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1. (WO2019027153) COMPOSITE OXIDE SINTERED BODY, SPUTTERING TARGET, AND METHOD FOR MANUFACTURING OXIDE TRANSPARENT CONDUCTIVE FILM
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Pub. No.: WO/2019/027153 International Application No.: PCT/KR2018/007802
Publication Date: 07.02.2019 International Filing Date: 10.07.2018
IPC:
C04B 35/462 (2006.01) ,C23C 14/34 (2006.01) ,C23C 14/08 (2006.01) ,H01B 5/14 (2006.01) ,H01B 1/08 (2006.01)
C CHEMISTRY; METALLURGY
04
CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
B
LIME; MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
35
Shaped ceramic products characterised by their composition; Ceramic compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
01
based on oxides
46
based on titanium oxides or titanates
462
based on titanates
C CHEMISTRY; METALLURGY
23
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
C
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
14
Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
22
characterised by the process of coating
34
Sputtering
C CHEMISTRY; METALLURGY
23
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
C
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
14
Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
06
characterised by the coating material
08
Oxides
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
B
CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
5
Non-insulated conductors or conductive bodies characterised by their form
14
comprising conductive layers or films on insulating-supports
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
B
CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
1
Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
06
mainly consisting of other non-metallic substances
08
oxides
Applicants:
주식회사 나노신소재 ADVANCED NANO PRODUCTS CO., LTD. [KR/KR]; 세종시 부강면 금호안골길 78 (부용지방산업단지내) (Buyong Regional Industrial Complex) 78, Geumhoangol-gil, Bugang-myeon, Sejong 30077, KR
Inventors:
김상희 KIM, Sang-Hui; KR
Agent:
특허법인오암 OAM PATENT & TRADEMARK LAW FIRM; 대전시 서구 문예로 69, 201호(둔산동, 오성빌딩) (Osung Bldg., Dunsan-dong)201, 69, Munye-ro, Seo-gu, Daejeon 35240, KR
Priority Data:
10-2017-009844903.08.2017KR
Title (EN) COMPOSITE OXIDE SINTERED BODY, SPUTTERING TARGET, AND METHOD FOR MANUFACTURING OXIDE TRANSPARENT CONDUCTIVE FILM
(FR) CORPS FRITTÉ OBTENU PAR FRITTAGE D'UN OXYDE COMPOSITE, CIBLE DE PULVÉRISATION ET PROCÉDÉ DE FABRICATION D’UN FILM CONDUCTEUR TRANSPARENT D'OXYDE
(KO) 복합 산화물 소결체 및 스퍼터링 타겟, 산화물 투명도전막의 제조방법
Abstract:
(EN) The present invention provides: a composite oxide sintered body in which a composite oxide sintered body composition comprising indium, titanium, zirconium and oxygen comprises, as a dopant (X), one element among gallium, tantalum and niobium, wherein the titanium is included in an atomic ratio of Ti/(In+Ti+Zr+X) of 0.1-0.5 atom% and the zirconium is included in an atomic ratio of Zr/(In+Ti+Zr+X) of 0.1-1.5 atom%; a sputtering target formed from a sintered body; and an oxide transparent conductive film manufactured therefrom.
(FR) La présente invention concerne : un corps fritté obtenu par frittage d'un oxyde composite, dans lequel une composition de corps fritté obtenu par frittage d'un oxyde composite, contenant de l'indium, du titane, du zirconium et de l'oxygène, comprend en tant que dopant (X) un élément parmi le gallium, le tantale et le niobium, le titane étant contenu dans un rapport atomique Ti/(In+Ti+Zr+X) de 0,1 à 0,5 % atomique et le zirconium étant contenu dans un rapport atomique Zr/(In+Ti+Zr+X) de 0,1 à 1,5 % atomique ; une cible de pulvérisation formée à partir d'un corps fritté ; et un film conducteur transparent d'oxyde fabriqué à partir de celui-ci.
(KO) 본 발명은 인듐, 티타늄, 지르코늄 및 산소를 포함하는 복합 산화물 소결체 조성물에 도펀트(X)로 갈륨, 탄탈륨, 니오븀 중 하나의 성분을 포함하고, 상기 티타늄은 원자비로 Ti/(In+Ti+Zr+X)가 0.1 ~ 0.5 원자%, 상기 지르코늄은 원자비로 Zr/(In+Ti+Zr+X)가 0.1 ~ 1.5 원자%를 포함하는 것을 특징으로 하는 복합산화물 소결체 및 상기 소결체로 이루어진 스퍼터링 타겟 및 이로부터 제조된 산화물 투명 도전막을 제공하는 것을 특징으로 한다.
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Korean (KO)
Filing Language: Korean (KO)