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1. (WO2019027907) 1,1,1-TRIS(ORGANOAMINO)DISILANE COMPOUNDS AND METHOD OF PREPARING SAME
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Pub. No.: WO/2019/027907 International Application No.: PCT/US2018/044392
Publication Date: 07.02.2019 International Filing Date: 30.07.2018
IPC:
C01B 33/04 (2006.01) ,C07F 7/10 (2006.01) ,C23C 16/00 (2006.01)
C CHEMISTRY; METALLURGY
01
INORGANIC CHEMISTRY
B
NON-METALLIC ELEMENTS; COMPOUNDS THEREOF
33
Silicon; Compounds thereof
04
Hydrides of silicon
C CHEMISTRY; METALLURGY
07
ORGANIC CHEMISTRY
F
ACYCLIC, CARBOCYCLIC, OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
7
Compounds containing elements of the 4th Group of the Periodic System
02
Silicon compounds
08
Compounds having one or more C-Si linkages
10
containing nitrogen
C CHEMISTRY; METALLURGY
23
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
C
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
16
Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (CVD) processes
Applicants:
DOW SILICONES CORPORATION [US/US]; 2200 West Salzburg Road Auburn, Michigan 48686-0994, US
Inventors:
HWANG, Byung K.; US
ZHOU, Xiaobing; US
Agent:
PECK, Randall J.; US
BALLOR, Nicholas R.; US
BECKER, Rebecca A.; US
BONDARENKO, Gregory P.; US
BURPEE, Charles E.; US
CIARAVINO, Vito A.; US
COLLINS, Catherine S.; US
DANI, William P.; US
DEVRIES, Nathan J.; US
GOSKA, Matthew L.; US
HARRIER, Ian M.; US
ISTVAN-MITCHELL, Wyatt J.; US
KLEINHEKSEL, Chad E.; US
SHUNTA, Dustin H.; US
Priority Data:
62/538,95731.07.2017US
Title (EN) 1,1,1-TRIS(ORGANOAMINO)DISILANE COMPOUNDS AND METHOD OF PREPARING SAME
(FR) COMPOSÉS 1,1,1-TRIS(ORGANOAMINO)DISILANES ET LEUR PROCÉDÉ DE PRÉPARATION
Abstract:
(EN) A 1,1,1-tris(organoamino)disilane compound and a method of preparing the 1,1,1-tris(organoamino)disilane compound are disclosed. The method comprises aminating a 1,1,1-trihalodisilane with an aminating agent comprising an organoamine compound to give a reaction product comprising the 1,1,1-tris(organoamino)disilane compound, thereby preparing the 1,1,1-tris(organoamino)disilane compound. A film-forming composition is also disclosed. The film-forming composition comprises the 1,1,1-tris(organoamino)disilane compound. A film formed with the film-forming composition, and a method of forming the film, are also disclosed. The method of forming the film comprises subjecting the film-forming composition comprising the 1,1,1-tris(organoamino)disilane compound to a deposition condition in the presence of a substrate, thereby forming the film on the substrate.
(FR) La présente invention concerne un composé 1,1,1-tris(organoamino)disilane et un procédé de préparation du composé 1,1,1-tris(organoamino)disilane. Le procédé comprend l’amination de 1,1,1-trihalodisilane avec un agent d’amination comprenant un composé organoamine pour donner un produit réactionnel comprenant le composé 1,1,1-tris(organoamino)disilane, préparant ainsi le composé 1,1,1-tris(organoamino)disilane. La présente invention concerne également une composition formant film. La composition formant film comprend le composé 1,1,1-tris(organoamino)disilane. La présente invention concerne également un film formé avec la composition formant film, et un procédé de formation du film. Le procédé de formation du film comprend la soumission de la composition formant film comprenant le composé 1,1,1-tris(organoamino)disilane à une condition de dépôt en présence d’un substrat, formant ainsi le film sur le substrat.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: English (EN)
Filing Language: English (EN)