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1. (WO2019024444) PRESSURE SENSOR AND MANUFACTURING METHOD THEREFOR
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Pub. No.: WO/2019/024444 International Application No.: PCT/CN2018/071947
Publication Date: 07.02.2019 International Filing Date: 09.01.2018
IPC:
G01L 11/02 (2006.01) ,G01L 1/24 (2006.01)
G PHYSICS
01
MEASURING; TESTING
L
MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
11
Measuring steady or quasi-steady pressure of a fluid or a fluent solid material by means not provided for in group G01L7/ or G01L9/175
02
by optical means
G PHYSICS
01
MEASURING; TESTING
L
MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
1
Measuring force or stress, in general
24
by measuring variations of optical properties of material when it is stressed, e.g. by photoelastic stress analysis
Applicants:
京东方科技集团股份有限公司 BOE TECHNOLOGY GROUP CO., LTD. [CN/CN]; 中国北京市 朝阳区酒仙桥路10号 No. 10 Jiuxianqiao Rd., Chaoyang District Beijing 100015, CN
成都京东方光电科技有限公司 CHENGDU BOE OPTOELECTRONICS TECHNOLOGY CO., LTD. [CN/CN]; 中国四川省成都市 高新区(西区)合作路1188号 No. 1188, Hezuo Rd., (West Zone) Hi-tech Development Zone Chengdu, Sichuan 611731, CN
Inventors:
周威龙 ZHOU, Weilong; CN
Agent:
北京市柳沈律师事务所 LIU, SHEN & ASSOCIATES; 中国北京市 海淀区彩和坊路10号1号楼10层 10th Floor, Building 1 10 Caihefang Road, Haidian District Beijing 100080, CN
Priority Data:
201710642627.031.07.2017CN
Title (EN) PRESSURE SENSOR AND MANUFACTURING METHOD THEREFOR
(FR) CAPTEUR DE PRESSION ET SON PROCÉDÉ DE FABRICATION
(ZH) 压力传感器及其制作方法
Abstract:
(EN) A pressure sensor and a manufacturing method therefor. The pressure sensor comprises a light emitting element (01), an interference filtering structure (02), and a photosensitive element (03) which are stacked to each other. The light emitting element (01) is configured to emit incident light to the interference filtering structure (02); the interference filtering structure (02) is configured to change the thickness of the interference filtering structure (02) according to the pressure applied to the pressure sensor to form exit light corresponding to the pressure; and the photosensitive element (03) is configured to detect the exit light and form an electric signal corresponding to the exit light.
(FR) La présente invention concerne un capteur de pression et son procédé de fabrication. Le capteur de pression comprend un élément électroluminescent (01), une structure de filtrage des interférences (02), et un élément photosensible (03) qui sont empilés l'un sur l'autre. L'élément électroluminescent (01) est conçu pour émettre une lumière incidente vers la structure de filtrage des interférences (02) ; la structure de filtrage des interférences (02) est conçue pour modifier l'épaisseur de la structure de filtrage des interférences (02) en fonction de la pression appliquée sur le capteur de pression pour former une lumière de sortie correspondant à la pression ; et l'élément photosensible (03) est configuré pour détecter la lumière de sortie et former un signal électrique correspondant à la lumière de sortie.
(ZH) 一种压力传感器及其制作方法,压力传感器包括:层叠设置的发光元件(01)、干涉滤光结构(02)和感光元件(03)。发光元件(01)配置来向干涉滤光结构(02)发射入射光;干涉滤光结构(02)配置来根据施加在压力传感器上的压力改变干涉滤光结构(02)的厚度,形成对应压力的出射光;以及感光元件(03)配置来检测出射光,并形成与出射光对应的电信号。
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Chinese (ZH)
Filing Language: Chinese (ZH)