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1. (WO2019026549) ACTIVE-LIGHT-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMATION METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE
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Pub. No.: WO/2019/026549 International Application No.: PCT/JP2018/025786
Publication Date: 07.02.2019 International Filing Date: 06.07.2018
IPC:
G03F 7/038 (2006.01) ,C08F 220/26 (2006.01) ,G03F 7/039 (2006.01) ,G03F 7/20 (2006.01)
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004
Photosensitive materials
038
Macromolecular compounds which are rendered insoluble or differentially wettable
C CHEMISTRY; METALLURGY
08
ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
F
MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
220
Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide, or nitrile thereof
02
Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
10
Esters
26
Esters containing oxygen in addition to the carboxy oxygen
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004
Photosensitive materials
039
Macromolecular compounds which are photodegradable, e.g. positive electron resists
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
20
Exposure; Apparatus therefor
Applicants:
富士フイルム株式会社 FUJIFILM CORPORATION [JP/JP]; 東京都港区西麻布２丁目２６番３０号 26-30, Nishiazabu 2-chome, Minato-ku, Tokyo 1068620, JP
Inventors:
浅川　大輔 ASAKAWA Daisuke; JP
後藤　研由 GOTO Akiyoshi; JP
小島　雅史 KOJIMA Masafumi; JP
加藤　啓太 KATO Keita; JP
山本　恵士 YAMAMOTO Keishi; JP
Agent:
中島　順子 NAKASHIMA Junko; JP
米倉　潤造 YONEKURA Junzo; JP
村上　泰規 MURAKAMI Yasunori; JP
Priority Data:
2017-14797131.07.2017JP
2017-19118729.09.2017JP
Title (EN) ACTIVE-LIGHT-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMATION METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE
(FR) COMPOSITION DE RÉSINE SENSIBLE À LA LUMIÈRE ACTIVE OU AU RAYONNEMENT, FILM DE RÉSERVE, PROCÉDÉ DE FORMATION DE MOTIF ET PROCÉDÉ DE FABRICATION D'UN DISPOSITIF ÉLECTRONIQUE
(JA) 感活性光線性または感放射線性樹脂組成物、レジスト膜、パターン形成方法、電子デバイスの製造方法
Abstract:
(EN) Provided are: an active-light-sensitive or radiation-sensitive resin composition with which a resist film having excellent EL performance and a pattern having excellent LWR performance can be obtained; a resist film using the active-light-sensitive or radiation-sensitive resin composition; a pattern formation method; and a method for manufacturing an electronic device. The active-light-sensitive or radiation-sensitive resin composition includes: a resin having at least one type of repeating unit selected from the group consisting of repeating unit represented by general formula (1), and the repeating unit represented by general formula (2); and a photoacid generator.
(FR) L'invention concerne : une composition de résine sensible à la lumière active ou au rayonnement avec laquelle un film de réserve ayant une excellente performance EL et un motif ayant d'excellentes performances LWR peuvent être obtenus ; un film de réserve utilisant la composition de résine sensible à la lumière active ou au rayonnement ; un procédé de formation de motif ; et un procédé de fabrication d'un dispositif électronique. La composition de résine sensible à la lumière active ou au rayonnement comprend : une résine ayant au moins un type de motif récurrent choisi dans le groupe contenant le motif récurrent représenté par la formule générale (1) et le motif récurrent représenté par la formule générale (2) ; et un photogénérateur d'acide.
(JA) ＥＬ性能に優れるレジスト膜およびＬＷＲ性能に優れるパターンを得られる感活性光線性または感放射線性樹脂組成物、感活性光線性または感放射線性樹脂組成物を用いたレジスト膜、パターン形成方法、および、電子デバイスの製造方法を提供する。感活性光線性または感放射線性樹脂組成物は、一般式（１）で表される繰り返し単位、および、一般式（２）で表される繰り返し単位からなる群から選択される少なくとも１種の繰り返し単位を有する樹脂、ならびに、光酸発生剤を含む。
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)