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1. (WO2019025188) SYSTEMS AND METHODS FOR CHARGED PARTICLE FLOODING TO ENHANCE VOLTAGE CONTRAST DEFECT SIGNAL
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Pub. No.: WO/2019/025188 International Application No.: PCT/EP2018/069524
Publication Date: 07.02.2019 International Filing Date: 18.07.2018
IPC:
H01J 37/26 (2006.01) ,H01J 37/28 (2006.01)
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
J
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37
Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
26
Electron or ion microscopes; Electron- or ion-diffraction tubes
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
J
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37
Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
26
Electron or ion microscopes; Electron- or ion-diffraction tubes
28
with scanning beams
Applicants:
ASML NETHERLANDS B.V. [NL/NL]; P.O. Box 324 5500 AH Veldhoven, NL
HERMES MICROVISION, INC.; 7F, No.18, Puding Rd., East Dist. Hsinchu City, 300, TW
Inventors:
ZHANG, Frank, Nan; US
CHEN, Zhongwei; US
WANG, Yixiang; US
SHEN, Ying, Crystal; US
Agent:
PETERS, John; NL
Priority Data:
62/540,54802.08.2017US
62/550,61326.08.2017US
Title (EN) SYSTEMS AND METHODS FOR CHARGED PARTICLE FLOODING TO ENHANCE VOLTAGE CONTRAST DEFECT SIGNAL
(FR) SYSTÈMES ET PROCÉDÉS D'INONDATION DE PARTICULES CHARGÉES EN VUE DE L'AMÉLIORATION D'UN SIGNAL DE DÉFAUT DE CONTRASTE DE TENSION
Abstract:
(EN) Systems and methods for implementing charged particle flooding in a charged particle beam apparatus are disclosed. According to certain embodiments, a charged particle beam system includes a charged particle source and a controller which controls the charged particle beam system to emit a charged particle beam in a first mode where the beam is defocused and a second mode where the beam is focused on a surface of a sample.
(FR) L'invention porte sur des systèmes et des procédés de mise en œuvre d'une inondation de particules chargées dans un appareil à faisceau de particules chargées. Selon certains modes de réalisation, un système de faisceau de particules chargées comprend une source de particules chargées et un dispositif de commande qui commande le système de faisceau de particules chargées de façon à émettre un faisceau de particules chargées dans un premier mode dans lequel le faisceau est défocalisé et dans un second mode dans lequel le faisceau est focalisé sur une surface d'un échantillon.
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: English (EN)
Filing Language: English (EN)