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1. (WO2019026896) STATUS MONITORING SYSTEM AND STATUS MONITORING METHOD
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Pub. No.: WO/2019/026896 International Application No.: PCT/JP2018/028616
Publication Date: 07.02.2019 International Filing Date: 31.07.2018
IPC:
B25J 19/06 (2006.01) ,H01L 21/677 (2006.01)
B PERFORMING OPERATIONS; TRANSPORTING
25
HAND TOOLS; PORTABLE POWER-DRIVEN TOOLS; HANDLES FOR HAND IMPLEMENTS; WORKSHOP EQUIPMENT; MANIPULATORS
J
MANIPULATORS; CHAMBERS PROVIDED WITH MANIPULATION DEVICES
19
Accessories fitted to manipulators, e.g. for monitoring, for viewing; Safety devices combined with or specially adapted for use in connection with manipulators
06
Safety devices
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21
Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
67
Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components
677
for conveying, e.g. between different work stations
Applicants:
川崎重工業株式会社 KAWASAKI JUKOGYO KABUSHIKI KAISHA [JP/JP]; 兵庫県神戸市中央区東川崎町3丁目1番1号 1-1, Higashikawasaki-cho 3-chome, Chuo-ku, Kobe-shi, Hyogo 6508670, JP
Inventors:
吉田 雅也 YOSHIDA, Masaya; --
岡田 拓之 OKADA, Hiroyuki; --
藤森 一夫 FUJIMORI, Kazuo; --
Agent:
特許業務法人 有古特許事務所 PATENT CORPORATE BODY ARCO PATENT OFFICE; 兵庫県神戸市中央区東町123番地の1 貿易ビル3階 3rd Fl., Bo-eki Bldg., 123-1, Higashimachi, Chuo-ku, Kobe-shi, Hyogo 6500031, JP
Priority Data:
2017-15163604.08.2017JP
Title (EN) STATUS MONITORING SYSTEM AND STATUS MONITORING METHOD
(FR) SYSTÈME DE SURVEILLANCE D'ÉTAT ET PROCÉDÉ DE SURVEILLANCE D'ÉTAT
(JA) 状態監視システム及び状態監視方法
Abstract:
(EN) Provided is a status monitoring system 10 for monitoring the status of a robot 20 that performs work on a workpiece W, the system being characterized by executing: step S1 for deriving a deterioration index parameter by acquiring status data from a sensor; step S2 for determining whether or not the deterioration index parameter exceeds a first threshold that is determined in advance to be a lower level than a level requiring breakdown-maintenance; step S4 for further determining whether or not the frequency, at which the deterioration index parameter is determined to exceed the first threshold, exceeds a frequency threshold that is determined in advance; and step S5 for controlling the operation of the robot 20 other than by stopping.
(FR) L'invention concerne un système de surveillance d'état (10) destiné à surveiller l'état d'un robot (20) qui effectue un travail sur une pièce W, le système étant caractérisé par l'exécution : d’une étape (S1) destinée à dériver un paramètre d'indice de détérioration par acquisition de données d'état à partir d'un capteur ; d’une étape (S2) destinée à déterminer si oui ou non le paramètre d'indice de détérioration dépasse un premier seuil qui est déterminé au préalable comme étant un niveau inférieur à un niveau nécessitant un dépannage ; d’une étape (S4) destinée à déterminer en outre si oui ou non la fréquence, à laquelle le paramètre d'indice de détérioration est déterminé comme dépassant le premier seuil, dépasse un seuil de fréquence qui est déterminé au préalable ; et d’une étape (S5) destinée à commander le fonctionnement du robot (20) autrement qu’en l’arrêtant.
(JA) ワークWに対して作業を行うロボット20の状態を監視するための状態監視システム10であって、センサから状態データを取得して劣化指標パラメータを導出するステップS1と、劣化指標パラメータが、事後保全を要するレベルよりも低いレベルに予め定められた第1の閾値を超えたか否かを判定するステップS2と、劣化指標パラメータが第1の閾値を超えたと判定した頻度が予め定められた頻度の閾値を超えたか否かをさらに判定するステップS4と、前記頻度が頻度の閾値を超えたと判定した場合に、ロボット20の動作を停止以外で抑制するステップS5と、を実行することを特徴とする。
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)