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1. (WO2019025717) PHOTOPOLYMERISABLE COMPOSITION, MATERIAL OBTAINED BY POLYMERISING SUCH A COMPOSITION AND 3D PRINTING METHOD USING SUCH A COMPOSITION
Latest bibliographic data on file with the International Bureau    Submit observation

Pub. No.: WO/2019/025717 International Application No.: PCT/FR2018/051963
Publication Date: 07.02.2019 International Filing Date: 31.07.2018
IPC:
C08F 2/50 (2006.01) ,C08F 22/10 (2006.01) ,C09K 11/07 (2006.01) ,B29C 64/264 (2017.01) ,B29C 64/129 (2017.01) ,B33Y 70/00 (2015.01) ,B33Y 10/00 (2015.01) ,B33Y 30/00 (2015.01) ,G03F 7/20 (2006.01) ,C08F 122/10 (2006.01) ,C08F 299/02 (2006.01) ,C08J 3/28 (2006.01) ,C08J 5/18 (2006.01) ,G03F 7/00 (2006.01) ,G03F 7/028 (2006.01)
C CHEMISTRY; METALLURGY
08
ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
F
MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
2
Processes of polymerisation
46
Polymerisation initiated by wave energy or particle radiation
48
by ultra-violet or visible light
50
with sensitising agents
C CHEMISTRY; METALLURGY
08
ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
F
MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
22
Homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
10
Esters
C CHEMISTRY; METALLURGY
09
DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
K
MATERIALS FOR APPLICATIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
11
Luminescent, e.g. electroluminescent, chemiluminescent, materials
06
containing organic luminescent materials
07
having chemically-interreactive components, e.g. reactive chemiluminescent compositions
[IPC code unknown for B29C 64/264][IPC code unknown for B29C 64/129][IPC code unknown for B33Y 70][IPC code unknown for B33Y 10][IPC code unknown for B33Y 30]
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
20
Exposure; Apparatus therefor
C CHEMISTRY; METALLURGY
08
ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
F
MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
122
Homopolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
10
Esters
C CHEMISTRY; METALLURGY
08
ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
F
MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
299
Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers
02
from unsaturated polycondensates
C CHEMISTRY; METALLURGY
08
ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
J
WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H142
3
Processes of treating or compounding macromolecular substances
28
Treatment by wave energy or particle radiation
C CHEMISTRY; METALLURGY
08
ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
J
WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H142
5
Manufacture of articles or shaped materials containing macromolecular substances
18
Manufacture of films or sheets
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004
Photosensitive materials
027
Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
028
with photosensitivity-increasing substances, e.g. photoinitiators
Applicants:
ECOLE NORMALE SUPERIEURE DE LYON [FR/FR]; 15 PARVIS RENE DESCARTES 69007 LYON, FR
UNIVERSITE CLAUDE BERNARD LYON 1 [FR/FR]; 43 BOULEVARD DU ONZE NOVEMBRE 1918 69100 VILLEURBANNE, FR
CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE [FR/FR]; 3 RUE MICHEL ANGE 75016 PARIS, FR
Inventors:
BALDECK, Patrice; FR
BANYASZ, Akos; FR
Agent:
COLOMBO, Michel; FR
BOUCHET, Geneviève; FR
GUERIN, Jean-Philippe; FR
Priority Data:
175740102.08.2017FR
Title (EN) PHOTOPOLYMERISABLE COMPOSITION, MATERIAL OBTAINED BY POLYMERISING SUCH A COMPOSITION AND 3D PRINTING METHOD USING SUCH A COMPOSITION
(FR) COMPOSITION PHOTOPOLYMÉRISABLE, MATÉRIAU OBTENU PAR POLYMÉRISATION D'UNE TELLE COMPOSITION ET PROCÉDÉ D'IMPRESSION 3D UTILISANT UNE TELLE COMPOSITION
Abstract:
(EN) The invention relates to a photopolymerisable composition comprising at least: one polymerisable resin; one photosensitiser (PS); one annihilator (AN); and one photoinitiator (PI), the photosensitiser being capable of absorbing an excitation light signal received in a first range of wavelengths, the annihilator being capable of transmitting a light signal in a second range of wavelengths different from the first range of wavelengths, in which, when light is absorbed by the photosensitiser in said first range of wavelengths, the annihilator transmits a light signal in the second range of wavelengths, with photonic energy of the light signal emitted by the annihilator being greater than the photonic energy of the light signal received by the photosensitiser, in which the annihilator is capable of implementing an energy transfer mechanism to excite the polymerisation photoinitiator (PI) of the resin, and in which the excited photoinitiator is capable of generating at least one polymerisation initiator capable of causing a polymerisation reaction of the resin. The invention also relates to a polymerisation method by polymerising a composition as described above and a material obtained by the method. The invention also relates to a 3D printing method using a composition as described above.
(FR) L'invention concerne une composition photopolymérisable comprenant au moins : une résine polymérisable, un photosensibilisateur (PS), un annihilateur (AN), et un photoinitiateur (PI) le photosensibilisateur étant capable d'absorber un signal lumineux d'excitation reçu dans une première plage de longueurs d'ondes, l'annihilateur étant capable d'émettre un signal lumineux dans une deuxième plage de longueurs d'ondes différente de la première plage de longueurs d'ondes, dans laquelle, lors de l'absorption de lumière par le photosensibilisateur dans la dite première plage de longueurs d'ondes, l'annihilateur émet un signal lumineux dans la deuxième plage de longueurs d'ondes, une énergie photonique du signal lumineux émis par l'annihilateur étant supérieure à une énergie photonique du signal lumineux reçu par le photosensibilisateur, dans laquelle l'annihilateur est capable de mettre en œuvre un mécanisme de transfert d'énergie pour exciter le photoinitiateur (PI) de polymérisation de la résine, et dans laquelle le photoinitiateur excité est capable de générer au moins un initiateur de polymérisation apte à provoquer une réaction de polymérisation de la résine. L'invention concerne également un procédé de polymérisation par polymérisation d'une composition telle que décrite ci-dessus et un matériau obtenu par le procédé. L'invention concerne également un procédé d'impression 3D utilisant une composition telle que décrite ci-dessus.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: French (FR)
Filing Language: French (FR)