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1. (WO2019041898) ARRAY SUBSTRATE AND MANUFACTURING METHOD THEREOF, AND DISPLAY DEVICE
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Pub. No.: WO/2019/041898 International Application No.: PCT/CN2018/088012
Publication Date: 07.03.2019 International Filing Date: 23.05.2018
IPC:
H01L 27/12 (2006.01)
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
27
Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
02
including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier
12
the substrate being other than a semiconductor body, e.g. an insulating body
Applicants:
京东方科技集团股份有限公司 BOE TECHNOLOGY GROUP CO., LTD. [CN/CN]; 中国北京市 朝阳区酒仙桥路10号 No.10 Jiuxianqiao Rd., Chaoyang District Beijing 100015, CN
合肥鑫晟光电科技有限公司 HEFEI XINSHENG OPTOELECTRONICS TECHNOLOGY CO., LTD. [CN/CN]; 中国安徽省合肥市 新站区工业园内 Xinzhan Industrial Park Hefei, Anhui 230012, CN
Inventors:
操彬彬 CAO, Binbin; CN
艾力 AI, Li; CN
张辉 ZHANG, Hui; CN
Agent:
北京市柳沈律师事务所 LIU, SHEN & ASSOCIATES; 中国北京市 海淀区彩和坊路10号1号楼10层 10th Floor, Building 1, 10 Caihefang Road, Haidian District Beijing 100080, CN
Priority Data:
201710774031.631.08.2017CN
Title (EN) ARRAY SUBSTRATE AND MANUFACTURING METHOD THEREOF, AND DISPLAY DEVICE
(FR) SUBSTRAT DE MATRICE ET SON PROCÉDÉ DE FABRICATION, ET DISPOSITIF D'AFFICHAGE
(ZH) 阵列基板及其制作方法、显示装置
Abstract:
(EN) Provided are an array substrate and a manufacturing method thereof, and a display device. The array substrate comprises a base substrate (101), a layered structure (1110), and a reflective electrode (108). The base substrate (101) comprises a pixel region (PR). The pixel region (PR) comprises a reflective region (RR). The layered structure (1110) is located in the reflective region (RR) and comprises a granular layer (112). The granular layer (112) is configured such that one side of the layered structure (1110) away from the base substrate (101) has a granular, rough surface (1111). The reflective electrode (108) is provided over the granular layer (112). The array substrate can enhance diffuse reflection of a reflective region.
(FR) L'invention concerne un substrat de matrice et son procédé de fabrication, et un dispositif d'affichage. Le substrat de matrice comprend un substrat de base (101), une structure stratifiée (1110), et une électrode réfléchissante (108). Le substrat de base (101) comprend une zone de pixels (PR). La zone de pixels (PR) comprend une zone réfléchissante (RR). La structure stratifiée (1110) est située dans la zone réfléchissante (RR) et comprend une couche granulaire (112). La couche granulaire (112) est conçue de sorte qu'un côté de la structure stratifiée (1110) éloigné du substrat de base (101) a une surface rugueuse (1111) granulaire. L'électrode réfléchissante (108) est disposée au-dessus de la couche granulaire (112). Le substrat de matrice peut renforcer la réflexion diffuse d'une zone réfléchissante.
(ZH) 提供一种阵列基板及其制作方法、显示装置。该阵列基板包括衬底基板(101)、反射区层结构(1110)和反射电极(108)。衬底基板(101)包括像素区(PR),所述像素区(PR)包括反射区(RR)。反射区层结构(1110)在所述反射区(RR)内,包括颗粒层(112),所述颗粒层(112)被配置为使所述反射区层结构(1110)远离所述衬底基板(101)的一侧具有颗粒状的粗糙表面(1111)。反射电极(108)在所述颗粒层(112)上。该阵列基板可提高反射区的漫反射效果。
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Chinese (ZH)
Filing Language: Chinese (ZH)