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1. (WO2019027737) OPTIMIZED SUB-SAMPLING IN AN ELECTRON MICROSCOPE
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Pub. No.: WO/2019/027737 International Application No.: PCT/US2018/043486
Publication Date: 07.02.2019 International Filing Date: 24.07.2018
IPC:
G01N 23/2251 (2018.01) ,G06T 1/00 (2006.01) ,G06T 7/00 (2006.01)
[IPC code unknown for G01N 23/2251]
G PHYSICS
06
COMPUTING; CALCULATING; COUNTING
T
IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
1
General purpose image data processing
G PHYSICS
06
COMPUTING; CALCULATING; COUNTING
T
IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
7
Image analysis, e.g. from bit-mapped to non bit-mapped
Applicants:
BATTELLE MEMORIAL INSTITUTE [US/US]; 902 Battelle Boulevard Richland, WA 99354, US
Inventors:
STEVENS, Andrew, J.; US
KOVARIK, Libor; US
LIYU, Andrey, V.; US
BROWNING, Nigel, D.; US
Agent:
MCGRATH, Ethan, A.; US
Priority Data:
15/666,15901.08.2017US
Title (EN) OPTIMIZED SUB-SAMPLING IN AN ELECTRON MICROSCOPE
(FR) SOUS-ÉCHANTILLONNAGE OPTIMISÉ DANS UN MICROSCOPE ÉLECTRONIQUE
Abstract:
(EN) Disclosed are methods for optimized sub-sampling in an electron microscope. With regard at least to utilization of electron dose budgets, of time for acquisition of measurements, and of computing/processing capabilities, very high efficiencies can be achieved by informing and/or adapting subsequent sub-sampling measurements according to one or more earlier-acquired sparse datasets and/or according to analyses thereof.
(FR) L'invention concerne des procédés de sous-échantillonnage optimisé dans un microscope électronique. En ce qui concerne au moins l'utilisation de prévisions de dose d'électrons, de temps d'acquisition de mesures, et de capacités de calcul/traitement, des rendements très élevés peuvent être obtenus en informant et/ou en adaptant des mesures de sous-échantillonnage ultérieures selon un ou plusieurs ensembles de données épars acquis précédemment et/ou selon des analyses de ceux-ci.
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: English (EN)
Filing Language: English (EN)