Some content of this application is unavailable at the moment.
If this situation persist, please contact us atFeedback&Contact
1. (WO2019031480) SURFACE MODIFICATION DEVICE
Latest bibliographic data on file with the International BureauSubmit observation

Pub. No.: WO/2019/031480 International Application No.: PCT/JP2018/029541
Publication Date: 14.02.2019 International Filing Date: 07.08.2018
Chapter 2 Demand Filed: 01.03.2019
IPC:
B01J 19/08 (2006.01) ,H05H 1/24 (2006.01)
B PERFORMING OPERATIONS; TRANSPORTING
01
PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
J
CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS, COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
19
Chemical, physical, or physico-chemical processes in general; Their relevant apparatus
08
Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
H ELECTRICITY
05
ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
H
PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY- CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
1
Generating plasma; Handling plasma
24
Generating plasma
Applicants:
春日電機株式会社 KASUGA DENKI, INC. [JP/JP]; 神奈川県川崎市幸区新川崎2番4号 2-4, Shinkawasaki Saiwai-ku, Kawasaki-shi Kanagawa 2120032, JP
Inventors:
杉村 智 SUGIMURA Satoshi; JP
小木曽 智 OGISO Satoru; JP
櫻井 行平 SAKURAI Yukihira; JP
吉田 純也 YOSHIDA Junya; JP
森下 貴生 MORISHITA Takao; JP
Agent:
嶋 宣之 SHIMA Nobuyuki; JP
Priority Data:
2017-15418509.08.2017JP
Title (EN) SURFACE MODIFICATION DEVICE
(FR) DISPOSITIF DE MODIFICATION DE SURFACE
(JA) 表面改質装置
Abstract:
(EN) [Problem] To provide a surface modification device that achieves the desired surface modification while keeping the amount of substitution gas that is supplied low. [Solution] This surface modification device forms a discharge area E1 between a discharge electrode 6 and a counter electrode 4, supplies substitution gas to the discharge area E1, and modifies the surface of the base material to be processed. The surface modification device comprises: a slit-shaped substitution gas passage; and cover members 7, 8 that form curtain passages 22, 23 in spaces facing the discharge electrode. While the substitution gas is being supplied to the discharge area E1, gas injected from the curtain passages 22, 23 prevent the inflow of an entrained flow a and the outflows b1, b2 of the substitution gas, thereby maintaining the concentration of substitution gas inside the discharge area E1.
(FR) Le problème décrit par la présente invention est de fournir un dispositif de modification de surface qui atteint la modification de surface souhaitée tout en maintenant la quantité de gaz de substitution qui est fournie à un niveau faible. La Solution selon l'invention porte sur un dispositif de modification de surface qui forme une zone de décharge E1 entre une électrode de décharge 6 et une contre-électrode 4, fournit un gaz de substitution à la zone de décharge E1, et modifie la surface du matériau de base à traiter. Le dispositif de modification de surface comprend : un passage de gaz de substitution en forme de fente; et des éléments de couvercle 7, 8 qui forment des passages de rideau 22, 23 dans des espaces faisant face à l'électrode de décharge. Tandis que le gaz de substitution est fourni à la zone de décharge E1, le gaz injecté à partir des passages de rideau 22, 23 empêchent l'entrée d'un écoulement entraîné a et les écoulements sortants b1, b2 du gaz de substitution, maintenant ainsi la concentration de gaz de substitution à l'intérieur de la zone de décharge E1.
(JA) 【課題】 置換ガスの供給量を少なく保ちながら、目的の表面改質を実現できる表面改質度装置を提供すること。 【解決手段】 放電電極6と対向電極4との間に放電エリアE1を形成するとともに、放電エリアE1に置換ガスを供給して、処理基材の表面を改質する表面改質装置であって、スリット状の置換ガス通路と、放電電極との対向隙間でカーテン用通路22,23を形成するカバー部材7,8とを備え、放電エリアE1に置換ガスを供給しながら、カーテン用通路22,23から噴射されるガスによって同伴流aの流入や置換ガスの流出b1,b2を防止し、放電エリアE1内の置換ガス濃度を維持するようにした。
front page image
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)