Some content of this application is unavailable at the moment.
If this situation persist, please contact us atFeedback&Contact
1. (WO2019006600) POLISHING AGENT, COPPER PART AND POLISHING PROCESS THEREFOR
Latest bibliographic data on file with the International Bureau    Submit observation

Pub. No.: WO/2019/006600 International Application No.: PCT/CN2017/091534
Publication Date: 10.01.2019 International Filing Date: 03.07.2017
IPC:
C09G 1/02 (2006.01) ,C09G 1/00 (2006.01)
C CHEMISTRY; METALLURGY
09
DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
G
POLISHING COMPOSITIONS OTHER THAN FRENCH POLISH; SKI WAXES
1
Polishing compositions
02
containing abrasives or grinding agents
C CHEMISTRY; METALLURGY
09
DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
G
POLISHING COMPOSITIONS OTHER THAN FRENCH POLISH; SKI WAXES
1
Polishing compositions
Applicants:
深圳市宏昌发科技有限公司 SHENZHEN HONGCHANGFA TECHNOLOGY CO., LTD. [CN/CN]; 中国广东省深圳市 南山区沙河街道金三角大厦815刘国平 LIU, Guoping 815, Jinsanjiao Building, Shahe Street, Nanshan District Shenzhne, Guangdong 518000, CN
Inventors:
刘国平 LIU, Guoping; CN
Agent:
深圳市华腾知识产权代理有限公司 SHENZHEN HUATENG INTELLECTUAL PROPERTY AGENT CO., LTD.; 中国广东省深圳市 龙华新区龙华街道龙观东路望成大厦11楼1116室彭年才 PENG, Niancai Room 1116, 11th Floor, Wangcheng Building Longguan East Road, Longhua Street, Longhua Shenzhen, Guangdong 518109, CN
Priority Data:
Title (EN) POLISHING AGENT, COPPER PART AND POLISHING PROCESS THEREFOR
(FR) AGENT DE POLISSAGE, PIÈCE EN CUIVRE ET PROCÉDÉ DE POLISSAGE ASSOCIÉ
(ZH) 抛光剂、铜件及其抛光处理方法
Abstract:
(EN) A polishing agent, a copper part and a polishing process therefor. The polishing agent is used for surface pretreatment of a copper part and comprises the following components in parts by weight per 200 parts by weight of the polishing agent: 5-20 parts of abrasive, 2-10 parts of ethylenediaminetetraacetic acid, 2-10 parts of sulfuric acid, 2-10 parts of ammonium persulfate, 2-10 parts of polyethylene glycol and the balance of water. Processed with the above polishing agent, the surface of a copper part is clean and bright, and the polishing process is simple, safe and environmentally friendly, odorless, convenient to operate and low-cost.
(FR) L'invention concerne un agent de polissage, une pièce en cuivre et un procédé de polissage associé. L'agent de polissage est utilisé pour le prétraitement de surface d'une pièce en cuivre et comprend les constituants suivants, en parties en poids pour 200 parties en poids de l'agent de polissage : de 5 à 20 parties d'agent abrasif, de 2 à 10 parties d'acide éthylènediaminetétraacétique, de 2 à 10 parties d'acide sulfurique, de 2 à 10 parties de persulfate d'ammonium, de 2 à 10 parties de polyéthylène glycol et le complément étant constitué d'eau. Lorsqu'elle est traitée avec l'agent de polissage précité, la surface d'une pièce en cuivre est propre et brillante, et le procédé de polissage est simple, sûr et respectueux de l'environnement, inodore, pratique à utiliser et de faible coût.
(ZH) 一种抛光剂、铜件及其抛光处理方法。抛光剂用于铜件表面预处理,以200重量份计,包括如下重量份数的成分:5-20份磨料,2-10份乙二胺四乙酸,2-10份硫酸,2-10份过硫酸铵,2-10份聚乙二醇和余量水。经过上述抛光剂处理后,铜件表面清洁光亮,而且整个抛光处理方法工艺简单、安全环保,无气味,操作方便,使用成本低。
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Chinese (ZH)
Filing Language: Chinese (ZH)