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1. (WO2019025082) SIMULTANEOUS DOUBLE-SIDE COATING OF MULTILAYER GRAPHENE PELLICLE BY LOCAL THERMAL PROCESSING
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Pub. No.: WO/2019/025082 International Application No.: PCT/EP2018/067052
Publication Date: 07.02.2019 International Filing Date: 26.06.2018
IPC:
G03F 1/62 (2012.01) ,G03F 1/24 (2012.01) ,G03F 7/20 (2006.01) ,G02B 27/00 (2006.01)
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
1
Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
62
Pellicles or pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
1
Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
22
Masks or mask blanks for imaging by radiation of 100 nm or shorter wavelength, e.g. X-ray masks, extreme ultra-violet [EUV] masks; Preparation thereof
24
Reflection masks; Preparation thereof
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
20
Exposure; Apparatus therefor
G PHYSICS
02
OPTICS
B
OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
27
Other optical systems; Other optical apparatus
Applicants:
ASML NETHERLANDS B.V. [NL/NL]; P.O. Box 324 5500 AH Veldhoven, NL
Inventors:
KURGANOVA, Evgenia; NL
GIESBERS, Adrianus, Johannes, Maria; NL
NASALEVICH, Maxim, Aleksandrovich; NL
NOTENBOOM, Arnoud, Willem; NL
PÉTER, Mária; NL
VAN ZWOL, Pieter-Jan; NL
VLES, David, Ferdinand; NL
VOORTHUIJZEN, Willem-Pieter; NL
Agent:
FILIP, Diana; NL
Priority Data:
17184701.503.08.2017EP
Title (EN) SIMULTANEOUS DOUBLE-SIDE COATING OF MULTILAYER GRAPHENE PELLICLE BY LOCAL THERMAL PROCESSING
(FR) REVÊTEMENT DOUBLE FACE SIMULTANÉ DE PELLICULE DE GRAPHÈNE MULTICOUCHE PAR TRAITEMENT THERMIQUE LOCAL
Abstract:
(EN) A method of manufacturing a pellicle for a lithographic apparatus, said method comprising: locally heating the pellicle (4) using radiative heating (3), and depositing coating material simultaneously on both sides of the pellicle. Also disclosed are pellicles manufactured according to this method. Further disclosed is the use of a multilayer graphene pellicle with double-sided hexagonal boron nitride coating in a lithographic apparatus.
(FR) L'invention concerne un procédé de fabrication d'une pellicule pour un appareil lithographique, ledit procédé comprenant : le chauffage local de la pellicule (4) à l'aide d'un chauffage par rayonnement (3) et le dépôt simultané d'un matériau de revêtement sur les deux côtés de la pellicule. L'invention concerne également des pellicules fabriquées selon ce procédé. L'invention concerne en outre l'utilisation d'une pellicule de graphène multicouche avec un revêtement double face de nitrure de bore hexagonal dans un appareil lithographique.
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: English (EN)
Filing Language: English (EN)