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1. (WO2019031521) FLUORINE-CONTAINING COPOLYMER COMPOSITION
Latest bibliographic data on file with the International BureauSubmit observation

Pub. No.: WO/2019/031521 International Application No.: PCT/JP2018/029657
Publication Date: 14.02.2019 International Filing Date: 07.08.2018
IPC:
C08L 27/18 (2006.01) ,C08F 210/02 (2006.01) ,C08F 214/26 (2006.01) ,C08F 216/14 (2006.01) ,C08F 222/04 (2006.01) ,C08K 5/07 (2006.01) ,C09D 7/20 (2018.01) ,C09D 7/63 (2018.01) ,C09D 127/18 (2006.01)
C CHEMISTRY; METALLURGY
08
ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
L
COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
27
Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Compositions of derivatives of such polymers
02
not modified by chemical after-treatment
12
containing fluorine atoms
18
Homopolymers or copolymers of tetrafluoroethene
C CHEMISTRY; METALLURGY
08
ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
F
MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
210
Copolymers of unsaturated aliphatic hydrocarbons having only one carbon-to-carbon double bond
02
Ethene
C CHEMISTRY; METALLURGY
08
ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
F
MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
214
Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen
18
Monomers containing fluorine
26
Tetrafluoroethene
C CHEMISTRY; METALLURGY
08
ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
F
MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
216
Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an alcohol, ether, aldehydo, ketonic, acetal, or ketal radical
12
by an ether radical
14
Monomers containing only one unsaturated aliphatic radical
C CHEMISTRY; METALLURGY
08
ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
F
MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
222
Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
04
Anhydrides, e.g. cyclic anhydrides
C CHEMISTRY; METALLURGY
08
ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
K
USE OF INORGANIC OR NON-MACROMOLECULAR ORGANIC SUBSTANCES AS COMPOUNDING INGREDIENTS
5
Use of organic ingredients
04
Oxygen-containing compounds
07
Aldehydes; Ketones
[IPC code unknown for C09D 7/20][IPC code unknown for C09D 7/63]
C CHEMISTRY; METALLURGY
09
DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
D
COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
127
Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Coating compositions based on derivatives of such polymers
02
not modified by chemical after-treatment
12
containing fluorine atoms
18
Homopolymers or copolymers of tetrafluoroethene
Applicants:
AGC株式会社 AGC INC. [JP/JP]; 東京都千代田区丸の内一丁目5番1号 5-1, Marunouchi 1-chome, Chiyoda-ku, Tokyo 1008405, JP
Inventors:
相田 茂 AIDA Shigeru; JP
阿部 香織 ABE Kaori; JP
福永 晋太郎 FUKUNAGA Shintaro; JP
Agent:
泉名 謙治 SENMYO Kenji; JP
小川 利春 OGAWA Toshiharu; JP
金 鎭文 KIM Jin-Moon; JP
比企野 健 HIKINO Ken; JP
横井 大一郎 YOKOI Daiichiro; JP
Priority Data:
2017-15428009.08.2017JP
2018-03341027.02.2018JP
Title (EN) FLUORINE-CONTAINING COPOLYMER COMPOSITION
(FR) COMPOSITION DE COPOLYMÈRE CONTENANT DU FLUOR
(JA) 含フッ素共重合体組成物
Abstract:
(EN) Provided is a fluorine-containing copolymer composition which makes it possible to form a uniform coating. This composition contains: a fluorine-containing copolymer which has a tetrafluoroethylene-based unit, an ethylene-based unit, and 0.4-1.0 mol% of one or more types of functional groups selected from the group consisting of a carbonyl group-containing group, an acid anhydride group, a carboxyl group, a hydroxyl group, an epoxy group, an amide group, an amino group, and an isocyanate group; and a C6-10 aliphatic compound having one carbonyl group.
(FR) L'invention concerne une composition de copolymère contenant du fluor qui permet de former un revêtement uniforme. Cette composition contient : un copolymère contenant du fluor qui présente un motif à base de tétrafluoroéthylène, un motif à base d'éthylène et 0,4-1,0 % en mole d'un ou plusieurs types de groupes fonctionnels choisis dans le groupe constitué par un groupe contenant un groupe carbonyle, un groupe anhydride d'acide, un groupe carboxyle, un groupe hydroxyle, un groupe époxy, un groupe amide, un groupe amino et un groupe isocyanate ; et un composé aliphatique en C6-10 présentant un groupe carbonyle.
(JA) 均一な被膜を形成することができる、含フッ素共重合体組成物を提供する。 テトラフルオロエチレンに基づく単位、エチレンに基づく単位、ならびにカルボニル基含有基、酸無水物基、カルボキシ基、ヒドロキシ基、エポキシ基、アミド基、アミノ基およびイソシアネート基からなる群から選ばれる少なくとも一種の官能基を0.4~1.0mol%有する含フッ素共重合体と、 1個のカルボニル基を有する炭素数6~10の脂肪族化合物と、を含有する組成物。
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)