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1. (WO2019042209) SYSTEM AND METHOD FOR OPTICAL MEASUREMENT
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Pub. No.: WO/2019/042209 International Application No.: PCT/CN2018/101862
Publication Date: 07.03.2019 International Filing Date: 23.08.2018
IPC:
G01N 21/88 (2006.01) ,G01N 21/35 (2014.01)
G PHYSICS
01
MEASURING; TESTING
N
INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
21
Investigating or analysing materials by the use of optical means, i.e. using infra-red, visible, or ultra-violet light
84
Systems specially adapted for particular applications
88
Investigating the presence of flaws, defects or contamination
G PHYSICS
01
MEASURING; TESTING
N
INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
21
Investigating or analysing materials by the use of optical means, i.e. using infra-red, visible, or ultra-violet light
17
Systems in which incident light is modified in accordance with the properties of the material investigated
25
Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
31
Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
35
using infra-red light
Applicants:
深圳中科飞测科技有限公司 SKYVERSE LIMITED [CN/CN]; 中国广东省深圳市 龙华区大浪街道同胜社区上横朗第四工业区2号101、201、301 Room 101, 201 and 301, No.2 the Fourth Industrial Park of Shanghengliang Tongsheng Community, Dalang Street, Longhua District Shenzhen, Guangdong 518107, CN
Inventors:
陈鲁 CHEN, Lu; CN
张凌云 ZHANG, Lingyun; CN
张鹏斌 ZHANG, Pengbin; CN
Agent:
北京永新同创知识产权代理有限公司 NTD UNIVATION INTELLECTUAL PROPERTY AGENCY LTD.; 中国北京市 东城区北三环东路36号北京环球贸易中心C座10层 10th Floor, Tower C, Beijing Global Trade Center, 36 North Third Ring Road East, Dongcheng District Beijing 100013, CN
Priority Data:
201710770658.431.08.2017CN
Title (EN) SYSTEM AND METHOD FOR OPTICAL MEASUREMENT
(FR) PROCÉDÉ ET SYSTÈME DE MESURE OPTIQUE
(ZH) 光学测量系统及方法
Abstract:
(EN) A system and a method for optical measurement are provided. The system comprises: a light source component (110) configured to generate emitted light; a light shielding component (120) disposed between a lens component (130) and the light source component (110) along an optical path, for limiting the amount of emitted light that can be received by the lens component (130); the lens component (130) configured to provide incident light to a measurement target on the basis of the emitted light passing through the light shielding component (120), and to obtain reflected light reflected from the measurement target on the basis of the incident light; a light detecting component (150) configured to receive the reflected light; and a processor (160) communicatively coupled to the light detecting component (150) and the light shielding component (120), wherein the processor (160) is configured to adjust a direction of the incident light by adjusting the shielding of the emitted light by means of the light shielding component (120), and to determine whether the measurement target comprises a defect on the basis of the reflected light. The system can measure measurement targets (such as a wafer) quickly, generates less stray light and has higher detection sensitivity.
(FR) La présente invention concerne un système et un procédé de mesure optique. Le système comprend : un composant source de lumière (110) conçu pour générer une lumière émise ; un composant de protection contre la lumière (120) disposé entre un composant lentille (130) et le composant source de lumière (110) le long d'un trajet optique, pour limiter la quantité de lumière émise qui peut être reçue par le composant lentille (130) ; le composant lentille (130) conçu pour fournir une lumière incidente à une cible de mesure sur la base de la lumière émise traversant le composant de protection contre la lumière (120), et pour obtenir une lumière réfléchie réfléchie par la cible de mesure sur la base de la lumière incidente ; un composant de détection de lumière (150) conçu pour recevoir la lumière réfléchie ; et un processeur (160) couplé de façon communiquante au composant de détection de lumière (150) et au composant de protection contre la lumière (120), le processeur (160) étant conçu pour ajuster une direction de la lumière incidente par réglage de la protection de la lumière émise au moyen du composant de protection contre la lumière (120), et pour déterminer si la cible de mesure comprend un défaut sur la base de la lumière réfléchie. Le système peut mesurer rapidement des cibles de mesure (telle qu'une tranche), génère moins de lumière parasite et présente une sensibilité de détection plus élevée.
(ZH) 一种光学测量系统及方法,系统包括:光源组件(110),其被配置为产生出射光;遮光组件(120),其沿光学路径设置在透镜组件(130)和光源组件(110)之间,用于限制透镜组件(130)能够接收到的出射光;透镜组件(130),其被配置为基于经过遮光组件(120)的出射光,向待测物提供入射光,并获取由待测物基于入射光所产生的反射光;光探测组件(150),其被配置为接收反射光;以及处理器(160),其通信耦合至光探测组件(150)和遮光组件(120),处理器(160)被配置为通过调整遮光组件(120)对出射光的遮挡来调整入射光的入射方向,并根据反射光确定待测物是否包括缺陷。能够快速地对待测物(譬如,晶圆)进行测量,并且杂散光较少,具有更高的检测灵敏度。
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Chinese (ZH)
Filing Language: Chinese (ZH)