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1. (WO2019031243) ELECTROMAGNETIC-WAVE-ABSORBING PARTICLES, ELECTROMAGNETIC-WAVE-ABSORBING PARTICLE DISPERSION, AND METHOD FOR MANUFACTURING ELECTROMAGNETIC-WAVE-ABSORBING PARTICLES
Latest bibliographic data on file with the International BureauSubmit observation

Pub. No.: WO/2019/031243 International Application No.: PCT/JP2018/027879
Publication Date: 14.02.2019 International Filing Date: 25.07.2018
IPC:
C01G 41/00 (2006.01) ,C08K 3/24 (2006.01) ,C08L 101/12 (2006.01) ,C09K 3/00 (2006.01) ,G02B 5/12 (2006.01)
C CHEMISTRY; METALLURGY
01
INORGANIC CHEMISTRY
G
COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F94
41
Compounds of tungsten
C CHEMISTRY; METALLURGY
08
ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
K
USE OF INORGANIC OR NON-MACROMOLECULAR ORGANIC SUBSTANCES AS COMPOUNDING INGREDIENTS
3
Use of inorganic ingredients
18
Oxygen-containing compounds, e.g. metal carbonyls
24
Acids; Salts thereof
C CHEMISTRY; METALLURGY
08
ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
L
COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
101
Compositions of unspecified macromolecular compounds
12
characterised by physical features, e.g. anisotropy, viscosity or electrical conductivity
C CHEMISTRY; METALLURGY
09
DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
K
MATERIALS FOR APPLICATIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
3
Materials not provided for elsewhere
G PHYSICS
02
OPTICS
B
OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
5
Optical elements other than lenses
12
Reflex reflectors
Applicants:
住友金属鉱山株式会社 SUMITOMO METAL MINING CO., LTD. [JP/JP]; 東京都港区新橋5丁目11番3号 11-3, Shimbashi 5-chome, Minato-ku, Tokyo 1058716, JP
Inventors:
岡田 美香 OKADA, Mika; JP
小野 勝史 ONO, Katsushi; JP
吉尾 里司 YOSHIO, Satoshi; JP
足立 健治 ADACHI, Kenji; JP
町田 佳輔 MACHIDA, Keisuke; JP
Agent:
伊東 忠重 ITOH, Tadashige; JP
伊東 忠彦 ITOH, Tadahiko; JP
Priority Data:
2017-15481209.08.2017JP
Title (EN) ELECTROMAGNETIC-WAVE-ABSORBING PARTICLES, ELECTROMAGNETIC-WAVE-ABSORBING PARTICLE DISPERSION, AND METHOD FOR MANUFACTURING ELECTROMAGNETIC-WAVE-ABSORBING PARTICLES
(FR) PARTICULES ABSORBANT LES ONDES ÉLECTROMAGNÉTIQUES, DISPERSION DE PARTICULES ABSORBANT LES ONDES ÉLECTROMAGNÉTIQUES, ET PROCÉDÉ DE FABRICATION DE PARTICULES ABSORBANT LES ONDES ÉLECTROMAGNÉTIQUES
(JA) 電磁波吸収粒子、電磁波吸収粒子分散液、電磁波吸収粒子の製造方法
Abstract:
(EN) Provided are electromagnetic-wave-absorbing particles that comprise oxygen-deficient hexagonal tungsten bronze, the tungsten bronze being represented by the general formula MxWO3y (where the element M includes one or more chosen from a group consisting of at least K, Rb, and Cs, 0.15 ≤ x ≤ 0.33, and 0 < y ≤ 0.46), and the oxygen vacancy concentration Nv being in the range 4.0 × 1014/cm-3 to 8.0 × 1021/cm-3.
(FR) La présente invention concerne des particules absorbant les ondes électromagnétiques qui comprennent du bronze de tungstène hexagonal à carence en oxygène, le bronze de tungstène étant représenté par la formule générale MxWO3 - y (où l’élément M comprend l’un ou plusieurs choisis parmi un groupe constitué d’au moins K, Rb, et Cs, 0,15 ≤ x ≤ 0,33, et 0 < y ≤ 0,46), et la concentration en vide d’oxygène Nv étant située dans la plage de 4,0 x 1014/cm- 3 à 8,0 x 1021/cm- 3.
(JA) 酸素欠損を有する六方晶のタングステンブロンズを含み、 前記タングステンブロンズは、一般式:MWO3-y(ただし、元素Mは少なくともK、Rb、Csから選択された1種類以上を含み、0.15≦x≦0.33、0<y≦0.46)で表され、 酸素空孔濃度Nが4.0×1014cm-3以上8.0×1021cm-3以下である電磁波吸収粒子を提供する。
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)