Some content of this application is unavailable at the moment.
If this situation persist, please contact us atFeedback&Contact
1. (WO2019009260) DIFFRACTION OPTICAL ELEMENT, OPTICAL IRRADIATION DEVICE, AND IRRADIATION PATTERN READING METHOD
Latest bibliographic data on file with the International Bureau    Submit observation

Pub. No.: WO/2019/009260 International Application No.: PCT/JP2018/025105
Publication Date: 10.01.2019 International Filing Date: 02.07.2018
IPC:
F21S 2/00 (2016.01) ,F21V 5/00 (2018.01) ,G02B 5/18 (2006.01)
F MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
21
LIGHTING
S
NON-PORTABLE LIGHTING DEVICES OR SYSTEMS THEREOF
2
Systems of lighting devices, not provided for in main groups F21S4/-F21S10/119
F MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
21
LIGHTING
V
FUNCTIONAL FEATURES OR DETAILS OF LIGHTING DEVICES OR SYSTEMS THEREOF; STRUCTURAL COMBINATIONS OF LIGHTING DEVICES WITH OTHER ARTICLES, NOT OTHERWISE PROVIDED FOR
5
Refractors for light sources
G PHYSICS
02
OPTICS
B
OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
5
Optical elements other than lenses
18
Diffracting gratings
Applicants:
大日本印刷株式会社 DAI NIPPON PRINTING CO., LTD. [JP/JP]; 東京都新宿区市谷加賀町一丁目1番1号 1-1-1, Ichigaya Kagacho, Shinjuku-ku, Tokyo 1628001, JP
Inventors:
稲月 友一 INAZUKI Yuichi; JP
堀口 竜二 HORIGUCHI Ryuji; JP
大八木 康之 OOYAGI Yasuyuki; JP
吉岡 英範 YOSHIOKA Hidenori; JP
登山 伸人 TOYAMA Nobuhito; JP
Agent:
正林 真之 SHOBAYASHI Masayuki; JP
芝 哲央 SHIBA Tetsuo; JP
林 一好 HAYASHI Kazuyoshi; JP
Priority Data:
2017-13016603.07.2017JP
2017-13016703.07.2017JP
Title (EN) DIFFRACTION OPTICAL ELEMENT, OPTICAL IRRADIATION DEVICE, AND IRRADIATION PATTERN READING METHOD
(FR) ÉLÉMENT OPTIQUE DE DIFFRACTION, DISPOSITIF D'IRRADIATION OPTIQUE ET PROCÉDÉ DE LECTURE DE MOTIF D'IRRADIATION
(JA) 回折光学素子、光照射装置、照射パターンの読取り方法
Abstract:
(EN) Provided are a diffraction optical element, an optical irradiation device, and an irradiation pattern reading method with which a step in an irradiation pattern can be made less visible, and which, when performing reading, enables more accurate reading. A diffraction optical element 110 comprises rectangular unit cells 10 which are formed with a plurality of diffraction gratings and configured to obtain specific light distribution characteristics. The diffraction gratings of the unit cells 10 are configured such that light that has passed through the diffraction optical element 110 forms an irradiation pattern comprising a combination of a plurality of dots having different amounts of irradiation light.
(FR) L'invention concerne un élément optique de diffraction, un dispositif d'irradiation optique et un procédé de lecture de motif d'irradiation au moyen desquels un palier dans un motif d'irradiation peut être rendu moins visible et qui, lors de la lecture, permet que celle-ci soit plus précise. Un élément optique de diffraction (110) comprend des cellules unitaires rectangulaires (10) qui sont formées d'une pluralité de réseaux de diffraction et conçues pour avoir des caractéristiques de répartition lumineuse spécifiques. Les réseaux de diffraction des cellules unitaires (10) sont conçus de sorte que la lumière qui a traversé l'élément optique de diffraction (110) forme un motif d'irradiation comprenant une combinaison d'une pluralité de points dotés de différentes quantités de lumière d'irradiation.
(JA) 照射パターンの段差を目立たなくすることができ、読取りを行う場合にはより正確に読取りが可能な回折光学素子、光照射装置、照射パターンの読取り方法を提供する。 回折光学素子110は、複数の回折格子が形成されて特定の配光特性が得られるように構成された矩形形状の単位セル10を有しており、回折光学素子110を通過した光が、照射光量の異なる複数のドットの組合せにより照射パターンを形成するように、単位セル10の回折格子が構成されている。
front page image
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)