Some content of this application is unavailable at the moment.
If this situation persist, please contact us atFeedback&Contact
1. (WO2019028324) POLISHING PAD WITH WINDOW AND MANUFACTURING METHODS THEREOF
Latest bibliographic data on file with the International Bureau    Submit observation

Pub. No.: WO/2019/028324 International Application No.: PCT/US2018/045122
Publication Date: 07.02.2019 International Filing Date: 03.08.2018
IPC:
B24B 37/013 (2012.01) ,B24B 37/20 (2012.01) ,B24B 37/24 (2012.01)
B PERFORMING OPERATIONS; TRANSPORTING
24
GRINDING; POLISHING
B
MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
37
Lapping machines or devices; Accessories
005
Control means for lapping machines or devices
013
Devices or means for detecting lapping completion
B PERFORMING OPERATIONS; TRANSPORTING
24
GRINDING; POLISHING
B
MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
37
Lapping machines or devices; Accessories
11
Lapping tools
20
Lapping pads for working plane surfaces
B PERFORMING OPERATIONS; TRANSPORTING
24
GRINDING; POLISHING
B
MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
37
Lapping machines or devices; Accessories
11
Lapping tools
20
Lapping pads for working plane surfaces
24
characterised by the composition or properties of the pad materials
Applicants:
APPLIED MATERIALS, INC. [US/US]; 3050 Bowers Avenue Santa Clara, California 95054, US
Inventors:
FU, Boyi; US
GANAPATHIAPPAN, Sivapackia; US
REDFIELD, Daniel; US
BAJAJ, Rajeev; US
CHOCKALINGAM, Ashwin; US
BENVEGNU, Dominic J.; US
CORNEJO, Mario Dagio; US
YAMAMURA, Mayu; US
PATIBANDLA, Nag B.; US
VORA, Ankit; US
Agent:
PATTERSON, B. Todd; US
STEVENS, Joseph J.; US
Priority Data:
62/541,49704.08.2017US
62/562,23722.09.2017US
Title (EN) POLISHING PAD WITH WINDOW AND MANUFACTURING METHODS THEREOF
(FR) TAMPON À POLIR DOTÉ D’UNE FENÊTRE ET SES PROCÉDÉS DE FABRICATION
Abstract:
(EN) Embodiments of the present disclosure provide for polishing pads that include at least one endpoint detection (EPD) window disposed through the polishing pad material, and methods of forming thereof. In one embodiment a method of forming a polishing pad includes forming a first layer of the polishing pad by dispensing a first precursor composition and a window precursor composition, the first layer comprising at least portions of each of a first polishing pad element and a window feature, and partially curing the dispensed first precursor composition and the dispensed window precursor composition disposed within the first layer.
(FR) La présente invention concerne, selon certains modes de réalisation, des tampons à polir qui comprennent au moins une fenêtre de détection de point d'extrémité (EPD) disposée dans le matériau de tampon à polir, et leurs procédés de formation. Selon un mode de réalisation, un procédé de formation d'un tampon à polir consiste à former une première couche du tampon à polir par distribution d'une première composition de précurseur et d'une composition de précurseur de fenêtre, la première couche comprenant au moins des parties d'un premier organe de tampon à polir et d'un élément fenêtre, et à durcir partiellement la première composition de précurseur distribuée et la composition de précurseur de fenêtre distribuée disposées dans la première couche.
front page image
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: English (EN)
Filing Language: English (EN)