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1. (WO2019032412) BANDGAP MEASUREMENTS OF PATTERNED FILM STACKS USING SPECTROSCOPIC METROLOGY
Latest bibliographic data on file with the International BureauSubmit observation

Pub. No.: WO/2019/032412 International Application No.: PCT/US2018/045302
Publication Date: 14.02.2019 International Filing Date: 06.08.2018
IPC:
G01J 3/02 (2006.01) ,G01J 3/28 (2006.01) ,G01J 3/12 (2006.01)
G PHYSICS
01
MEASURING; TESTING
J
MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRA-RED, VISIBLE OR ULTRA-VIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
3
Spectrometry; Spectrophotometry; Monochromators; Measuring colours
02
Details
G PHYSICS
01
MEASURING; TESTING
J
MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRA-RED, VISIBLE OR ULTRA-VIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
3
Spectrometry; Spectrophotometry; Monochromators; Measuring colours
28
Investigating the spectrum
G PHYSICS
01
MEASURING; TESTING
J
MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRA-RED, VISIBLE OR ULTRA-VIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
3
Spectrometry; Spectrophotometry; Monochromators; Measuring colours
12
Generating the spectrum; Monochromators
Applicants:
KLA-TENCOR CORPORATION [US/US]; Legal Department One Technology Drive Milpitas, California 95035, US
Inventors:
WANG, Tianhan; US
ROSENBERG, Aaron; US
HU, Dawei; CN
KUZNETSOV, Alexander; US
NGUYEN, Manh, D.; US
PANDEV, Stilian; US
LESOINE, John; US
ZHAO, Qiang; US
LEE, Lie-Quan Rich; US
CHOUAIB, Houssam; US
DI, Ming; US
KAACK, Torsten; US
SHCHEGROV, Andrei; US
TAN, Zhengquan; US
Agent:
MCANDREWS, Kevin; US
MORRIS, Elizabeth M. N.; US
Priority Data:
15/672,12008.08.2017US
62/542,26007.08.2017US
Title (EN) BANDGAP MEASUREMENTS OF PATTERNED FILM STACKS USING SPECTROSCOPIC METROLOGY
(FR) MESURES DE BANDE INTERDITE D'EMPILEMENTS DE FILMS À MOTIFS PAR MÉTROLOGIE SPECTROSCOPIQUE
Abstract:
(EN) A spectroscopic metrology system includes a spectroscopic metrology tool and a controller. The controller generates a model of a multilayer grating including two or more layers, the model including geometric parameters indicative of a geometry of a test layer of the multilayer grating and dispersion parameters indicative of a dispersion of the test layer. The controller further receives a spectroscopic signal of a fabricated multilayer grating corresponding to the modeled multilayer grating from the spectroscopic metrology tool. The controller further determines values of the one or more parameters of the modeled multilayer grating providing a simulated spectroscopic signal corresponding to the measured spectroscopic signal within a selected tolerance. The controller further predicts a bandgap of the test layer of the fabricated multilayer grating based on the determined values of the one or more parameters of the test layer of the fabricated structure.
(FR) L'invention concerne un système de métrologie spectroscopique qui comprend un outil de métrologie spectroscopique et un dispositif de commande. Le dispositif de commande crée un modèle d'un réseau multicouche comprenant deux couches ou plus, le modèle comprenant des paramètres géométriques indicatifs d'une géométrie d'une couche à tester du réseau multicouche et des paramètres de dispersion indicatifs d'une dispersion de la couche à tester. Le dispositif de commande reçoit en outre un signal spectroscopique d'un réseau multicouche fabriqué correspondant au réseau multicouche modélisé par l'outil de métrologie spectroscopique. Le dispositif de commande détermine en outre des valeurs du ou des paramètres du réseau multicouche modélisé fournissant un signal spectroscopique simulé correspondant au signal spectroscopique mesuré dans un intervalle de tolérance sélectionné. Le dispositif de commande prédit en outre une bande interdite de la couche à tester du réseau multicouche fabriqué sur la base des valeurs déterminées du ou des paramètres de la couche à tester de la structure fabriquée.
front page image
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: English (EN)
Filing Language: English (EN)