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1. (WO2019042428) POLYURETHANE POLISHING LAYER, POLISHING PAD CONTAINING POLISHING LAYER, METHOD FOR PREPARING POLISHING LAYER AND METHOD FOR PLANARIZING MATERIAL
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Pub. No.: WO/2019/042428 International Application No.: PCT/CN2018/103619
Publication Date: 07.03.2019 International Filing Date: 31.08.2018
IPC:
B24B 37/24 (2012.01) ,B24B 37/013 (2012.01) ,B24D 11/00 (2006.01) ,B24D 3/28 (2006.01)
B PERFORMING OPERATIONS; TRANSPORTING
24
GRINDING; POLISHING
B
MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
37
Lapping machines or devices; Accessories
11
Lapping tools
20
Lapping pads for working plane surfaces
24
characterised by the composition or properties of the pad materials
B PERFORMING OPERATIONS; TRANSPORTING
24
GRINDING; POLISHING
B
MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
37
Lapping machines or devices; Accessories
005
Control means for lapping machines or devices
013
Devices or means for detecting lapping completion
B PERFORMING OPERATIONS; TRANSPORTING
24
GRINDING; POLISHING
D
TOOLS FOR GRINDING, BUFFING OR SHARPENING
11
Constructional features of flexible abrasive materials; Special features in the manufacture of such materials
B PERFORMING OPERATIONS; TRANSPORTING
24
GRINDING; POLISHING
D
TOOLS FOR GRINDING, BUFFING OR SHARPENING
3
Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents
02
the constituent being used as bonding agent
20
and being essentially organic
28
Resins
Applicants:
湖北鼎汇微电子材料有限公司 HUBEI DINGHUI MICROELECTRONICS MATERIALS CO., LTD [CN/CN]; 中国湖北省武汉市 武汉经济技术开发区东荆河路1号411号房 411 Room, No.1 Dongjing River Road, Wuhan Economic & Technological Development Zone Wuhan, Hubei 430057, CN
Inventors:
朱顺全 ZHU, Shunquan; CN
罗乙杰 LUO, Yijie; CN
刘敏 LIU, Min; CN
张季平 ZHANG, Jiping; CN
车丽媛 CHE, Liyuan; CN
Agent:
北京派特恩知识产权代理有限公司 CHINA PAT INTELLECTUAL PROPERTY OFFICE; 中国北京市 海淀区海淀南路21号中关村知识产权大厦B座2层 2nd Floor, Zhongguancun Intellectual Property Building, Block B No.21 Haidian South Road, Haidian District Beijing 100080, CN
Priority Data:
201710769743.931.08.2017CN
201810182728.906.03.2018CN
Title (EN) POLYURETHANE POLISHING LAYER, POLISHING PAD CONTAINING POLISHING LAYER, METHOD FOR PREPARING POLISHING LAYER AND METHOD FOR PLANARIZING MATERIAL
(FR) COUCHE DE POLISSAGE DE POLYURÉTHANE, TAMPON DE POLISSAGE CONTENANT UNE COUCHE DE POLISSAGE, PROCÉDÉ POUR PRÉPARER UNE COUCHE DE POLISSAGE ET PROCÉDÉ POUR APLANIR UN MATÉRIAU
(ZH) 一种聚氨酯抛光层、含抛光层的抛光垫、抛光层的制备方法及平坦化材料的方法
Abstract:
(EN) Disclosed are a polishing pad, a polyurethane polishing layer and a preparation method therefor, belonging to the technical field of polishing in chemical mechanical planarization. The polyurethane polishing layer, wherein same has a thermal expansion coefficient of 100-200 ppm/ºC, also contains a reaction product resulting from a reaction between multiple components. The multiple components comprise an isocyanate-terminated prepolymer, a hollow microsphere polymer, and a curing agent composition. The curing agent composition comprises 5-55 wt% of an aliphatic diamine composition, 0-8 wt% of a polyamine composition, and 40-90 wt% of an aromatic difunctional composition. The polyurethane polishing layer has a density of 0.6-1.1 g/cm3, a Shore hardness of 45-70 D, and an elongation at break of 50-450%. The process for preparing the polyurethane polishing layer is simple, and has a low cost and a low energy consumption. The polyurethane polishing layer prepared by the process has a high hydrolysis stability, a uniform density and a stable removal rate.
(FR) L'invention concerne un tampon de polissage, une couche de polissage de polyuréthane et un procédé de préparation pour ceux-ci, lesquels appartiennent au domaine technique du polissage dans une planarisation chimico-mécanique. La couche de polissage de polyuréthane, celle-ci ayant un coefficient de dilatation thermique de 100 à 200 ppm/° C, contient également un produit de réaction résultant d'une réaction entre de multiples composants. Les multiples composants comprennent un prépolymère à terminaison isocyanate, un polymère à microsphères creuses, et une composition d'agent de durcissement. La composition d'agent de durcissement comprend de 5 à 55 % en poids d'une composition de diamine aliphatique, de 0 à 8 % en poids d'une composition de polyamine, et de 40 à 90 % en poids d'une composition difonctionnelle aromatique. La couche de polissage de polyuréthane a une densité de 0,6 à 1,1 g/cm3, une dureté Shore de 45 à 70 D, et un allongement à la rupture de 50 à 450 %. Le procédé pour préparer la couche de polissage de polyuréthane est simple, et a un faible coût et une faible consommation d'énergie. La couche de polissage de polyuréthane préparée par le procédé a une stabilité vis-à-vis de l'hydrolyse élevée, une densité uniforme et un taux de retrait stable.
(ZH) 一种抛光垫、聚氨酯抛光层及其制备方法,属于化学机械平面化处理的抛光技术领域。热膨胀系数为100-200ppm/℃的聚氨酯抛光层含有由多成分反应生成的反应产物。多成分包括:异氰酸酯封端的预聚物,中空微球聚合物,及固化剂组合物。固化剂组合物包含:5~55wt%脂肪族二元胺组合物、0~8wt%多元胺组合物、40~90wt%芳香族双官能组合物。聚氨酯抛光层密度为0.6~1.1g/cm 3,邵氏硬度为45~70D,断裂伸长率为50~450%。所述聚氨酯抛光层的制备工艺简单、成本低、能耗小。由所述工艺制备的聚氨酯抛光层水解稳定性高、密度均一、去除率稳定。
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Chinese (ZH)
Filing Language: Chinese (ZH)