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1. (WO2019042549) PROCESS FOR FORMING READY-TO-USE QCM SENSORS WITH ATOMICALLY FLAT SURFACE SUITABLE FOR STM MEASUREMENTS
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Pub. No.: WO/2019/042549 International Application No.: PCT/EP2017/071817
Publication Date: 07.03.2019 International Filing Date: 30.08.2017
IPC:
G01Q 30/02 (2010.01) ,G01N 29/02 (2006.01) ,G01N 29/24 (2006.01) ,G01N 5/02 (2006.01)
G PHYSICS
01
MEASURING; TESTING
Q
SCANNING-PROBE TECHNIQUES OR APPARATUS; APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING-PROBE MICROSCOPY [SPM]
30
Auxiliary means serving to assist or improve the scanning probe techniques or apparatus, e.g. display or data processing devices
02
Non-SPM analysing devices, e.g. SEM [Scanning Electron Microscope], spectrometer or optical microscope
G PHYSICS
01
MEASURING; TESTING
N
INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
29
Investigating or analysing materials by the use of ultrasonic, sonic or infrasonic waves; Visualisation of the interior of objects by transmitting ultrasonic or sonic waves through the object
02
Analysing fluids
G PHYSICS
01
MEASURING; TESTING
N
INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
29
Investigating or analysing materials by the use of ultrasonic, sonic or infrasonic waves; Visualisation of the interior of objects by transmitting ultrasonic or sonic waves through the object
22
Details
24
Probes
G PHYSICS
01
MEASURING; TESTING
N
INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
5
Analysing materials by weighing, e.g. weighing small particles separated from a gas or liquid
02
by absorbing or adsorbing components of a material and determining change of weight of the adsorbent, e.g. determining moisture content
Applicants:
INSTITUT ZA FIZIKU [HR/HR]; Bijenicka cesta 46 HR-10000 Zagreb, HR
Inventors:
VULETIC, Tomislav; HR
RADATOVIC, Borna; HR
JURDANA, Mihovil; HR
DELAC MARION, Ida; HR
KRALJ, Marko; HR
Agent:
BIHAR, Zeljko; HR
Priority Data:
Title (EN) PROCESS FOR FORMING READY-TO-USE QCM SENSORS WITH ATOMICALLY FLAT SURFACE SUITABLE FOR STM MEASUREMENTS
(FR) PROCÉDÉ DE FORMATION DE CAPTEURS MQ PRÊTS À L'EMPLOI AYANT UNE SURFACE PLANE AU PLAN ATOMIQUE CONVENANT À DES MESURES STM
Abstract:
(EN) -23- ABSTRACT The present invention discloses a process for forming ready-to-use quartz crystal microbalance sensors (QCMS) with atomically flat surface suitable as sample support for scanning tunneling microscopy (STM) measurements. The process consists of the following steps: A. deposition of the gold or another metal on atomically flat Si or similar wafer; B. pairing of the said wafer with already deposited gold or another metal surface with the quartz microbalance sensor also having surface of the same metal; and C. performing thermal compression bonding (TCB) to bond the metal surfaces together. The pressure exerted in step C. is applied by mechanically pressing the said structure where the pressure remains applied even after TCB in step C. is finished. The obtained ready-to-use quartz microbalance sensor remains confined within the said press used in step C. and until it is ready to use. The said mechanical press is used also as a transporting and storing means for the said sensor.
(FR) La présente invention concerne un procédé de formation de capteurs à microbalance à quartz (CMQ) prêts à l'emploi avec une surface plane au plan atomique convenant en tant que support d'échantillon pour des mesures de microscopie à effet tunnel (STM). Le procédé comprend les étapes suivantes : A. dépôt de l'or ou d'un autre métal sur une tranche de Si ou une tranche similaire plane au plan atomique ; B. appariement de ladite tranche sur une surface d'or ou d'un autre métal déjà déposé avec le capteur à microbalance à quartz ayant également une surface du même métal ; et C. réalisation d'une liaison par compression thermique (LCT) pour coller les surfaces métalliques ensemble. La pression exercée à l'étape C. est appliquée par pression mécanique de ladite structure, la pression restant appliquée même après que la LCT de l'étape C soit terminée. Le capteur à microbalance à quartz prêt à l'emploi obtenu reste confiné à l'intérieur de ladite presse utilisée à l'étape C. et jusqu'à ce qu'il soit prêt à être utilisé. Ladite presse mécanique est également utilisée comme moyen de transport et de stockage dudit capteur.
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: English (EN)
Filing Language: English (EN)