifft eine Mikromechanikstruktur mit einem Substrat (1 ), einer Adhäsionsschicht (3), die auf das Substrat (1 ) aufgebracht ist, einer ersten Metallschicht (4), die auf die Adhäsionsschicht (3) aufgebracht ist, einer ferroelektrischen Schicht (5), die auf die erste Metallschicht (4) aufgebracht ist und die Bleizirkonattitanat aufweist sowie deren Bleikonzentration stufenförmig mit zunehmenden Abstand von der ersten Metallschicht (3) abnimmt, so dass die ferroelektrische Schicht (5) mehrere Teilschichten (13) aufweist, bei denen jeweils die Bleikonzentration einheitlich ist, und einer zweiten Metallschicht, die auf die ferroelektrische Schicht (5) aufgebracht ist.
(EN) The invention relates to a micromechanical structure comprising a substrate (1), an adhesion layer (3) which is applied onto the substrate (1); a first metal layer (4) which is applied onto the adhesion layer (3); a ferroelectric layer (5) which is applied onto the first metal layer (4) and has lead zirconate titanate and the lead concentration of which decreases in a stepped manner as the distance to the first metal layer (3) increases such that the ferroelectric layer (5) has multiple sub-layers (13), in which the respective lead concentration is consistent; and a second metal layer which is applied onto the ferroelectric layer (5).
(FR) L’invention concerne une structure micromécanique comprenant un substrat (1), une couche d’adhésion (3) appliquée sur le substrat (1) ; une première couche métallique (4) appliquée sur la couche d’adhésion (3) ; une couche ferroélectrique (5) qui est appliquée sur la première couche métallique (4), qui contient du plomb zirconium titanate et dont la concentration en plomb diminue par paliers à mesure qu’augmente la distance séparant de la première couche métallique (3) de manière telle que la couche ferroélectrique (5) présente plusieurs couches partielles (13) dont la concentration en plomb respective est uniforme ; et une deuxième couche métallique qui est appliquée sur la couche ferroélectrique (5).
front page image
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: German (DE)
Filing Language: German (DE)