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1. (WO2019008814) SUBSTRATE GRIPPING HAND AND SUBSTRATE CONVEYING DEVICE PROVIDED WITH SAME
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Pub. No.: WO/2019/008814 International Application No.: PCT/JP2018/005573
Publication Date: 10.01.2019 International Filing Date: 16.02.2018
IPC:
H01L 21/677 (2006.01)
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21
Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
67
Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components
677
for conveying, e.g. between different work stations
Applicants:
川崎重工業株式会社 KAWASAKI JUKOGYO KABUSHIKI KAISHA [JP/JP]; 兵庫県神戸市中央区東川崎町3丁目1番1号 1-1, Higashikawasaki-cho 3-chome, Chuo-ku, Kobe-shi, Hyogo 6508670, JP
カワサキロボティクス(アメリカ合衆国),インク. KAWASAKI ROBOTICS (USA), INC. [US/US]; ミシガン州ウィクソム レイクビュウドライブ 28140 28140, Lakeview Drive, Wixom, Michigan 48393, US
Inventors:
吉田 哲也 YOSHIDA, Tetsuya; --
中原 一 NAKAHARA, Hajime; --
タン, マーク TANG, Mark; --
Agent:
特許業務法人 有古特許事務所 PATENT CORPORATE BODY ARCO PATENT OFFICE; 兵庫県神戸市中央区東町123番地の1 貿易ビル3階 3rd Fl., Bo-eki Bldg., 123-1, Higashimachi, Chuo-ku, Kobe-shi, Hyogo 6500031, JP
Priority Data:
15/641,82505.07.2017US
Title (EN) SUBSTRATE GRIPPING HAND AND SUBSTRATE CONVEYING DEVICE PROVIDED WITH SAME
(FR) MAIN DE PRÉHENSION DE SUBSTRAT ET DISPOSITIF DE TRANSPORT DE SUBSTRAT LA COMPRENANT
(JA) 基板把持ハンド及びそれを備える基板搬送装置
Abstract:
(EN) The present invention is a substrate gripping hand provided with: a base plate (11); and a guiding member (12) that is provided on the base plate (11), that is formed in an L shape as viewed in the horizontal direction, and an inner wall surface (12i) of which is formed so as to bend, wherein the inner wall surface (12i) of the guiding member (12) is formed such that the angle α between a first inner wall section (12c), which is a section most distant from a bottom surface (12b), and the bottom surface (12b) becomes larger than the angle β between a second inner wall section (12d), which is a section closest to the bottom surface (12b), and the bottom surface (12b).
(FR) La présente invention concerne une main de préhension de substrat comportant : une plaque de base (11) ; et un élément de guidage (12) qui est disposé sur la plaque de base (11), qui se présente sous une forme de L tel qu'observé dans la direction horizontale, et dont une surface de paroi interne (12i) est formée de manière à fléchir, la surface de paroi interne (12i) de l'élément de guidage (12) étant formée de telle sorte que l'angle α entre une première section de paroi interne (12c), qui est la section la plus éloignée d'une surface inférieure (12b), et la surface inférieure (12b) devient supérieur à l'angle β entre une seconde section de paroi interne (12d), qui est la section la plus proche de la surface inférieure (12b), et la surface inférieure (12b).
(JA) ベース板(11)と、ベース板(11)に設けられ、水平方向から見て、L字状に形成されていて、内壁面(12i)が屈曲するように形成されている、ガイド部材(12)と、を備え、ガイド部材(12)の内壁面(12i)は、底面(12b)から最も遠い部分である第1内壁部(12c)と底面(12b)とのなす角度αが、底面(12b)に最も近い部分である第2内壁部(12d)と底面(12b)とのなす角度βに比して、大きくなるように形成されている、基板把持ハンド。
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)