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1. (WO2019027388) A CLEANING METHOD AND SYSTEM
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Pub. No.: WO/2019/027388 International Application No.: PCT/TR2018/050043
Publication Date: 07.02.2019 International Filing Date: 06.02.2018
IPC:
H01L 23/00 (2006.01)
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
23
Details of semiconductor or other solid state devices
Applicants:
ASELSAN ELEKTRONİK SANAYİ VE TİCARET ANONİM ŞİRKETİ [TR/TR]; Mehmet Akif Ersoy Mahallesi 296. Cadde No:16 Yenimahalle/Ankara, TR
Inventors:
BÖLÜKBAŞ, Başar; TR
MERT, Emre; TR
Agent:
DESTEK PATENT, INC.; Lefkoşe Cad. NM Ofis Park B Blok No: 36/5 Beşevler 16110 Bursa, TR
Priority Data:
2017/0462228.03.2017TR
Title (EN) A CLEANING METHOD AND SYSTEM
(FR) PROCÉDÉ ET SYSTÈME DE NETTOYAGE
Abstract:
(EN) The present invention develops a cleaning system and a cleaning method to clean the paste which overflows at least one hole (4), which is on the substrate (1) on to at least one substrate (1) during the production of ceramics sintered together at low temperature. The mentioned cleaning system includes at least one adhesive tape (2) that adheres on the paste which overflows the hole (4) and which is convenient for placing over the substrate (1) and at least one pressing element (3) which presses the said adhesive tape (2) towards the substrate (1) in order for said adhesive tape (2) to adhere on the paste that overflows from the hole (4). The said cleaning method includes laying at least one adhesive tape (2) over the substrate (1); pressing the adhesive tape (2) towards the substrate (1) by at least one pressing element (3) and enabling the adhesion of the adhesive tape (2) to the paste that overflows the hole (4); and separation of the adhesive tape (2) that adheres on the paste which overflows the hole (4) from the substrate (1).
(FR) La présente invention développe un système de nettoyage et un procédé de nettoyage pour nettoyer la pâte qui déborde d'au moins un trou (4), qui est sur le substrat (1) sur au moins un substrat (1) pendant la production de céramiques agglomérées ensemble par frittage à basse température. Le système de nettoyage mentionné comprend au moins une bande adhésive (2) qui adhère à la pâte qui déborde du trou (4) et qui est pratique à placer sur le substrat (1) et au moins un élément de pression (3) qui appuie ladite bande adhésive (2) contre le substrat (1) afin de faire adhérer ladite bande adhésive (2) à la pâte qui déborde du trou (4). Ledit procédé de nettoyage comprend la pose d'au moins une bande adhésive (2) sur le substrat (1); la pression de la bande adhésive (2) contre le substrat (1) à l'aide d'au moins un élément de pression (3) et le fait de permettre l'adhérence de la bande adhésive (2) à la pâte qui déborde du trou (4); et la séparation de la bande adhésive (2), qui adhère à la pâte qui déborde du trou (4), par rapport au substrat (1).
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: English (EN)
Filing Language: ???LANGUAGE_SYMBOL_TR??? (TR)