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1. (WO2019007359) SHUTTER BLADE DEVICE FOR LITHOGRAPHY MACHINE
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Pub. No.: WO/2019/007359 International Application No.: PCT/CN2018/094462
Publication Date: 10.01.2019 International Filing Date: 04.07.2018
IPC:
G03F 7/20 (2006.01)
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
20
Exposure; Apparatus therefor
Applicants:
上海微电子装备(集团)股份有限公司 SHANGHAI MICRO ELECTRONICS EQUIPMENT(GROUP) CO., LTD. [CN/CN]; 中国上海市 张江高科技园区张东路1525号 1525 Zhangdong Road, Zhangjiang High-Tech Park Shanghai 201203, CN
Inventors:
王彦飞 WANG, Yanfei; CN
刘国淦 LIU, Guogan; CN
章富平 ZHANG, Fuping; CN
贾翔 JIA, Xiang; CN
Agent:
上海思微知识产权代理事务所(普通合伙) SHANGHAI SAVVY INTELLECTUAL PROPERTY AGENCY; 中国上海市 长宁区天山西路789号1幢341室 Room 341, Building 1 789 West Tianshan Road, Changning District Shanghai 200335, CN
Priority Data:
201710543036.805.07.2017CN
Title (EN) SHUTTER BLADE DEVICE FOR LITHOGRAPHY MACHINE
(FR) DISPOSITIF DE LAMELLE D'OBTURATEUR POUR MACHINE DE LITHOGRAPHIE
(ZH) 一种光刻机用快门叶片装置
Abstract:
(EN) Disclosed is a shutter blade device for an exposure system of a lithography machine, the shutter blade device comprising two shutter blades (3, 4), and two thermal insulation plates (2), each shutter blade (3, 4) being connected to one thermal insulation plate (2). The conduction of heat from the blades (3, 4) to a shutter system is prevented by connecting the shutter blades (3, 4) and the thermal insulation plates (2), and the problem of the operation of a shutter system being unstable or a shutter system even being burned due to thermal conduction by the shutter is avoided.
(FR) L'invention concerne un dispositif de lamelle d'obturateur pour un système d'exposition d'une machine de lithographie, le dispositif de lamelle d'obturateur comprenant deux lamelles d'obturateur (3, 4) et deux plaques d'isolation thermique (2), chaque lamelle d'obturateur (3, 4) étant reliée à une plaque d'isolation thermique (2). La conduction de la chaleur issue des lamelles (3, 4) à un système d'obturation est empêchée en reliant les lamelles d'obturateur (3, 4) et les plaques d'isolation thermique (2). Le problème du fonctionnement d'un système d'obturateur étant instable ou celui d'un système d'obturateur allant jusqu'à être brûlé en raison de la conduction thermique par l'obturateur sont ainsi évités.
(ZH) 一种用于光刻机曝光系统的快门叶片装置,包括两个快门叶片(3、4)、两个隔热板(2),每个快门叶片(3、4)上连接着一个隔热板(2)。采用快门叶片(3、4)与隔热板(2)连接使用的方式,阻碍叶片(3、4)对快门系统的热传导,解决了由快门热传导导致的快门系统工作不稳定甚至烧毁的问题。
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Chinese (ZH)
Filing Language: Chinese (ZH)