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1. (WO2019026868) METHOD FOR RECOVERING DIMETHYL SULFOXIDE FROM RECOVERED RESIST REMOVER
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Pub. No.: WO/2019/026868 International Application No.: PCT/JP2018/028539
Publication Date: 07.02.2019 International Filing Date: 31.07.2018
IPC:
C07C 315/06 (2006.01) ,C07C 317/04 (2006.01)
C CHEMISTRY; METALLURGY
07
ORGANIC CHEMISTRY
C
ACYCLIC OR CARBOCYCLIC COMPOUNDS
315
Preparation of sulfones; Preparation of sulfoxides
06
Separation; Purification; Stabilisation; Use of additives
C CHEMISTRY; METALLURGY
07
ORGANIC CHEMISTRY
C
ACYCLIC OR CARBOCYCLIC COMPOUNDS
317
Sulfones; Sulfoxides
02
having sulfone or sulfoxide groups bound to acyclic carbon atoms
04
of an acyclic saturated carbon skeleton
Applicants:
株式会社クラレ KURARAY CO., LTD. [JP/JP]; 岡山県倉敷市酒津1621番地 1621, Sakazu, Kurashiki-shi, Okayama 7100801, JP
Inventors:
馬屋原 邦男 MAYAHARA, Kunio; JP
田村 耕司 TAMURA, Koji; JP
竹田 明展 TAKEDA, Akinobu; JP
Agent:
有永 俊 ARINAGA, Shun; JP
Priority Data:
2017-14984602.08.2017JP
Title (EN) METHOD FOR RECOVERING DIMETHYL SULFOXIDE FROM RECOVERED RESIST REMOVER
(FR) PROCÉDÉ DE RÉCUPÉRATION DE SULFOXYDE DE DIMÉTHYLE À PARTIR D'UN DÉCAPANT DE RÉSERVE RÉCUPÉRÉ
(JA) 回収レジスト剥離剤からのジメチルスルホキシドの回収方法
Abstract:
(EN) A method for recovering dimethyl sulfoxide, which comprises a step wherein water and a recovered resist remover that contains dimethyl sulfoxide and at least one compound selected from the group consisting of glycol ethers, glycols and triols are brought into contact with each other and distilled.
(FR) La présente invention concerne un procédé de récupération de sulfoxyde de diméthyle, qui comprend une étape dans laquelle de l'eau et un décapant de réserve récupéré contenant du sulfoxyde de diméthyle et au moins un composé choisi dans le groupe constitué par les éthers de glycol, les glycols et les triols sont mis en contact l'un avec l'autre et distillés.
(JA) グリコールエーテル、グリコールおよびトリオールからなる群から選択され る少なくとも1種の化合物ならびにジメチルスルホキシドを含む回収レジスト剥離剤と水とを接触させて蒸留する工程を含む、ジメチルスルホキシドの回収方法。
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)