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1. (WO2019032753) MATERIALS, COMPONENT, AND METHODS FOR USE WITH EXTREME ULTRAVIOLET RADIATION IN LITHOGRAPHY AND OTHER APPLICATIONS
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Claims

What is Claimed, is:

1. A multilayer Bragg reflective coating for an optical element, the optical element for use in an optical system operating a target wavelength in the UV, DUV, or EUV bandwidths, the coating comprising:

a substrate;

repeating sets of bi-layer pairs forming a multilayer stack; each bi-layer pair further comprising:

a first layer; and

a layer formed with Carbon, an H-group element, and a Metal in the ratio

MxCyHz;

a protective or capping layer; and

wherein x > 0, y > 0, and z > 0; excluding x=y=z=0, and x=l, y=z=0.

2. The coating according to claim 1, wherein the first layer is formed with Carbon, an H-group element, and a Metal in the ratio MxCyHz and wherein x > 0, y > 0, and z > 0; excluding x=y=z=0, and x=l, y=z=0.

3. The coating according to claim 1, wherein the H-group element is Helium, Hydrogen, Neon or an atom from an elemental gas.

4. The coating according to claim 1, wherein the metal (M) is a metal selected from row

4, 5, or 6 from the periodic table of elements, or is any of the following, Molybdenum, Niobium, Ruthenium, Zirconium, Technetium, Platinum, Palladium, Gold or Nickel.

5. The coating according to claim 1, wherein the carbon (C) and the hydrogen (H) are hydrocarbons, carbides, hydrides, carbenes, or an organometallic complex of hydrogen and carbon.

6. The coating according to claim 1, wherein the coating gives the optical element a spectral bandwidth greater than that of a Mo-Si multilayer coating at the target wavelength.

7. The coating according to claim 1, wherein the coating gives the optical element an angular bandwidth greater than greater than that of a Mo-Si multilayer coating at the target wavelength.

8. The coating according to claim 1, wherein the coating is a layer of a photomask, mirror, lens, filter, covering layer, capping layer, substrate, film, pellicle, reflector, detector, collector or used in a lightsource.

9. The coating according to claim 1, wherein the first layer is Si.

10. A reflective coating or transmissive coating for an optical element, the optical element for use in an optical system operating a target wavelength in the UV, DUV, or EUV bandwidths, the coating comprising:

a combined material MxCyHz used in a coating constructed with two or more dimensional features;

a membrane or a substrate; and

excluding x=y=z=0.

11. The coating according to claim 10, wherein the carbon (C) and the H-group element are hydrocarbons, carbides, hydrides, carbenes, or an organometallic complex of hydrogen and carbon.

12. The coating according to claim 10, wherein the metal atom (M) is bonded to the carbon (C) or the H-group element (H) using one or more ligands.

13. The optical element according to claim 10, wherein the optical element is a photomask, mirror, lens, filter, covering layer, capping layer, substrate, film, pellicle, reflector, detector, or collector, or used in a light source.

14. A method for fabricating a material coating for use in an optical element that operates at a target wavelength within the range of 0.1 nm to 250 nm, comprising:

combining a metal (M), Carbon (C), and an H-group element (H) in the ratio MxCyHz to form a combination material, wherein x > 0, y > 0, and z > 0;

bombarding a target with a combination of two or more types of ions;

using a controlled deposition technique to deposit the MxCyHz combination material uniformly into a layer; and

except for x=y=z=0.

15. The method according to claim 14, further comprising:

providing a second layer material;

bombarding a second target with a combination of two or more types of ions; and using the controlled deposition technique to deposit the second material uniformly into a layer pair for a multilayer coating.

16. The method according to claim 14, wherein the ions are selected from the group consisting of Argon, Nitrogen, Helium, Hydrogen, Krypton and Neon ions.

17. The method according to claim 14, wherein the H-group element is Helium, Hydrogen, Neon, or an elemental gas.

18. The method of fabricating the coating according to claim 14, using a controlled deposition technique such as sputtering, ion beam deposition, PECVD, Atomic layer deposition, ion assisted deposition, e-beam deposition, chemical vapor deposition, thermal evaporation, ion implantation, or molecular beam epitaxy.

19. The method according to claim 14, wherein the metal (M) is a metal selected from row 4, 5, or 6 from the periodic table of elements.

20. The method according to claim 14, wherein the optical element is a photomask, mirror, lens, filter, covering layer, capping layer, substrate, film, pellicle, reflector, detector, or collector, or used in a light source.

21. A method for fabricating a material coating for use in an optical element that operates at a target wavelength within the range of 0.1 nm to 250 nm, comprising:

using a controlled deposition technique to deposit a transition metal as a layer in an optical element;

using a controlled deposition technique to deposit a hydrocarbon in the layer of the optical element; and

wherein the controlled depositions are done simultaneously and in the presence of an ambient gas.