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1. (WO2019026417) GAS SUPPLY SYSTEM
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Pub. No.: WO/2019/026417 International Application No.: PCT/JP2018/021739
Publication Date: 07.02.2019 International Filing Date: 06.06.2018
IPC:
F16K 7/16 (2006.01) ,F16K 31/44 (2006.01) ,F16K 31/50 (2006.01) ,H01L 21/31 (2006.01)
F MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
16
ENGINEERING ELEMENTS OR UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
K
VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
7
Diaphragm cut-off apparatus, e.g. with a member deformed, but not moved bodily, to close the passage
12
with flat, dished, or bowl-shaped diaphragm
14
arranged to be deformed against a flat seat
16
the diaphragm being mechanically actuated, e.g. by screw-spindle or cam
F MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
16
ENGINEERING ELEMENTS OR UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
K
VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
31
Operating means; Releasing devices
44
Mechanical actuating means
F MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
16
ENGINEERING ELEMENTS OR UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
K
VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
31
Operating means; Releasing devices
44
Mechanical actuating means
50
with screw-spindle
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21
Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
02
Manufacture or treatment of semiconductor devices or of parts thereof
04
the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer, carrier concentration layer
18
the devices having semiconductor bodies comprising elements of the fourth group of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
30
Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20-H01L21/26142
31
to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After-treatment of these layers; Selection of materials for these layers
Applicants:
株式会社フジキン FUJIKIN INCORPORATED [JP/JP]; 大阪府大阪市西区立売堀2丁目3番2号 3-2, Itachibori 2-chome, Nishi-ku, Osaka-shi, Osaka 5500012, JP
Inventors:
三浦 尊 MIURA Takeru; JP
中田 知宏 NAKATA Tomohiro; JP
稲田 敏之 INADA Toshiyuki; JP
渡辺 一誠 WATANABE Kazunari; JP
近藤 研太 KONDO Kenta; JP
佐藤 秀信 SATO Hidenobu; JP
Agent:
長門 侃二 NAGATO, Kanji; JP
Priority Data:
2017-14751331.07.2017JP
Title (EN) GAS SUPPLY SYSTEM
(FR) SYSTÈME D'ALIMENTATION EN GAZ
(JA) ガス供給システム
Abstract:
(EN) This gas supply system (1) is provided with: an automatic valve (18) which is provided in a flow passage (6) and which automatically opens and closes to regulate the flow rate of process gas to be supplied to a chamber (4); and a manual valve (20) provided in the flow passage (6) at a position downstream of the automatic valve (18) and closest to the chamber (4), and opened and closed manually to adjust the flow rate of the process gas. The manual valve (20) is a direct diaphragm valve having a diaphragm (24) which is seated on and separated from a seat (44) in coordination with a stem (32) and a disk (28) as the manual valve (20) is opened and closed. The manual valve (20) has a stroke regulation mechanism (36) for regulating the valve stroke.
(FR) L'invention concerne un système d'alimentation en gaz (1) comprenant : une soupape automatique (18) qui est disposée dans un passage d'écoulement (6) et qui s'ouvre et se ferme automatiquement pour réguler le débit du gaz de traitement devant être fourni à une chambre (4) ; et une soupape manuelle (20) disposée dans le passage d'écoulement (6) à une position en aval de la soupape automatique (18) et à une position la plus proche de la chambre (4), la soupape manuelle étant ouverte et fermée manuellement pour ajuster le débit du gaz de traitement. La soupape manuelle (20) est une soupape à membrane directe ayant une membrane (24) placée sur un siège (44) et séparée du siège (44) en coordination avec une tige (32) et un disque (28) lorsque la soupape manuelle (20) est ouverte et fermée. La soupape manuelle (20) possède un mécanisme de régulation de course (36) permettant de réguler la course de la soupape.
(JA) ガス供給システム(1)は、流路(6)に設けられて自動開閉によりチャンバ(4)に供給するプロセスガスの流量を調整する自動弁(18)と、流路(6)における自動弁(18)の下流であってチャンバ(4)の直近に設けられ、手動開閉によりプロセスガスの流量を調整する手動弁(20)とを備え、手動弁(20)は、開閉に伴いステム(32)及びディスク(28)と連動し、シート(44)に着座及び離座するダイヤフラム(24)を有するダイレクトダイヤフラム弁であって、バルブストロークを調整するストローク調整機構(36)を有する。
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)