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1. (WO2019023890) METHOD FOR DETERMINING METAL MASK PLATE DEFECT AND MANUFACTURING DEVICE
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Pub. No.: WO/2019/023890 International Application No.: PCT/CN2017/095296
Publication Date: 07.02.2019 International Filing Date: 31.07.2017
IPC:
G03F 1/00 (2012.01) ,H01L 21/66 (2006.01) ,H01L 51/56 (2006.01)
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
1
Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21
Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
66
Testing or measuring during manufacture or treatment
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
51
Solid state devices using organic materials as the active part, or using a combination of organic materials with other materials as the active part; Processes or apparatus specially adapted for the manufacture or treatment of such devices, or of parts thereof
50
specially adapted for light emission, e.g. organic light emitting diodes (OLED) or polymer light emitting devices (PLED)
56
Processes or apparatus specially adapted for the manufacture or treatment of such devices or of parts thereof
Applicants:
深圳市柔宇科技有限公司 SHENZHEN ROYOLE TECHNOLOGIES CO., LTD. [CN/CN]; 中国广东省深圳市 龙岗区横岗街道龙岗大道8288号大运软件小镇43栋 Building #43, Dayun Software Town No. 8288 Longgang Road, Henggang Street Longgang District Shenzhen, Guangdong 518052, CN
Inventors:
张耀宇 ZHANG, Yaoyu; CN
王彤 WANG, Tong; CN
康慧 KANG, Hui; CN
Agent:
北京清亦华知识产权代理事务所(普通合伙) TSINGYIHUA INTELLECTUAL PROPERTY LLC; 中国北京市 海淀区清华园清华大学照澜院商业楼301室 Room 301 Trade Building Zhaolanyuan, Tsinghua University Qinghuayuan, Haidian District Beijing 100084, CN
Priority Data:
Title (EN) METHOD FOR DETERMINING METAL MASK PLATE DEFECT AND MANUFACTURING DEVICE
(FR) PROCÉDÉ DE DÉTERMINATION DE DÉFAUT DE PLAQUE DE MASQUE MÉTALLIQUE ET DISPOSITIF DE FABRICATION
(ZH) 金属掩膜板缺陷的判断方法和制造设备
Abstract:
(EN) A method for determining a metal mask plate (700) defect and a manufacturing device (100) used for determining a metal mask plate (700) defect. The metal mask plate (700) is adapted to be attached to a pixel substrate (800) so as to assist the pixel substrate (800) in forming multiple substrate pixel points (820). The determining method comprises steps of: (S112) obtaining an image of the metal mask plate (700), the image comprising an image pixel point; (S114) in the same reference coordinate system, establishing a position relationship between the image pixel point and the substrate pixel point (820); (S116) testing the substrate pixel point (820) so as to determine whether the substrate pixel point (820) is abnormal, and obtaining the coordinate position of the abnormal substrate pixel point (820); and (S118) determining a defect position of the metal mask plate (700) according to the coordinate position of the abnormal substrate pixel point (820) and the position relationship.
(FR) L'invention concerne un procédé pour déterminer un défaut de plaque de masque métallique (700) et un dispositif de fabrication (100) utilisé pour déterminer un défaut de plaque de masque métallique (700). La plaque de masque métallique (700) est conçue pour être fixée à un substrat de pixels (800) de façon à aider le substrat de pixels (800) à former de multiples points de pixels de substrat (820). Le procédé de détermination comprend les étapes consistant à : (S112) obtenir une image de la plaque de masque métallique (700), l'image comprenant un point de pixel d'image ; (S114) dans le même système de coordonnées de référence, établir une relation de position entre le point de pixel d'image et le point de pixel de substrat (820) ; (S116) tester le point de pixel de substrat (820) de façon à déterminer si le point de pixel de substrat (820) est anormal, et obtenir la position de coordonnées du point de pixel de substrat anormal (820) ; et (S118) déterminer une position de défaut de la plaque de masque métallique (700) en fonction de la position de coordonnées du point de pixel de substrat anormal (820) et de la relation de position.
(ZH) 一种金属掩膜板(700)缺陷的判断方法以及一种用于判断金属掩膜板(700)缺陷的制造设备(100),金属掩膜板(700)用于贴合像素基板(800)以辅助像素基板(800)形成多个基板像素点(820)。判断方法包括步骤:(S112)获取金属掩膜板(700)的图像,图像包括图像像素点;(S114)在同一参考坐标系下,建立图像像素点和基板像素点(820)的位置关系;(S116)测试基板像素点(820)以判断基板像素点(820)是否异常并获取异常的基板像素点(820)的坐标位置;和(S118)根据异常的基板像素点(820)的坐标位置和位置关系确定金属掩膜板(700)的缺陷位置。
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Chinese (ZH)
Filing Language: Chinese (ZH)