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1. (WO2019024572) ANTI-REFLECTION STRUCTURE, DISPLAY DEVICE AND FABRICATION METHOD FOR ANTI-REFLECTION STRUCTURE
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Pub. No.: WO/2019/024572 International Application No.: PCT/CN2018/088030
Publication Date: 07.02.2019 International Filing Date: 23.05.2018
IPC:
G02B 1/11 (2015.01)
G PHYSICS
02
OPTICS
B
OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
1
Optical elements characterised by the material of which they are made; Optical coatings for optical elements
10
Optical coatings produced by application to, or surface treatment of, optical elements
11
Anti-reflection coatings
Applicants:
京东方科技集团股份有限公司 BOE TECHNOLOGY GROUP CO., LTD. [CN/CN]; 中国北京市 朝阳区酒仙桥路10号 No.10 Jiuxianqiao Rd., Chaoyang District Beijing 100015, CN
北京京东方显示技术有限公司 BEIJING BOE DISPLAY TECHNOLOGY CO., LTD. [CN/CN]; 中国北京市 北京经济技术开发区经海一路118号 No.118 Jinghaiyilu, BDA Beijing 100176, CN
Inventors:
贵炳强 GUI, Bingqiang; CN
曲连杰 QU, Lianjie; CN
齐永莲 QI, Yonglian; CN
王美丽 WANG, Meili; CN
赵合彬 ZHAO, Hebin; CN
邱云 QIU, Yun; CN
Agent:
北京市柳沈律师事务所 LIU, SHEN & ASSOCIATES; 中国北京市 海淀区彩和坊路10号1号楼10层 10th Floor, Building 1, 10 Caihefang Road, Haidian District Beijing 100080, CN
Priority Data:
201710657046.403.08.2017CN
Title (EN) ANTI-REFLECTION STRUCTURE, DISPLAY DEVICE AND FABRICATION METHOD FOR ANTI-REFLECTION STRUCTURE
(FR) STRUCTURE ANTIREFLET, DISPOSITIF D'AFFICHAGE ET PROCÉDÉ DE FABRICATION DE STRUCTURE ANTIREFLET
(ZH) 抗反射结构、显示装置及抗反射结构制作方法
Abstract:
(EN) An anti-reflection structure, a display device and a fabrication method for the anti-reflection structure. The anti-reflection structure (100) comprises a substrate (1), a first microstructure and a second microstructure (3). The first microstructure comprises a plurality of first microstructure units (2) periodically arranged on the substrate (1), a second microstructure (3) is filled between the first microstructures so as to cover the substrate (1), and the anti-reflection structure (100) has a flat surface. The refractive indices of the first microstructure and the second microstructure (3) are different and are configured such that overall, the reflectivity of the anti-reflection structure (100) to light of a predetermined wavelength is lower than the reflectivity of the substrate (1) to light of the predetermined wavelength. The anti-reflection structure has strong anti-scratch capability while achieving an anti-reflection effect.
(FR) L'invention concerne une structure antireflet, un dispositif d'affichage et un procédé de fabrication de la structure antireflet. La structure antireflet (100) comprend un substrat (1), une première microstructure et une seconde microstructure (3). La première microstructure comprend une pluralité de premières unités de microstructure (2) disposées périodiquement sur le substrat (1), une seconde microstructure (3) est remplie entre les premières microstructures de manière à recouvrir le substrat (1), et la structure antireflet (100) présente une surface plate. Les indices de réfraction de la première microstructure et de la seconde microstructure (3) sont différents et sont configurés de telle sorte que globalement, la réflectivité de la structure antireflet (100) à la lumière d'une longueur d'onde prédéfinie soit inférieure à la réflectivité du substrat (1) à la lumière de la longueur d'onde prédéfinie. La structure antireflet a une forte capacité anti-rayure et permet en outre l'obtention d'un effet antireflet.
(ZH) 一种抗反射结构、显示装置及抗反射结构制作方法。该抗反射结构(100)包括基片(1)、第一微结构和第二微结构(3)。第一微结构包括多个呈周期性地设置于所述基片(1)上的第一微结构单元(2),第二微结构(3)填充于所述第一微结构之间以覆盖所述基片(1),且使得所述抗反射结构(100)具有平坦的表面。所述第一微结构和所述第二微结构(3)的折射率不同且配置为整体上使所述抗反射结构(100)对预定波长的光的反射率比所述基片(1)对预定波长的光的反射率低。该抗反射结构在实现抗反射效果的同时具有较强的防刮伤能力。
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Chinese (ZH)
Filing Language: Chinese (ZH)