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1. (WO2019031647) OLED ORGANIC THIN-FILM LAYER FORMING METHOD USING RF SPUTTERING DEVICE, RF SPUTTERING DEVICE, AND DEVICE FOR FORMING TARGET USED IN RF SPUTTERING DEVICE
Latest bibliographic data on file with the International BureauSubmit observation

Pub. No.: WO/2019/031647 International Application No.: PCT/KR2017/011601
Publication Date: 14.02.2019 International Filing Date: 19.10.2017
IPC:
C23C 14/34 (2006.01) ,C23C 14/12 (2006.01) ,C23C 14/56 (2006.01) ,H01L 51/56 (2006.01)
C CHEMISTRY; METALLURGY
23
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
C
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
14
Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
22
characterised by the process of coating
34
Sputtering
C CHEMISTRY; METALLURGY
23
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
C
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
14
Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
06
characterised by the coating material
12
Organic material
C CHEMISTRY; METALLURGY
23
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
C
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
14
Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
22
characterised by the process of coating
56
Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
51
Solid state devices using organic materials as the active part, or using a combination of organic materials with other materials as the active part; Processes or apparatus specially adapted for the manufacture or treatment of such devices, or of parts thereof
50
specially adapted for light emission, e.g. organic light emitting diodes (OLED) or polymer light emitting devices (PLED)
56
Processes or apparatus specially adapted for the manufacture or treatment of such devices or of parts thereof
Applicants:
소문숙 SO, Moon Sook [KR/KR]; KR
Inventors:
소문숙 SO, Moon Sook; KR
Agent:
특허법인세신 SESHIN PATENT & LAW FIRM; 서울시 금천구 가산디지털2로 123, 207호 (가산동,월드메르디앙벤처센터2차) #207, (Gasan-dong, World Meridian Venture Center 2cha), 123, Gasan digital 2-ro, Geumcheon-gu, Seoul 08505, KR
Priority Data:
10-2017-010183910.08.2017KR
Title (EN) OLED ORGANIC THIN-FILM LAYER FORMING METHOD USING RF SPUTTERING DEVICE, RF SPUTTERING DEVICE, AND DEVICE FOR FORMING TARGET USED IN RF SPUTTERING DEVICE
(FR) PROCÉDÉ DE FORMATION DE COUCHE DE FILM MINCE ORGANIQUE OLED A L'AIDE D'UN DISPOSITIF DE PULVÉRISATION RF, DISPOSITIF DE PULVÉRISATION RF ET DISPOSITIF DE FORMATION DE CIBLE UTILISÉE DANS UN DISPOSITIF DE PULVÉRISATION RF
(KO) RF 스퍼터링 장치를 이용한 OLED용 유기 박막층 형성 방법 및 상기 RF 스퍼터링 장치, 그리고 상기 RF 스퍼터링 장치에서 사용되는 타겟을 성형하는 장치
Abstract:
(EN) The present invention uses an RF sputtering device in forming an organic thin-film layer for an OLED. A method for manufacturing an organic thin-film layer for an OLED by using an RF sputtering device according to the present invention comprises the steps of: disposing a target for manufacturing an OLED organic thin-film layer at a cathode in a chamber of the RF sputtering device; maintaining a vacuum in the chamber and then injecting a reaction gas into the chamber; and applying a magnetic field and RF power to the target.
(FR) La présente invention utilise un dispositif de pulvérisation RF utilisé dans la formation d'une couche de film mince organique pour une OLED. Un procédé de fabrication d'une couche de film mince organique pour une OLED à l'aide d'un dispositif de pulvérisation RF selon la présente invention comprend les étapes consistant à : mettre à disposition une cible pour la fabrication d'une couche de film mince organique OLED au niveau d'une cathode dans une chambre du dispositif de pulvérisation RF; maintenir un vide dans la chambre puis injecter un gaz de réaction dans la chambre; et appliquer un champ magnétique et une puissance RF à la cible.
(KO) 본 발명은, OLED용 유기 박막층을 형성하는 데에 RF 스퍼터링 장치를 사용한다. 따라서, 본 발명에 따른 RF 스퍼터링 장치를 이용한 OLED용 유기 박막층의 제조 방법은: RF 스퍼터링 장치의 챔버 내부의 캐소드에 OLED 유기 박막층 제조용 타겟을 배치하는 단계; 상기 챔버 내부를 진공으로 유지한 후 반응 가스를 주입하는 단계; 상기 타겟에 자기장 및 RF 전력을 인가하는 단계를 포함한다.
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Korean (KO)
Filing Language: Korean (KO)