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1. (WO2019026546) COPOLYMER AND PHOTOSENSITIVE RESIN COMPOSITION FOR COLOR FILTER
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Pub. No.: WO/2019/026546 International Application No.: PCT/JP2018/025725
Publication Date: 07.02.2019 International Filing Date: 06.07.2018
IPC:
C08F 220/36 (2006.01) ,G02B 5/20 (2006.01) ,G03F 7/004 (2006.01) ,G03F 7/033 (2006.01) ,G03F 7/40 (2006.01)
C CHEMISTRY; METALLURGY
08
ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
F
MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
220
Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide, or nitrile thereof
02
Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
10
Esters
34
Esters containing nitrogen
36
containing oxygen in addition to the carboxy oxygen
G PHYSICS
02
OPTICS
B
OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
5
Optical elements other than lenses
20
Filters
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004
Photosensitive materials
04
Chromates
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004
Photosensitive materials
027
Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
032
with binders
033
the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
26
Processing photosensitive materials; Apparatus therefor
40
Treatment after imagewise removal, e.g. baking
Applicants:
昭和電工株式会社 SHOWA DENKO K.K. [JP/JP]; 東京都港区芝大門一丁目13番9号 13-9, Shiba Daimon 1-chome, Minato-ku, Tokyo 1058518, JP
Inventors:
永井 英理 NAGAI, Eri; JP
木下 健宏 KINOSHITA, Takehiro; JP
川口 恭章 KAWAGUCHI, Yasuaki; JP
柳 正義 YANAGI, Masayoshi; JP
倉本 拓樹 KURAMOTO, Hiroki; JP
Agent:
曾我 道治 SOGA, MICHIHARU; 東京都千代田区丸の内三丁目1番1号 国際ビルディング 8階 曾我特許事務所 S. Soga & Co., 8th Floor, Kokusai Building, 1-1, Marunouchi 3-chome, Chiyoda-ku, Tokyo 1000005, JP
梶並 順 KAJINAMI, Jun; JP
大宅 一宏 OHYA, Kazuhiro; JP
Priority Data:
2017-15050103.08.2017JP
Title (EN) COPOLYMER AND PHOTOSENSITIVE RESIN COMPOSITION FOR COLOR FILTER
(FR) COPOLYMÈRE, ET COMPOSITION DE RÉSINE PHOTOSENSIBLE POUR FILTRE COLORÉ
(JA) 共重合体及びカラーフィルター用感光性樹脂組成物
Abstract:
(EN) A photosensitive resin composition for a color filter, the photosensitive resin composition containing: (A) a copolymer that contains (a) a structural unit having a blocked isocyanate group, (b) a structural unit having an acid group, and (c) a structural unit having an epoxy group; (B) a solvent; (C) a reactive diluent; (D) a photopolymerization initiator; and (E) a colorant.
(FR) L'invention concerne une composition de résine photosensible pour filtre coloré qui comprend : un copolymère (A) qui comprend à son tour une unité constitutive (a) possédant un groupe isocyanate séquencé, une unité constitutive (b) possédant un groupe acide et une unité constitutive (c) possédant un groupe époxy ; un solvant (B) ; un diluant réactif (C) ; un initiateur de polymérisation (D) ; et un agent colorant (E).
(JA) ブロックイソシアナト基を有する構成単位(a)と酸基を有する構成単位(b)とエポキシ基を有する構成単位(c)とを含有する共重合体(A)、溶剤(B)、反応性希釈剤(C)、光重合開始剤(D)及び着色剤(E)を含有するカラーフィルター用感光性樹脂組成物。
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)