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1. WO2019042337 - IMAGE QUALITY COMPENSATION APPARATUS AND METHOD

Publication Number WO/2019/042337
Publication Date 07.03.2019
International Application No. PCT/CN2018/103113
International Filing Date 30.08.2018
IPC
G03F 7/20 2006.01
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
20Exposure; Apparatus therefor
G02B 26/08 2006.01
GPHYSICS
02OPTICS
BOPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
26Optical devices or arrangements using movable or deformable optical elements for controlling the intensity, colour, phase, polarisation or direction of light, e.g. switching, gating or modulating
08for controlling the direction of light
CPC
G02B 26/08
GPHYSICS
02OPTICS
BOPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
26Optical devices or arrangements using movable or deformable optical elements for controlling the intensity, colour, phase, polarisation or direction of light, e.g. switching, gating, modulating
08for controlling the direction of light
G03F 7/20
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
20Exposure; Apparatus therefor
G03F 7/70433
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
70Exposure apparatus for microlithography
70425Imaging strategies, e.g. for increasing throughput, printing product fields larger than the image field, compensating lithography- or non-lithography errors, e.g. proximity correction, mix-and-match, stitching, double patterning
70433Layout for increasing efficiency, for compensating imaging errors, e.g. layout of exposure fields,; Use of mask features for increasing efficiency, for compensating imaging errors
G03F 7/70483
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
70Exposure apparatus for microlithography
70483Information management, control, testing, and wafer monitoring, e.g. pattern monitoring
G03F 7/706
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
70Exposure apparatus for microlithography
70483Information management, control, testing, and wafer monitoring, e.g. pattern monitoring
70591Testing optical components
706Aberration measurement
Applicants
  • 上海微电子装备(集团)股份有限公司 SHANGHAI MICRO ELECTRONICS EQUIPMENT (GROUP) CO., LTD. [CN]/[CN]
Inventors
  • 韩建 HAN, Jian
  • 郭银章 GUO, Yinzhang
Agents
  • 上海思微知识产权代理事务所(普通合伙) SHANGHAI SAVVY INTELLECTUAL PROPERTY AGENCY
Priority Data
201710776012.731.08.2017CN
Publication Language Chinese (ZH)
Filing Language Chinese (ZH)
Designated States
Title
(EN) IMAGE QUALITY COMPENSATION APPARATUS AND METHOD
(FR) APPAREIL ET PROCÉDÉ DE COMPENSATION DE QUALITÉ D'IMAGE
(ZH) 一种像质补偿装置及方法
Abstract
(EN)
An image quality compensation apparatus and method, comprising an objective lens unit (1), an image quality compensation unit (2) and an image quality detection unit (3) used to detect image quality of the objective lens unit, the image quality compensation unit comprising a thin film reflective module (21) disposed in an optical path of the objective lens unit and a deflection control module (22) separately connected to the image quality detection unit and the thin film reflective module. According to objective lens unit image quality data detected by the image quality detection unit, acquiring adjustment amounts for different locations on the thin film reflective module, the deflection control module performing vertical adjustment according to adjustment amounts of different locations on the thin film reflective module, so as to obtain a required surface type. The present apparatus and method can accurately compensate for constant terms of all large-scale distortions distributed along a field of vision, and avoid problems such as low adjustment accuracy and incorrect adjustment amounts when performing image quality compensation in an equal-thickness deflection mechanism, caused by an external force needing to be applied being relatively high so that a required surface type adjustment may be generated for a lens of relatively high thickness.
(FR)
La présente invention concerne un appareil et un procédé de compensation de qualité d'image comprenant un objectif (1), une unité de compensation de qualité d'image (2) et une unité de détection de qualité d'image (3) utilisée pour détecter la qualité d'image de l'objectif, l'unité de compensation de qualité d'image comprenant un module réfléchissant à film mince (21) disposé dans un trajet optique de l'objectif et un module de commande de déviation (22) connecté séparément à l'unité de détection de qualité d'image et au module réfléchissant à film mince. Selon des données de qualité d'image d'objectif détectées par l'unité de détection de qualité d'image, des quantités de réglage pour différents emplacements sur le module réfléchissant à film mince sont acquises, le module de commande de déviation effectuant un réglage vertical en fonction de quantités de réglage de différents emplacements sur le module réfléchissant à film mince de façon à obtenir un type de surface requis. L'appareil et le procédé ici décrits peuvent compenser avec précision les termes constants de toutes les distorsions à grande échelle distribuées le long d'un champ de vision et éviter des problèmes tels qu'une faible précision de réglage et des quantités de réglage incorrectes lors de la réalisation d'une compensation de qualité d'image dans un mécanisme de déviation d'épaisseur égale, ces problèmes étant provoqués par le fait qu'une force externe relativement élevée doive être appliquée pour qu'un réglage de type de surface requis puisse être généré pour une lentille d'épaisseur relativement élevée.
(ZH)
一种像质补偿装置及方法,包括物镜单元(1)、像质补偿单元(2)和用于检测物镜单元的像质的像质检测单元(3),像质补偿单元包括设于物镜单元光路中的薄膜反射模块(21)以及分别与像质检测单元和薄膜反射模块连接的变形控制模块(22)。根据像质检测单元检测到的物镜单元的像质数据获得薄膜反射模块上不同位置的调整量,由变形控制模块根据薄膜反射模块上不同位置的调整量对其进行垂向调整,以得到所需的面型。本装置及方法可以精确的补偿所有大范围像差随视场分布的常数项,且避免了在等厚变形机构中进行像质补偿时,由于需要施加很大的外力才能对厚度比较大的镜片产生所需的面型调整而导致的调整精度不高、调整量不准确等问题。
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