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1. (WO2019041391) LAPPING AND POLISHING MACHINE AND AUXILIARY MECHANISM THEREOF
Latest bibliographic data on file with the International Bureau    Submit observation

Pub. No.: WO/2019/041391 International Application No.: PCT/CN2017/102090
Publication Date: 07.03.2019 International Filing Date: 18.09.2017
IPC:
B24B 41/04 (2006.01) ,B24B 49/00 (2012.01) ,B24B 37/34 (2012.01) ,B24B 29/00 (2006.01)
B PERFORMING OPERATIONS; TRANSPORTING
24
GRINDING; POLISHING
B
MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
41
Component parts of grinding machines or devices, such as frames, beds, carriages or headstocks
04
Headstocks; Working-spindles; Features relating thereto
B PERFORMING OPERATIONS; TRANSPORTING
24
GRINDING; POLISHING
B
MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
49
Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation
B PERFORMING OPERATIONS; TRANSPORTING
24
GRINDING; POLISHING
B
MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
37
Lapping machines or devices; Accessories
34
Accessories
B PERFORMING OPERATIONS; TRANSPORTING
24
GRINDING; POLISHING
B
MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
29
Machines or devices for polishing surfaces on work by means of tools made of soft or flexible material with or without the application of solid or liquid polishing agents
Applicants:
广州市永合祥自动化设备科技有限公司 GUANGZHOU YONGHEXIANG AUTOMATION EQUIPMENT TECHNOLOGY CO., LTD. [CN/CN]; 中国广东省广州市 黄埔区南湾西成大街40号103房 Room 103, No. 40 Xicheng Avenue Nanwan, Huangpu District Guangzhou, Guangdong 510700, CN
Inventors:
李辉 LI, Hui; CN
莫金树 MO, Jinshu; CN
郑连东 ZHENG, Liandong; CN
Agent:
广州华进联合专利商标代理有限公司 ADVANCE CHINA IP LAW OFFICE; 中国广东省广州市天河区珠江东路6号4501房 (部位:自编01-03和08-12单元)(仅限办公用途) Room 4501, No. 6 Zhujiang East Road, Tianhe District, Guangzhou Guangdong 510623, CN
Priority Data:
201710773479.631.08.2017CN
Title (EN) LAPPING AND POLISHING MACHINE AND AUXILIARY MECHANISM THEREOF
(FR) MACHINE DE RODAGE ET DE POLISSAGE ET SON MÉCANISME AUXILIAIRE
(ZH) 研磨抛光机及其辅助机构
Abstract:
(EN) A lapping and polishing machine and an auxiliary mechanism thereof. The auxiliary mechanism comprises an indexing plate (10), a bushing (20), and an eccentric assembly (30). One end of the bushing (20) is provided with a rotating shaft (210), and the other end is provided with a first shaft hole (220). The center of the first shaft hole (220) is not coaxial with the center of the rotating shaft (210). The rotating shaft (210) is rotatably connected to the indexing plate (10). One end of the eccentric assembly (30) is provided with a position-limiting column (310), and the other end is connected to a polishing wheel. An arc-shaped hole (230) is provided on an end surface of the bushing (20) near the indexing plate (10). The indexing plate (10) is provided with an adjustment hole (110). The eccentric assembly (30) is provided in the first shaft hole (220), and the position-limiting column (310) sequentially passes through the arc-shaped hole (230) and the adjustment hole (110). Multiple positioning holes (120) are provided on the indexing plate (10). The bushing (20) engages with one of the positioning holes (120) by means of a position-limiting mechanism (40), so as to be retained on the indexing plate (10). An eccentric distance between the eccentric assembly (30) and the rotating shaft (210) can be changed to adjust the radius of curvature of the rotation of the polishing wheel, thereby changing a motion trajectory of the polishing wheel to achieve different polishing effects.
(FR) L'invention concerne une machine de rodage et de polissage et son mécanisme auxiliaire. Le mécanisme auxiliaire comprend une plaque d'indexation (10), une douille (20) et un ensemble excentrique (30). Une première extrémité de la douille (20) est pourvue d'un arbre rotatif (210), et l'autre extrémité est pourvue d'un premier trou d'arbre (220). Le centre du premier trou d'arbre (220) n'est pas coaxial au centre de l'arbre rotatif (210). L'arbre rotatif (210) est relié rotatif à la plaque d'indexation (10). Une première extrémité de l'ensemble excentrique (30) est pourvue d'une colonne de limitation de position (310), et l'autre extrémité est reliée à une roue de polissage. Un trou en forme d'arc (230) est disposé sur une surface d'extrémité de la douille (20) près de la plaque d'indexation (10). La plaque d'indexation (10) est pourvue d'un trou de réglage (110). L'ensemble excentrique (30) est disposé dans le premier trou d'arbre (220), et la colonne de limitation de position (310) passe séquentiellement à travers le trou en forme d'arc (230) et le trou de réglage (110). De multiples trous de positionnement (120) sont disposés sur la plaque d'indexation (10). La douille (20) vient en prise avec l'un des trous de positionnement (120) au moyen d'un mécanisme de limitation de position (40), de manière à être retenue sur la plaque d'indexation (10). Une distance excentrique entre l'ensemble excentrique (30) et l'arbre rotatif (210) peut être modifiée pour régler le rayon de courbure de la rotation de la roue de polissage, ce qui permet de modifier une trajectoire de mouvement de la roue de polissage pour obtenir différents effets de polissage.
(ZH) 一种研磨抛光机及其辅助机构,其中辅助机构包括分度盘(10)、轴套(20)及偏心组件(30),轴套(20)的一端设有转轴(210),另一端设有第一轴孔(220),第一轴孔(220)的中心与转轴(210)的中心不同轴,转轴(210)与分度盘(10)可转动连接,偏心组件(30)的一端设有限位柱(310),另一端用于与抛光轮连接,轴套(20)靠近分度盘(10)的端面上设有弧形孔(230),分度盘(10)上设有调节孔(110),偏心组件(30)设置在第一轴孔(220)内,且限位柱(310)依次穿设于弧形孔(230)及调节孔(110)内,分度盘(10)上设有多个定位孔(120),轴套(20)通过限位机构(40)与其中一个定位孔(120)配合限位在分度盘(10)上。偏心组件(30)与转轴(210)之间的偏心距可改变,达到调整抛光轮的旋转曲率半径的目的,进而改变抛光轮的运行轨迹,达到不同的抛光效果。
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Chinese (ZH)
Filing Language: Chinese (ZH)