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1. (WO2019027204) ACTUATOR COIL STRUCTURE AND METHOD FOR MANUFACTURING SAME
Latest bibliographic data on file with the International Bureau    Submit observation

Pub. No.: WO/2019/027204 International Application No.: PCT/KR2018/008615
Publication Date: 07.02.2019 International Filing Date: 30.07.2018
IPC:
H01F 5/00 (2006.01) ,H01F 41/04 (2006.01) ,G03B 3/00 (2006.01) ,G03B 5/00 (2006.01)
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
F
MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
5
Coils
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
F
MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
41
Apparatus or processes specially adapted for manufacturing or assembling the devices covered by this subclass
02
for manufacturing cores, coils or magnets
04
for manufacturing coils
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
B
APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
3
Focusing arrangements of general interest for cameras, projectors or printers
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
B
APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
5
Adjustment of optical system relative to image or object surface other than for focusing of general interest for cameras, projectors or printers
Applicants:
주식회사 케이비켐 KBCHEM CO., LTD. [KR/KR]; 경기도 시흥시 산기대학로 237, 벤처동 201호 #201, Venturedong, 237, Sangidaehak-ro Siheung-si Gyeonggi-do 15073, KR
Inventors:
박종익 PARK, Jong Ik; KR
Agent:
김한 KIM, Han; KR
김남식 KIM, Nam Sik; KR
이인행 LEE, In Haeng; KR
Priority Data:
10-2017-009691631.07.2017KR
10-2017-013281312.10.2017KR
Title (EN) ACTUATOR COIL STRUCTURE AND METHOD FOR MANUFACTURING SAME
(FR) STRUCTURE DE BOBINE D'ACTIONNEUR ET SON PROCÉDÉ DE FABRICATION
(KO) 액추에이터 코일 구조체 및 그 제조방법
Abstract:
(EN) The present invention provides a method for manufacturing an actuator coil structure, the method comprising: a step for disposing, on a substrate, a base layer including polyimide; a step for forming conductive micro-pattern coils on the base layer through a plating process; a step for filling the space between the micro-pattern coils with an insulating layer; and a step for separating and removing the substrate from the base layer, thereby forming an actuator coil structure for camera autofocus or shake prevention.
(FR) La présente invention concerne un procédé de fabrication d'une structure de bobine d'actionneur, le procédé comprenant : une étape consistant à disposer, sur un substrat, une couche de support comprenant du polyimide ; une étape consistant à former des micro-bobines conductrices à motif sur la couche de support par l'intermédiaire d'un processus de placage ; une étape consistant à remplir l'espace entre les micro-bobines à motif d'une couche isolante ; et une étape consistant à séparer puis à retirer le substrat de la couche de support, formant ainsi une structure de bobine d'actionneur servant à la prévention des secousses ou à la mise au point automatique d'une caméra.
(KO) 본 발명은 기판 상에 폴리이미드를 포함하는 기저층을 배치하는 단계; 상기 기저층 상에 도금 공정으로 도전성의 마이크로패턴 코일을 형성하는 단계; 상기 마이크로패턴 코일 사이의 공간을 절연층으로 충전하는 단계; 및 상기 기판을 상기 기저층과 분리하여 제거함으로써, 카메라 자동초점 또는 손떨림방지를 위한 액추에이터 코일 구조체를 형성하는 단계;를 포함하는, 액추에이터 코일의 제조방법을 제공한다.
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Korean (KO)
Filing Language: Korean (KO)