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1. (WO2019026021) MICROREPLICATED POLISHING SURFACE WITH ENHANCED CO-PLANARITY
Latest bibliographic data on file with the International Bureau    Submit observation

Pub. No.: WO/2019/026021 International Application No.: PCT/IB2018/055815
Publication Date: 07.02.2019 International Filing Date: 02.08.2018
IPC:
B24B 37/26 (2012.01) ,B24B 37/16 (2012.01) ,B24B 37/22 (2012.01) ,B24B 37/24 (2012.01) ,B24D 3/28 (2006.01)
B PERFORMING OPERATIONS; TRANSPORTING
24
GRINDING; POLISHING
B
MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
37
Lapping machines or devices; Accessories
11
Lapping tools
20
Lapping pads for working plane surfaces
26
characterised by the shape of the lapping pad surface, e.g. grooved
B PERFORMING OPERATIONS; TRANSPORTING
24
GRINDING; POLISHING
B
MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
37
Lapping machines or devices; Accessories
11
Lapping tools
12
Lapping plates for working plane surfaces
16
characterised by the shape of the lapping plate surface, e.g. grooved
B PERFORMING OPERATIONS; TRANSPORTING
24
GRINDING; POLISHING
B
MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
37
Lapping machines or devices; Accessories
11
Lapping tools
20
Lapping pads for working plane surfaces
22
characterised by a multi-layered structure
B PERFORMING OPERATIONS; TRANSPORTING
24
GRINDING; POLISHING
B
MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
37
Lapping machines or devices; Accessories
11
Lapping tools
20
Lapping pads for working plane surfaces
24
characterised by the composition or properties of the pad materials
B PERFORMING OPERATIONS; TRANSPORTING
24
GRINDING; POLISHING
D
TOOLS FOR GRINDING, BUFFING OR SHARPENING
3
Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents
02
the constituent being used as bonding agent
20
and being essentially organic
28
Resins
Applicants:
3M INNOVATIVE PROPERTIES COMPANY [US/US]; 3M Center Post Office Box 33427 Saint Paul, Minnesota 55133-3427, US
Inventors:
MEYER, Kenneth A. P.; US
SULLIVAN, John J.; US
LUECK, Brian W.; US
LEHUU, Duy K.; US
MURADIAN, David J.; US
SLAMA, David F.; US
Agent:
BRAMWELL, Adam M.,; US
BLANK, Colene H.,; US
HARTS, Dean M. ,; US
LEVINSON, Eric D.,; US
MAKI, Eloise J.,; US
NOWAK, Sandra K.,; US
OLSON, Peter L.,; US
RHODES, Kevin H.; US
RINGSRED, Ted K.,; US
Priority Data:
62/541,36204.08.2017US
Title (EN) MICROREPLICATED POLISHING SURFACE WITH ENHANCED CO-PLANARITY
(FR) SURFACE DE POLISSAGE MICRO-RÉPLIQUÉE À COPLANARITÉ AMÉLIORÉE
Abstract:
(EN) An article includes a polishing layer that includes a plurality of raised cells separated by a plurality of channels. Each of the plurality of raised cells includes a microstructured working surface, a substantially vertical channel surface, and an offset surface between an edge of the working surface and an upper edge of the channel surface. The microstructured working surface includes a plurality of microstructures. Tops of the plurality of microstructures define a top plane and bases of the plurality of microstructures define a base plane. The substantially vertical channel surface defines a wall of a channel of the plurality of channels and the channel surface defines a channel plane. The offset surface includes a nonplanar portion of displaced material. The displaced material defines a displacement plane that is below the base plane or within a tolerance of the top plane.
(FR) La présente invention concerne un article comprenant une couche de polissage qui comprend une pluralité de cellules surélevées séparées par une pluralité de canaux. Chaque cellule surélevée de la pluralité de cellules surélevées comprend une surface de travail micro-structurée, une surface de canal sensiblement verticale et une surface de décalage entre un bord de la surface de travail et un bord supérieur de la surface de canal. La surface de travail micro-structurée comprend une pluralité de micro-structures. Les sommets de la pluralité de micro-structures délimitent un plan supérieur et les bases de la pluralité de micro-structures délimitent un plan de base. La surface de canal sensiblement verticale délimite une paroi d'un canal de la pluralité de canaux et la surface de canal délimite un plan de canal. La surface de décalage comprend une partie non plane de matériau déplacé. Le matériau déplacé délimite un plan de déplacement qui est en dessous du plan de base ou dans une tolérance du plan supérieur.
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: English (EN)
Filing Language: English (EN)