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1. (WO2019031359) REPLICA MOLD MATERIAL FOR IMPRINTING
Latest bibliographic data on file with the International BureauSubmit observation

Pub. No.: WO/2019/031359 International Application No.: PCT/JP2018/028897
Publication Date: 14.02.2019 International Filing Date: 01.08.2018
IPC:
B29C 59/02 (2006.01) ,B29C 33/40 (2006.01)
B PERFORMING OPERATIONS; TRANSPORTING
29
WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
C
SHAPING OR JOINING OF PLASTICS; SHAPING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL; AFTER- TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
59
Surface shaping, e.g. embossing; Apparatus therefor
02
by mechanical means, e.g. pressing
B PERFORMING OPERATIONS; TRANSPORTING
29
WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
C
SHAPING OR JOINING OF PLASTICS; SHAPING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL; AFTER- TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
33
Moulds or cores; Details thereof or accessories therefor
38
characterised by the material or the manufacturing process
40
Plastics, e.g. foam, rubber
Applicants:
日産化学株式会社 NISSAN CHEMICAL CORPORATION [JP/JP]; 東京都中央区日本橋二丁目5番1号 5-1, Nihonbashi 2-chome, Chuo-ku, Tokyo 1036119, JP
Inventors:
小林 淳平 KOBAYASHI, Junpei; JP
加藤 拓 KATO, Taku; JP
Agent:
特許業務法人はなぶさ特許商標事務所 HANABUSA PATENT & TRADEMARK OFFICE; 東京都千代田区神田駿河台3丁目2番地 新御茶ノ水アーバントリニティ Shin-Ochanomizu Urban Trinity, 2, Kandasurugadai 3-chome, Chiyoda-ku, Tokyo 1010062, JP
Priority Data:
2017-15245807.08.2017JP
Title (EN) REPLICA MOLD MATERIAL FOR IMPRINTING
(FR) MATÉRIAU DE MOULE DE RÉPLIQUE POUR EMPREINTE
(JA) インプリント用レプリカモールド材料
Abstract:
(EN) [Problem] To provide a novel replica mold material for imprinting. [Solution] An replica mold material for imprinting containing the following component (A), component (B), and component (C). (A): A di(meth)acrylate compound represented by formula (1) (in the formula, R1 and R2 each independently represent a hydrogen atom or a methyl group; R3 and R4 each independently represent an alkylene group; R5 and R6 each independently represent a hydrogen atom or a methyl group; r1 and r2 each independently represent an integer). (B): A compound having 2-4 groups represented by formula (2) (excluding the di(meth)acrylate compound represented by formula (1)) (in the formula, X represents a single bond or an alkylene group; R7 represents a hydrogen atom or a methyl group) per molecule. (C): A photopolymerization initiator.
(FR) L'invention fournit un nouveau matériau de moule de réplique pour empreinte. Plus précisément, l'invention concerne matériau de moule de réplique pour empreinte qui comprend les composants (A), (B) et (C) suivants. (A) : composé di(méth)acrylate représenté par la formule (1) (Dans la formule, R et R représentent, chacun indépendamment, un atome d'hydrogène ou un groupe méthyl, R et R représentent, chacun indépendamment, un groupe alkylène, R et R représentent, chacun indépendamment, un atome d'hydrogène ou un groupe méthyl, et r et r représentent, chacun indépendamment, un nombre entier.) (B) : groupe possédant dans chaque molécule 2 à 4 groupes représentés par la formule (2) (Ledit composé di(méth)acrylate représenté par la formule (1) étant exclu) (Dans la formule, X représente une liaison simple ou un groupe alkylène, et R représente un atome d'hydrogène ou un groupe méthyl. (C) : initiateur de photopolymérisation
(JA) 【課題】 新規なインプリント用レプリカモールド材料を提供する。 【解決手段】 下記(A)成分、(B)成分及び(C)成分を含有するインプリント用レプリカモールド材料。 (A):下記式(1)で表されるジ(メタ)アクリレート化合物 (式中、R及びRはそれぞれ独立に水素原子又はメチル基を表し、R及びRはそれぞれ独立にアルキレン基を表し、R及びRはそれぞれ独立に水素原子又はメチル基を表し、r及びrはそれぞれ独立に整数を表す。) (B):下記式(2)で表される基を一分子中に2つ乃至4つ有する化合物(但し、前記式(1)で表されるジ(メタ)アクリレート化合物を除く。) (式中、Xは単結合又はアルキレン基を表し、Rは水素原子又はメチル基を表す。) (C):光重合開始剤
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)