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1. (WO2019009365) TEMPORARY ADHESIVE AGENT CONTAINING PHENYL-GROUP-CONTAINING POLYSILOXANE
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Pub. No.: WO/2019/009365 International Application No.: PCT/JP2018/025542
Publication Date: 10.01.2019 International Filing Date: 05.07.2018
IPC:
H01L 21/304 (2006.01) ,C09J 183/04 (2006.01) ,C09J 183/07 (2006.01) ,C09J 201/02 (2006.01) ,H01L 21/02 (2006.01) ,H01L 21/683 (2006.01)
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21
Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
02
Manufacture or treatment of semiconductor devices or of parts thereof
04
the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer, carrier concentration layer
18
the devices having semiconductor bodies comprising elements of the fourth group of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
30
Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20-H01L21/26142
302
to change the physical characteristics of their surfaces, or to change their shape, e.g. etching, polishing, cutting
304
Mechanical treatment, e.g. grinding, polishing, cutting
C CHEMISTRY; METALLURGY
09
DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
J
ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
183
Adhesives based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Adhesives based on derivatives of such polymers
04
Polysiloxanes
C CHEMISTRY; METALLURGY
09
DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
J
ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
183
Adhesives based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Adhesives based on derivatives of such polymers
04
Polysiloxanes
07
containing silicon bound to unsaturated aliphatic groups
C CHEMISTRY; METALLURGY
09
DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
J
ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
201
Adhesives based on unspecified macromolecular compounds
02
characterised by the presence of specified groups
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21
Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
02
Manufacture or treatment of semiconductor devices or of parts thereof
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21
Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
67
Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components
683
for supporting or gripping
Applicants:
日産化学株式会社 NISSAN CHEMICAL CORPORATION [JP/JP]; 東京都中央区日本橋二丁目5番1号 5-1, Nihonbashi 2-chome, Chuo-ku, Tokyo 1036119, JP
Inventors:
森谷 俊介 MORIYA, Shunsuke; JP
榎本 智之 ENOMOTO, Tomoyuki; JP
新城 徹也 SHINJO, Tetsuya; JP
荻野 浩司 OGINO, Hiroshi; JP
澤田 和宏 SAWADA, Kazuhiro; JP
Agent:
特許業務法人はなぶさ特許商標事務所 HANABUSA PATENT & TRADEMARK OFFICE; 東京都千代田区神田駿河台3丁目2番地 新御茶ノ水アーバントリニティ Shin-Ochanomizu Urban Trinity, 2, Kandasurugadai 3-chome, Chiyoda-ku, Tokyo 1010062, JP
Priority Data:
2017-13309406.07.2017JP
Title (EN) TEMPORARY ADHESIVE AGENT CONTAINING PHENYL-GROUP-CONTAINING POLYSILOXANE
(FR) AGENT ADHÉSIF TEMPORAIRE CONTENANT UN POLYSILOXANE CONTENANT UN GROUPE PHÉNYLE
(JA) フェニル基含有ポリシロキサンを含有する仮接着剤
Abstract:
(EN) Provided are: a temporary adhesive agent which has excellent spin-coatability onto a circuit surface of a wafer or a support, also has excellent heat resistance during the bonding to an adhesive layer or during the processing of a rear surface of a wafer, can be removed easily after the polishing of a rear surface of a wafer, and makes it possible to remove an adhesive agent adhered onto a wafer or a support after removing of the temporary adhesive agent; a laminate containing the temporary adhesive agent; and a processing method using the temporary adhesive agent. An adhesive agent which can removably adhere between a support and a circuit surface of a wafer and can be used in the processing of a rear surface of a wafer, the adhesive agent being characterized by containing a component (A) that can be cured through a hydroxylation reaction and a component (B) that contains a phenyl-group-containing polyorganosiloxane, wherein the ratio of the content of the component (A) in % by mass to the content of the component (B) in % by mass is 95:5 to 30:70. The adhesive agent is applied onto a first substrate to form an adhesive layer, then a second substrate is bonded to the adhesive layer, and then the resultant laminate is heated from the first substrate side to cure the adhesive layer. After the completion of the processing of the laminate, delamination is allowed to cause between the first substrate and the adhesive layer and between the second substrate and the adhesive layer.
(FR) L'invention concerne : un agent adhésif temporaire qui a une excellente aptitude au revêtement par centrifugation sur une surface de circuit d'une tranche ou d'un support, qui a également une excellente résistance à la chaleur pendant la liaison à une couche adhésive ou pendant le traitement d'une surface arrière d'une tranche, peut être retiré facilement après le polissage d'une surface arrière d'une tranche, et permet de retirer un agent adhésif collé sur une tranche ou un support après retrait de l'agent adhésif temporaire; un stratifié contenant l'agent adhésif temporaire; et un procédé de traitement utilisant l'agent adhésif temporaire. Un agent adhésif qui peut être collé de manière amovible entre un support et une surface de circuit d'une tranche et qui peut être utilisé dans le traitement d'une surface arrière d'une tranche, l'agent adhésif étant caractérisé en ce qu'il contient un composant (A) qui peut être durci par l'intermédiaire d'une réaction d'hydroxylation et d'un composant (B) qui contient un polyorganosiloxane contenant un groupe phényle, le rapport de la teneur du composant (A) en % en masse au contenu du composant (B) en % en masse étant de 95 : 5 à 30 : 70. L'agent adhésif est appliqué sur un premier substrat pour former une couche adhésive, puis un second substrat est lié à la couche adhésive, puis le stratifié résultant est chauffé à partir du premier côté substrat pour durcir la couche adhésive. Après l'achèvement du traitement du stratifié, une délamination est autorisée à être provoquée entre le premier substrat et la couche adhésive et entre le second substrat et la couche adhésive.
(JA) ウエハーの回路面や支持体へのスピンコート性に優れ、接着層との接合時やウエハー裏面の加工時における耐熱性に優れ、ウエハー裏面の研磨後における剥離が容易で、剥離後におけるウエハーや支持体に付着した接着剤の除去が容易である仮接着剤及びその積層体、それを用いた加工方法を提供する。支持体とウエハーの回路面との間で剥離可能に接着し、ウエハーの裏面を加工するための接着剤であり、接着剤がヒドロシリル化反応により硬化する成分(A)と、フェニル基含有ポリオルガノシロキサンとを含む成分(B)とを含み、成分(A)と成分(B)が質量%で95:5~30:70の割合であることを特徴とする。この接着剤を第一基体上に塗布して接着層を形成してから第二基体を接合し、第一基体側から加熱して接着剤を硬化させる。この積層体の加工を終えると、第一基体、第二基体と接着層の間で剥離する。
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)