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1. (WO2019030804) SURFACE MODIFYING DEVICE
Latest bibliographic data on file with the International BureauSubmit observation

Pub. No.: WO/2019/030804 International Application No.: PCT/JP2017/028617
Publication Date: 14.02.2019 International Filing Date: 07.08.2017
Chapter 2 Demand Filed: 16.11.2018
IPC:
C08J 7/00 (2006.01) ,B01J 19/08 (2006.01) ,B29C 59/14 (2006.01) ,H05H 1/24 (2006.01)
C CHEMISTRY; METALLURGY
08
ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
J
WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H142
7
Chemical treatment or coating of shaped articles made of macromolecular substances
B PERFORMING OPERATIONS; TRANSPORTING
01
PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
J
CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS, COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
19
Chemical, physical, or physico-chemical processes in general; Their relevant apparatus
08
Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
B PERFORMING OPERATIONS; TRANSPORTING
29
WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
C
SHAPING OR JOINING OF PLASTICS; SHAPING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL; AFTER- TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
59
Surface shaping, e.g. embossing; Apparatus therefor
14
by plasma treatment
H ELECTRICITY
05
ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
H
PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY- CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
1
Generating plasma; Handling plasma
24
Generating plasma
Applicants:
春日電機株式会社 KASUGA DENKI, INC. [JP/JP]; 神奈川県川崎市幸区新川崎2番4号 2-4, Shinkawasaki Saiwai-ku, Kawasaki-shi Kanagawa 2120032, JP
Inventors:
小木曽 智 OGISO Satoru; JP
森下 貴生 MORISHITA Takao; JP
櫻井 行平 SAKURAI Yukihira; JP
吉田 純也 YOSHIDA Junya; JP
杉村 智 SUGIMURA Satoshi; JP
Agent:
嶋 宣之 SHIMA Nobuyuki; JP
Priority Data:
Title (EN) SURFACE MODIFYING DEVICE
(FR) DISPOSITIF DE MODIFICATION DE SURFACE
(JA) 表面改質装置
Abstract:
(EN) [Problem] The present invention addresses the problem of reducing the supply quantity of a replacement gas by directly discharging the gas from a discharge electrode, and stabilizing plasma generation by uniformizing gas pressure distribution. [Solution] A discharge electrode E in an electrode chamber C comprises a plurality of electrode members 8, 9. The electrode members 8, 9 are disposed facing each other by having a supporting member 4 therebetween, a gap is formed between the facing portions of the electrode members 8, 9, and by having the gap as a gas passageway 15, the gas passageway is opened in the leading end of the discharge electrode. A replacement gas having been supplied from a manifold pipe 3 is supplied to the gas passageway 15 via an orifice.
(FR) La présente invention a pour objet de réduire la quantité d'alimentation en gaz de remplacement par décharge directe du gaz à partir d'une électrode de décharge, et de stabiliser la génération de plasma par uniformisation de la répartition de pression gazeuse. Selon l'invention, une électrode de décharge E dans une chambre d'électrode C comprend une pluralité d'éléments d'électrode (8, 9). Les éléments d'électrode (8, 9) sont disposés l'un en face de l'autre, un élément de support (4) étant disposé entre eux. Un espace est formé entre les parties opposées des éléments d'électrode (8, 9), l'espace servant de passage de gaz (15), le passage de gaz étant ouvert au niveau de l'extrémité avant de l'électrode de décharge. Un gaz de remplacement provenant d'un tuyau collecteur (3) est acheminé vers le passage de gaz (15) par l'intermédiaire d'un orifice.
(JA) 【課題】放電電極からガスを直接放出させて、置換ガスの供給量を少なくするとともに、ガス圧分布を均等にして、プラズマ生成を安定させる。 【解決手段】 電極チャンバーC内の放電電極Eは、複数の電極部材8,9からなる。そして、これら複数の電極部材8,9は支持部材4を挟持して対向配置されるとともに、これら複数の電極部材8,9の対向部分にすき間が形成され、このすき間をガス通路15として放電電極の先端に開放している。そして、上記ガス通路15にはマニホールドパイプ3から供給された置換ガスを、オリフィスを介して供給する。
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)