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1. (WO2019024547) POSITIVE PHOTORESIST COMPOSITION, VIA HOLE FORMATION METHOD, DISPLAY SUBSTRATE, AND DISPLAY DEVICE
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Pub. No.: WO/2019/024547 International Application No.: PCT/CN2018/084484
Publication Date: 07.02.2019 International Filing Date: 25.04.2018
IPC:
G03F 7/039 (2006.01) ,G03F 7/004 (2006.01) ,G02F 1/1362 (2006.01)
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004
Photosensitive materials
039
Macromolecular compounds which are photodegradable, e.g. positive electron resists
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004
Photosensitive materials
04
Chromates
G PHYSICS
02
OPTICS
F
DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH IS MODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THE DEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY, COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g. SWITCHING, GATING, MODULATING OR DEMODULATING; TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF; FREQUENCY-CHANGING; NON-LINEAR OPTICS; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
1
Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
01
for the control of the intensity, phase, polarisation or colour
13
based on liquid crystals, e.g. single liquid crystal display cells
133
Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
136
Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
1362
Active matrix addressed cells
Applicants:
京东方科技集团股份有限公司 BOE TECHNOLOGY GROUP CO., LTD. [CN/CN]; 中国北京市 朝阳区酒仙桥路10号 No.10 Jiuxianqiao Rd., Chaoyang District Beijing 100015, CN
合肥鑫晟光电科技有限公司 HEFEI XINSHENG OPTOELECTRONICS TECHNOLOGY CO., LTD. [CN/CN]; 中国安徽省合肥市 新站区工业园内 Industrial Park, Xinzhan Hefei, Anhui 230012, CN
Inventors:
李伟 LI, Wei; CN
苏同上 SU, Tongshang; CN
李广耀 LI, Guangyao; CN
胡迎宾 HU, Yingbin; CN
马睿 MA, Rui; CN
邵继峰 SHAO, Jifeng; CN
张扬 ZHANG, Yang; CN
张建业 ZHANG, Jianye; CN
Agent:
北京市中咨律师事务所 ZHONGZI LAW OFFICE; 中国北京市 西城区平安里西大街26号新时代大厦7层 7F, New Era Building, 26 Pinganli Xidajie, Xicheng District Beijing 100034, CN
Priority Data:
201710651692.X02.08.2017CN
Title (EN) POSITIVE PHOTORESIST COMPOSITION, VIA HOLE FORMATION METHOD, DISPLAY SUBSTRATE, AND DISPLAY DEVICE
(FR) COMPOSITION DE RÉSINE PHOTOSENSIBLE POSITIVE, PROCÉDÉ DE FORMATION DE TROUS D'INTERCONNEXION, SUBSTRAT D'AFFICHAGE, ET DISPOSITIF D'AFFICHAGE
(ZH) 正性光刻胶组合物、过孔的形成方法、显示基板及显示装置
Abstract:
(EN) The present invention provides a positive photoresist composition, comprising a main photoresist material and a photosensitizer. The photoresist composition further comprises a photo-induced heterogeneous compound; under ultraviolet irradiation, the structure of the photo-induced heterogeneous compound is changed to an ion structure with an improved molecular polarity degree. The formation of the ion structure with an improved molecular polarity degree reduces the adhesive force between the positive photoresist and an organic film; this is good for lift-off after a via hole is formed, and the production yield of a product is improved. Furthermore, the present invention further provides a via hole formation method using the positive photoresist composition, a display substrate comprising via holes formed by the via hole formation method, and a display device comprising the display substrate.
(FR) La présente invention se rapporte à une composition de résine photosensible positive qui comprend un matériau de résine photosensible principal et un photosensibilisateur. La composition de résine photosensible inclut en outre un composé hétérogène photo-induit. Lorsqu'elle est exposée à un rayonnement ultraviolet, la structure du composé hétérogène photo-induit est transformée en une structure ionique ayant un degré de polarité moléculaire amélioré. La formation de la structure ionique ayant un degré de polarité moléculaire amélioré réduit la force d'adhérence entre la résine photosensible positive et un film organique. Cela facilite le retrait après qu'un trou d'interconnexion a été formé, et le rendement de production d'un produit s'accroît. En outre, la présente invention a trait à un procédé de formation de trous d'interconnexion utilisant la composition de résine photosensible positive, à un substrat d'affichage comprenant des trous d'interconnexion formés par le procédé de formation de trous d'interconnexion, et à un dispositif d'affichage incluant le substrat d'affichage.
(ZH) 本发明提供一种正性光刻胶组合物,其包含主体胶材和光敏剂,其中所述光刻胶组合物还包含光致异构化合物,该光致异构化合物受到紫外光照射后结构转变为分子极性程度增加的离子结构。该分子极性程度增加的离子结构的形成降低了该正性光刻胶与有机膜层间的附着力,有利于过孔形成后的剥离,提高产品的生产良率。此外,本发明还提供使用所述正性光刻胶组合物的过孔形成方法、包含通过前述过孔形成方法形成的过孔的显示基板及包含前述显示基板的显示装置。
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Chinese (ZH)
Filing Language: Chinese (ZH)