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1. (WO2019032753) MATERIALS, COMPONENT, AND METHODS FOR USE WITH EXTREME ULTRAVIOLET RADIATION IN LITHOGRAPHY AND OTHER APPLICATIONS
Latest bibliographic data on file with the International BureauSubmit observation

Pub. No.: WO/2019/032753 International Application No.: PCT/US2018/045878
Publication Date: 14.02.2019 International Filing Date: 08.08.2018
IPC:
G02B 1/10 (2015.01) ,G02B 5/08 (2006.01) ,G03F 1/24 (2012.01)
G PHYSICS
02
OPTICS
B
OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
1
Optical elements characterised by the material of which they are made; Optical coatings for optical elements
10
Optical coatings produced by application to, or surface treatment of, optical elements
G PHYSICS
02
OPTICS
B
OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
5
Optical elements other than lenses
08
Mirrors
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
1
Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
22
Masks or mask blanks for imaging by radiation of 100 nm or shorter wavelength, e.g. X-ray masks, extreme ultra-violet [EUV] masks; Preparation thereof
24
Reflection masks; Preparation thereof
Applicants:
JAISWAL, Supriya [GB/US]; US
Inventors:
JAISWAL, Supriya; US
Agent:
KOLEGRAFF, William, J.; US
Priority Data:
62/542,73408.08.2017US
Title (EN) MATERIALS, COMPONENT, AND METHODS FOR USE WITH EXTREME ULTRAVIOLET RADIATION IN LITHOGRAPHY AND OTHER APPLICATIONS
(FR) MATÉRIAUX, COMPOSANT, ET PROCÉDÉS D'UTILISATION AVEC UN RAYONNEMENT ULTRAVIOLET EXTRÊME EN LITHOGRAPHIE ET DANS D'AUTRES APPLICATIONS
Abstract:
(EN) New classes of materials and associated components for use in devices and systems operating at ultraviolet (UV), extreme ultraviolet (EUV), and/or soft X-ray wavelengths are described. This invention relates to increasing the bandwidth and general performance of EUV reflective and transmissive materials. Such a material structure and combination may be used to make components such as mirrors, lenses or other optics, panels, light sources, photomasks, photoresists, or other components for use in applications such as lithography, wafer patterning, astronomical and space applications, biomedical applications, or other applications.
(FR) L'invention concerne de nouvelles classes de matériaux et des composants associés destinés à être utilisés dans des dispositifs et des systèmes fonctionnant à des longueurs d'ondes de l'ultraviolet (UV), de l'ultraviolet extrême (EUV) et/ou du rayon X doux. La présente invention concerne l'augmentation de la largeur de bande et la performance générale de matériaux réfléchissants et transmissifs de l'ultraviolet extrême EUV. Une telle structure et combinaison de matériaux peut être utilisée pour fabriquer des composants tels que des miroirs, des lentilles ou d'autres éléments optiques, des panneaux, des sources lumineuses, des masques photographiques, des résines photosensibles ou d'autres composants destinés à être utilisés dans des applications telles que la lithographie, le modelage de contours sur plaquettes, des applications astronomiques et spatiales, des applications biomédicales, ou d'autres applications.
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: English (EN)
Filing Language: English (EN)