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1. (WO2019027076) POLISHING PAD DRESSER HAVING SURFACE PORES AND METHOD FOR MANUFACTURING DIAMOND
Latest bibliographic data on file with the International Bureau    Submit observation

Pub. No.: WO/2019/027076 International Application No.: PCT/KR2017/008623
Publication Date: 07.02.2019 International Filing Date: 09.08.2017
IPC:
B24D 3/10 (2006.01) ,B24B 53/017 (2012.01) ,B24B 53/12 (2006.01)
B PERFORMING OPERATIONS; TRANSPORTING
24
GRINDING; POLISHING
D
TOOLS FOR GRINDING, BUFFING OR SHARPENING
3
Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents
02
the constituent being used as bonding agent
04
and being essentially inorganic
06
metallic
10
for porous or cellular structure, e.g. for use with diamonds as abrasives
B PERFORMING OPERATIONS; TRANSPORTING
24
GRINDING; POLISHING
B
MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
53
Devices or means for dressing or conditioning abrasive surfaces
017
Devices or means for dressing, cleaning or otherwise conditioning lapping tools
B PERFORMING OPERATIONS; TRANSPORTING
24
GRINDING; POLISHING
B
MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
53
Devices or means for dressing or conditioning abrasive surfaces
12
Dressing tools; Holders therefor
Applicants:
새솔다이아몬드공업 주식회사 SAESOL DIAMOND IND. CO., LTD. [KR/KR]; 경기도 안산시 단원구 신원로91번길 61 61, Sinwon-ro 91beon-gil, Danwon-gu Ansan-si, Gyeonggi-do 15423, KR
Inventors:
맹주호 MAENG, Ju-Ho; KR
김태경 KIM, Tai-Kyung; KR
이상호 LEE, Sang-Ho; KR
최우영 CHOI, Woo-Young; KR
Agent:
한양특허법인 HANYANG PATENT FIRM; 서울시 강남구 논현로38길 12, 한양빌딩 Hanyang building, 12, Nonhyeonro 38-gil, Gangnam-gu Seoul 06296, KR
Priority Data:
10-2017-009793502.08.2017KR
Title (EN) POLISHING PAD DRESSER HAVING SURFACE PORES AND METHOD FOR MANUFACTURING DIAMOND
(FR) DRESSEUR DE TAMPON DE POLISSAGE AYANT DES PORES EN SURFACE ET PROCÉDÉ DE FABRICATION DE DIAMANT
(KO) 표면공극이 있는 연마패드 드레서 및 다이아몬드 제조방법
Abstract:
(EN) The present invention relates to a polishing pad dresser having surface pores and a method for manufacturing the same, wherein the surface pores are generated by preparing a diamond having a predetermined angle between the mid-point of vertices and a corner, subjecting the diamond to an acid treatment in which the diamond is heated in nitric acid mixed with iron nitrate at a predetermined temperature range, and then sintering the diamond in a nickel powder at another predetermined temperature range.
(FR) La présente invention concerne un dresseur de tampon de polissage ayant des pores en surface et son procédé de fabrication, les pores en surface étant produits par la préparation d'un diamant présentant un angle prédéfini entre le point situé à mi-chemin des sommets et un coin, par la soumission du diamant à un traitement acide dans lequel le diamant est chauffé dans de l'acide nitrique mélangé à du nitrate de fer à une température comprise dans une plage prédéfinie, puis par le frittage du diamant dans une poudre de nickel à une température comprise dans une autre plage prédéfinie.
(KO) 본 발명은 꼭지점의 중앙점과 모서리가 일정각도인 다이아몬드를 준비하고, 이를 질산철이 혼합된 질산에서 일정온도 범위에서 가열하는 산처리 후에 또다른 일정 온도범위에서 니켈 파우더 속에서 소결함으로서 표면공극을 생성하는 표면공극을 형성한 연마패드 드레서 및 그 제조방법에 관한 것이다.
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Korean (KO)
Filing Language: Korean (KO)