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1. (WO2019041578) OLED SUBSTRATE AND MANUFACTURING METHOD THEREFOR
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Pub. No.: WO/2019/041578 International Application No.: PCT/CN2017/111507
Publication Date: 07.03.2019 International Filing Date: 17.11.2017
IPC:
H01L 51/50 (2006.01) ,H01L 51/56 (2006.01) ,H01L 27/32 (2006.01)
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
51
Solid state devices using organic materials as the active part, or using a combination of organic materials with other materials as the active part; Processes or apparatus specially adapted for the manufacture or treatment of such devices, or of parts thereof
50
specially adapted for light emission, e.g. organic light emitting diodes (OLED) or polymer light emitting devices (PLED)
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
51
Solid state devices using organic materials as the active part, or using a combination of organic materials with other materials as the active part; Processes or apparatus specially adapted for the manufacture or treatment of such devices, or of parts thereof
50
specially adapted for light emission, e.g. organic light emitting diodes (OLED) or polymer light emitting devices (PLED)
56
Processes or apparatus specially adapted for the manufacture or treatment of such devices or of parts thereof
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
27
Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
28
including components using organic materials as the active part, or using a combination of organic materials with other materials as the active part
32
with components specially adapted for light emission, e.g. flat-panel displays using organic light-emitting diodes
Applicants:
深圳市华星光电半导体显示技术有限公司 SHENZHEN CHINA STAR OPTOELECTRONICS SEMICONDUCTOR DISPLAY TECHNOLOGY CO., LTD. [CN/CN]; 中国广东省深圳市 光明新区公明街道塘明大道9-2号 No.9-2,Tangming Road, Gongming Street, Guangming New District Shenzhen, Guangdong 518132, CN
Inventors:
艾娜 AI, Na; CN
林如梅 LIN, Rumei; CN
井口真介 IGUCHI, Shinsuke; CN
Agent:
深圳市德力知识产权代理事务所 COMIPS INTELLECTUAL PROPERTY OFFICE; 中国广东省深圳市 福田区上步中路深勘大厦15E Room 15E Shenkan Building, Shangbu Zhong Road, Futian District Shenzhen, Guangdong 518028, CN
Priority Data:
201710766538.730.08.2017CN
Title (EN) OLED SUBSTRATE AND MANUFACTURING METHOD THEREFOR
(FR) SUBSTRAT DE DELO ET SON PROCÉDÉ DE FABRICATION
(ZH) OLED基板及其制作方法
Abstract:
(EN) Provided are an OLED substrate and a manufacturing method therefor. The method for manufacturing the OLED substrate involves setting the shapes of pixel regions (40) to be a first pattern (41) composed of a rectangle and two semicircles respectively connected to two short sides of the rectangle, or a second pattern (42) composed of a rectangle with four round corners, so that the uniformity of a film formed by means of ink-jet printing in the pixel regions can be effectively improved, thereby also effectively improving the uniformity of light emission and the stability of the performance of an OLED device. An ink-jet printed film layer in the OLED substrate is uniform in thickness, such that the OLED device is uniform in terms of light emission and stable in performance.
(FR) La présente invention concerne un substrat de DELO et son procédé de fabrication. Le procédé de fabrication du substrat de DELO consiste à établir les formes de régions de pixel (40) selon un premier motif (41), composé d'un rectangle et de deux demi-cercles respectivement liés aux deux petits côtés du rectangle, ou un second motif (42) composé d'un rectangle à quatre coins arrondis, de façon à améliorer efficacement l'uniformité d'un film formé au moyen d'une impression par jet d'encre dans les régions de pixel, ce qui permet également d'améliorer efficacement l'uniformité d'émission de lumière et la stabilité de performance d'un dispositif de DELO. Une couche de film imprimé par jet d'encre du substrat de DELO présente une épaisseur régulière, de sorte que le dispositif de DELO possède des caractéristiques régulières d'émission de lumière et des performances stables.
(ZH) 提供一种OLED基板及其制作方法。OLED基板的制作方法将像素区域(40)的形状设置为由矩形及分别与矩形的两短边相连的两半圆组成的第一图案(41)或者由四个角均为圆角的矩形构成的第二图案(42),能够有效改善像素区域内喷墨打印成膜的均匀性,从而有效提高OLED器件的发光均匀性和性能稳定性。OLED基板中的喷墨打印膜层厚度均匀,从而使OLED器件发光均匀并且性能稳定。
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Chinese (ZH)
Filing Language: Chinese (ZH)