Mobile |
Deutsch |
Español |
Français |
日本語 |
한국어 |
Português |
Русский |
中文 |
العربية |
PATENTSCOPE
Search International and National Patent Collections
PATENTSCOPE will be unavailable a few hours for maintenance reason on Monday 18.02.2019 at 12:00 PM CET
Options
Query
Result
Interface
Office
Translate
Query Language
All
Arabic
Bulgarian
Chinese
Danish
English
Estonian
French
German
Hebrew
Indonesian
Italian
Japanese
Korean
Laotian
Polish
Portuguese
Romanian
Russian
Spanish
Swedish
Thai
Vietnamese
Stem
Sort by:
Relevance
Pub Date Desc
Pub Date Asc
App Date Desc
App Date Asc
List Length
10
50
100
200
Result List Language
Query Language
English
Spanish
Korean
Vietnamese
Hebrew
Portuguese
French
German
Japanese
Russian
Chinese
Italian
Polish
Danish
Swedish
Arabic
Estonian
Indonesian
Thai
Bulgarian
Laotian
Romanian
Displayed Fields
Application Number
Publication Date
Abstract
Applicant Name
Int. Class
Image
Inventor Name
Chart/Graph
Table
Graph
Group by
*
None
Offices of NPEs
IPC code
Applicants
Inventors
Filing Dates
Publication Dates
Countries
No of Items/Group
0
1
2
3
4
5
6
7
8
9
10
11
12
13
14
15
16
17
18
19
20
21
22
23
24
25
0
1
2
3
4
5
6
7
8
9
10
11
12
13
14
15
16
17
18
19
20
21
22
23
24
25
Download Fields
NPEs
Default Search Form
Simple
Advanced Search
Field Combination
Browse by Week (PCT)
Cross Lingual Expansion
Translator
Simple
Advanced Search
Field Combination
Browse by Week (PCT)
Cross Lingual Expansion
Translator
Default Tab Search Form
Front Page
Any Field
Full Text
ID/Numbers
IPC
Names
Dates
Front Page
Any Field
Full Text
ID/Numbers
IPC
Names
Dates
Interface Language
English
Deutsch
Français
Español
日本語
中文
한국어
Português
Русский
English
Deutsch
Français
Español
日本語
中文
한국어
Português
Русский
Multiple Windows Interface
Tooltip Help
IPC Tooltip Help
Instant Help
Expanded Query
Office:
All
All
PCT
Africa
African Regional Intellectual Property Organization (ARIPO)
Egypt
Kenya
Morocco
Tunisia
South Africa
Americas
United States of America
Canada
LATIPAT
Argentina
Brazil
Chile
Colombia
Costa Rica
Cuba
Dominican Rep.
Ecuador
El Salvador
Guatemala
Honduras
Mexico
Nicaragua
Panama
Peru
Uruguay
Asia-Europe
Australia
Bahrain
China
Denmark
Estonia
Eurasian Patent Office
European Patent Office (EPO)
France
Germany
Germany(DDR data)
Israel
Japan
Jordan
Portugal
Russian Federation
Russian Federation(USSR data)
Saudi Arabia
United Arab Emirates
Spain
Republic of Korea
India
United Kingdom
Georgia
Bulgaria
Italy
Romania
Lao People's Democratic Republic
Asean
Singapore
Viet Nam
Indonesia
Cambodia
Malaysia
Brunei Darussalam
Philippines
Thailand
WIPO translate (Wipo internal translation tool)
Search
Simple
Advanced Search
Field Combination
Cross Lingual Expansion
Chemical compounds (login required)
Browse
Browse by Week (PCT)
Gazette Archive
National Phase Entries
Full download
Incremental download (last 7 days)
Sequence listing
IPC Green Inventory
Portal to patent registers
Translate
WIPO Translate
WIPO Pearl
News
PATENTSCOPE News
Login
ui-button
Login
Account Sign Up
Options
Options
Help
ui-button
How to Search
User Guide PATENTSCOPE
User Guide: Cross Lingual Expansion
User Guide: ChemSearch
Query Syntax
Fields Definition
Country Code
Data Coverage
PCT applications
PCT national phase entry
National collections
Global Dossier public
FAQ
Feedback&Contact
INID codes
Kind codes
Tutorials
About
Overview
Terms And Conditions
Disclaimer
Home
IP Services
PATENTSCOPE
Machine translation
Wipo Translate
Arabic
German
English
Spanish
French
Japanese
Korean
Portuguese
Russian
Chinese
Google Translate
Bing/Microsoft Translate
Baidu Translate
Arabic
English
French
German
Spanish
Portuguese
Russian
Korean
Japanese
Chinese
...
Italian
Thai
Cantonese
Classical Chinese
Some content of this application is unavailable at the moment.
If this situation persist, please contact us at
Feedback&Contact
1. (WO2019024366) PROJECTION SCREEN AND PROJECTION SYSTEM
PCT Biblio. Data
Full Text
Drawings
National Phase
Notices
Documents
Latest bibliographic data on file with the International Bureau
Submit observation
PermaLink
PermaLink
Bookmark
Pub. No.:
WO/2019/024366
International Application No.:
PCT/CN2017/114725
Publication Date:
07.02.2019
International Filing Date:
06.12.2017
IPC:
G03B 21/60
(2014.01)
G
PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
B
APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
21
Projectors or projection-type viewers; Accessories therefor
54
Accessories
56
Projection screens
60
characterised by the nature of the surface, e.g. lenticular, fluid
Applicants:
深圳光峰科技股份有限公司 APPOTRONICS CORPORATION LIMITED
[CN/CN]; 中国广东省深圳市南山区粤海街道学府路63号高新区联合总部大厦20-22楼 20F-22F, High-Tech Zone Union Tower, No.63, Xuefu Road, Yuehai Street, Nanshan District, Shenzhen, Guangdong 518000, CN
Inventors:
王霖 WANG, Lin
; CN
胡飞 HU, Fei
; CN
李屹 LI, Yi
; CN
Priority Data:
201710663024.9
04.08.2017
CN
Title
(EN)
PROJECTION SCREEN AND PROJECTION SYSTEM
(FR)
ÉCRAN DE PROJECTION ET SYSTÈME DE PROJECTION
(ZH)
投影屏幕和投影系统
Abstract:
(EN)
A projection screen (10) and a projection system. The projection system comprises a projection screen (10) and a projector (20). The projection screen (10) can reflect a projected light (123) into the range of a field of view of a viewer. The projection screen (10) comprises light diffusion layers (13, 14), a total reflection layer (12) and a light absorption layer (11) arranged sequentially from an incident side of the projected light (123). The light absorption layer (11) can absorb an incident light. The light diffusion layers (13, 14) are used for increasing a divergence angle of an emergent light. The total reflection layer (12) at least comprises a microstructure layer (121) disposed at the side of the light diffusion layers (13, 14) and an inner layer (122) disposed at the side of the light absorption layer (11). The microstructure layer (121) has a refractive index greater than that of the inner layer (122). A plurality of microstructure units is disposed on the microstructure layer (121), extends continuously in a plane of the projection screen (10) and is rotationally symmetrical. The special arrangement of microstructures of a total reflection layer (12) enables a projected light (123) from an ultra-short-throw projector (20) and a projected light (123) from a long-throw projector (20) to be subjected to total reflection twice continuously in the microstructures before exiting therefrom, such that the same projection screen (10) can be used for both an ultra-short-throw projector (20) and a long-throw projector (20).
(FR)
L'invention concerne un écran de projection (10) et un système de projection. Le système de projection comprend un écran de projection (10) et un projecteur (20). L'écran de projection (10) peut réfléchir une lumière projetée (123) dans la plage d'un champ de vision d'un spectateur. L'écran de projection (10) comprend des couches de diffusion de lumière (13, 14), une couche de réflexion totale (12) et une couche d'absorption de lumière (11) agencées de manière séquentielle à partir d'un côté d'incidence de la lumière projetée (123). La couche d'absorption de lumière (11) peut absorber une lumière incidente. Les couches de diffusion de lumière (13, 14) sont utilisées pour augmenter un angle de divergence d'une lumière émergente. La couche de réflexion totale (12) comprend au moins une couche à microstructure (121) disposée sur le côté des couches de diffusion de lumière (13, 14) et une couche interne (122) disposée sur le côté de la couche d'absorption de lumière (11). La couche à microstructure (121) possède un indice de réfraction supérieur à celui de la couche interne (122). Une pluralité d'unités de microstructures est disposée sur la couche à microstructure (121), s'étend en continu dans le plan de l'écran de projection (10) et est symétrique en rotation. L'agencement spécial de microstructures d'une couche de réflexion totale (12) permet à une lumière projetée (123) à partir d'un projecteur à portée ultra-courte (20) et à une lumière projetée (123) à partir d'un projecteur à longue portée (20) d'être soumises à une réflexion totale deux fois en continu dans les microstructures avant de sortir de celles-ci, de telle sorte que le même écran de projection (10) peut être utilisé à la fois pour un projecteur à portée ultra-courte (20) et un projecteur à longue portée (20).
(ZH)
一种投影屏幕(10)和投影系统,投影系统包括投影屏幕(10)和投影机(20),投影屏幕(10)能够将投影光线(123)反射至观看者的视场范围内,投影屏幕(10)包括从投影光线(123)的入射侧依次布置的光扩散层(13、14)、全反射层(12)和光吸收层(11),光吸收层(11)能够吸收入射的光线,光扩散层(13、14)用于增大出射的光线的发散角,全反射层(12)至少包括位于光扩散层(13、14)侧的微结构层(121)和位于光吸收层(11)侧的内侧层(122),微结构层(121)的折射率大于内侧层(122)的折射率,微结构层(121)上设置有多个微结构单元,多个微结构单元在投影屏幕(10)的平面内连续延伸并且旋转对称,通过巧妙地设置全反射层(12)的微结构,能够使来自超短焦投影机(20)的投影光线(123)和来自长焦投影机(20)的投影光线(123)均能够在微结构中经连续两次全反射而出射,使得一块投影屏幕(10)能够兼用于超短焦投影机(20)和长焦投影机(20)。
Designated States:
AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language:
Chinese (
ZH
)
Filing Language:
Chinese (
ZH
)